title: Fabrication of highly homogeneous surface-enhanced Raman scattering substrates using Ag ion implantation.
abstract: In recent times, surface-enhanced Raman scattering (SERS) has attracted attention for its excellent potential application in chemical and biological detection. In this work, we demonstrate that a highly homogeneous SERS substrate can be realized by Ag ion implantation and the subsequent annealing process. Both the implantation and annealing parameters have been optimized for a high sensitivity SERS substrate. The SERS measurement indicates that a sample implanted by 20 kV Ag ions with a dosage of 3  ×  10(16) ions cm(-2) exhibits the highest SERS activity. In addition, the SERS activity of the Ag-implanted substrates depends highly on the annealing temperature and time. Since none of the fabrication processes contain chemical reactions, our substrate is a clean system without any chemical residues.
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan 430072, People's Republic of China.
authors.forename: Wenqing
authors.initials: W
authors.lastname: Li
authors.forename: Xiangheng
authors.initials: X
authors.lastname: Xiao
authors.forename: Zhigao
authors.initials: Z
authors.lastname: Dai
authors.forename: Wei
authors.initials: W
authors.lastname: Wu
authors.forename: Li
authors.initials: L
authors.lastname: Cheng
authors.forename: Fei
authors.initials: F
authors.lastname: Mei
authors.forename: Xingang
authors.initials: X
authors.lastname: Zhang
authors.forename: Changzhong
authors.initials: C
authors.lastname: Jiang