title: High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells.
abstract: Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors.
authors.affiliation: Department of Chemistry and Materials, Research Institute, Pennsylvania State University, University Park, PA, 16802, USA.
authors.forename: Rongrui
authors.initials: R
authors.lastname: He
authors.affiliation: Department of Chemistry and Materials, Research Institute, Pennsylvania State University, University Park, PA, 16802, USA.
authors.forename: Todd D
authors.initials: TD
authors.lastname: Day
authors.affiliation: Department of Chemistry and Materials, Research Institute, Pennsylvania State University, University Park, PA, 16802, USA.
authors.forename: Justin R
authors.initials: JR
authors.lastname: Sparks
authors.affiliation: Department of Chemistry and Materials, Research Institute, Pennsylvania State University, University Park, PA, 16802, USA.
authors.forename: Nichole F
authors.initials: NF
authors.lastname: Sullivan
authors.affiliation: Department of Chemistry and Materials, Research Institute, Pennsylvania State University, University Park, PA, 16802, USA.|Department of Physics, Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA, 16802, USA.
authors.forename: John V
authors.initials: JV
authors.lastname: Badding
keywords: chemical vapor deposition; flexible electronics; hydrogenated amorphous silicon; solar cells; thin films