title: Enhanced methylene blue oxidative removal by copper electrode-based plasma irradiation with the addition of hydrogen peroxide.
abstract: Submerged plasma irradiation (SPI)-based advanced oxidation processes have been studied for the oxidation of recalcitrant organic compounds because of their various physical and chemical properties. However, SPI technologies still have a few drawbacks such as relatively low efficiency for wastewater treatment and high energy consumption. In order to overcome these drawbacks, in this study, we proposed the combination of SPI and the Cu(II)-catalyzed Fenton-like system. The removal of methylene blue (MB) by the SPI system was significantly enhanced upon the addition of H2O2. The pseudo-first-order rate constants of MB removal increased with the increase of applied voltage. In addition, the optimum H2O2 dose and initial solution pH were 100 mM and 9, respectively. The reactive oxidants responsible for MB removal in copper electrode-based SPI/H2O2 systems are likely to be hydroxyl radicals (OH) or cupryl ion (Cu(III)), wherein Cu(III) is especially important. Furthermore, the copper electrode-based SPI/H2O2 system is a novel advanced oxidation process capable of oxidizing water recalcitrant and toxic organic pollutants at neutral pH.
authors.affiliation: School of Civil and Environmental Engineering, Kumoh National Institute of Technology, 1 Yangho-dong, Gumi 730-701, Republic of Korea.
authors.forename: Guntae
authors.initials: G
authors.lastname: Son
authors.affiliation: Soil Environment Center, Korea Environmental Industry & Technology Institute, 215 Jinheungno, Eunpyeonggu, Seoul, Republic of Korea.
authors.forename: Do-Hyung
authors.initials: DH
authors.lastname: Kim
authors.affiliation: Biomedical Engineering, Yale University, New Haven, CT 06511, United States.
authors.forename: Jung Seok
authors.initials: JS
authors.lastname: Lee
authors.affiliation: Chemical and Environmental Engineering, Yale University, New Haven, CT 06511, United States. Electronic address: hongshin.lee@yale.edu.
authors.forename: Hongshin
authors.initials: H
authors.lastname: Lee
mesh_terms: D003300:Copper / Q000737:chemistry*; D004566:Electrodes; D006861:Hydrogen Peroxide / Q000737:chemistry*; D008751:Methylene Blue / Q000737:chemistry*; D010084:Oxidation-Reduction; D058626:Plasma Gases / Q000737:chemistry*; D014865:Waste Disposal, Fluid / Q000379:methods*
chemical_list: D058626:Plasma Gases; D003300:Copper; D006861:Hydrogen Peroxide; D008751:Methylene Blue
keywords: Cupryl ion; Fenton reaction; Fenton-like reaction; HydroxyL radicals; MethylEne blue; Submerged plasma irradiation (SPI)