title: Patterning of Metal Films on Arbitrary Substrates by Using Polydopamine as a UV-Sensitive Catalytic Layer for Electroless Deposition.
abstract: Patterning metal films on various substrates is essentially important and yet challenging for developing a wide variety of innovative devices. We herein report a versatile approach to pattern metal (gold, silver, or copper) films on arbitrary substrates by using the bio-inspired polydopamine (PDA) thin film as a UV-sensitive adhesive layer for electroless deposition. The PDA film is able to be formed on virtually any solid surfaces under mild condition, and its rich catechol groups allow for electroless deposition of metal films with high adhesion stability. Upon UV irradiation, spatially selective oxidation of PDA film occurs and the local metal deposition is inhibited, thus facilitating successful patterning of metal films. Considering its versatility and simplicity, this strategy may demonstrate great applications in manufacturing various innovative devices.
authors.affiliation: Institute for Clean Energy & Advanced Materials, Faculty of Materials and Energy, Chongqing Key Laboratory for Advanced Materials and Technologies of Clean Energies, Southwest University , Chongqing 400715, China.
authors.forename: Lei
authors.initials: L
authors.lastname: Zhao
authors.affiliation: Institute for Clean Energy & Advanced Materials, Faculty of Materials and Energy, Chongqing Key Laboratory for Advanced Materials and Technologies of Clean Energies, Southwest University , Chongqing 400715, China.
authors.forename: Daqun
authors.initials: D
authors.lastname: Chen
authors.affiliation: Institute for Clean Energy & Advanced Materials, Faculty of Materials and Energy, Chongqing Key Laboratory for Advanced Materials and Technologies of Clean Energies, Southwest University , Chongqing 400715, China.
authors.forename: Weihua
authors.initials: W
authors.lastname: Hu