title: Large-Scale and Defect-Free Silicon Metamaterials with Magnetic Response.
abstract: All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. Here, we experimentally demonstrate a silicon based large-scale magnetic metamaterial, which is fabricated with standard photolithography and conventional reactive ion etching process. The periodically arrayed silicon sub-wavelength structures possess electric and magnetic responses with low loss in mid-infrared wavelength range. We investigate the electric and magnetic resonances dependencies on the structural parameters and demonstrate the possibility of obtaining strong dielectric-based magnetic resonance through a broad band range. The optical responses are quite uniform over a large area about 2 × 2 cm(2). The scalability of this design and compatibility fabrication method with highly developed semiconductor devices process could lead to new avenues of manipulating light for low-loss, large-area and real integrated photonic applications.
authors.affiliation: Integrated Nanoscience Lab, Department of Material Science and Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Ningbo
authors.initials: N
authors.lastname: Yi
authors.affiliation: Integrated Nanoscience Lab, Department of Material Science and Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Shang
authors.initials: S
authors.lastname: Sun
authors.affiliation: Integrated Nanoscience Lab, Department of Material Science and Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Yisheng
authors.initials: Y
authors.lastname: Gao
authors.affiliation: Integrated Nanoscience Lab, Department of Electronic and Information Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Kaiyang
authors.initials: K
authors.lastname: Wang
authors.affiliation: Integrated Nanoscience Lab, Department of Electronic and Information Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Zhiyuan
authors.initials: Z
authors.lastname: Gu
authors.affiliation: Integrated Nanoscience Lab, Department of Material Science and Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Siwu
authors.initials: S
authors.lastname: Sun
authors.affiliation: Integrated Nanoscience Lab, Department of Electronic and Information Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Qinghai
authors.initials: Q
authors.lastname: Song
authors.affiliation: Integrated Nanoscience Lab, Department of Material Science and Engineering, Shenzhen Graduate School, Harbin Institute of Technology, Shenzhen, 518055, China.
authors.forename: Shumin
authors.initials: S
authors.lastname: Xiao