title: Calibration of imaging plates to electrons between 40 and 180 MeV.
abstract: This paper presents the response calibration of Imaging Plates (IPs) for electrons in the 40-180 MeV range using laser-accelerated electrons at Laboratoire d'Optique Appliquée (LOA), Palaiseau, France. In the calibration process, the energy spectrum and charge of electron beams are measured by an independent system composed of a magnetic spectrometer and a Lanex scintillator screen used as a calibrated reference detector. It is possible to insert IPs of different types or stacks of IPs in this spectrometer in order to detect dispersed electrons simultaneously. The response values are inferred from the signal on the IPs, due to an appropriate charge calibration of the reference detector. The effect of thin layers of tungsten in front and/or behind IPs is studied in detail. GEANT4 simulations are used in order to analyze our measurements.
authors.affiliation: CELIA (Centre Lasers Intenses et Applications), Université Bordeaux, CNRS, CEA, UMR 5107, F-33405 Talence, France.
authors.forename: N
authors.initials: N
authors.lastname: Rabhi
authors.affiliation: ELI Beamlines, Institute of Physics ASCR, Prague, Czech Republic.
authors.forename: K
authors.initials: K
authors.lastname: Bohacek
authors.affiliation: CELIA (Centre Lasers Intenses et Applications), Université Bordeaux, CNRS, CEA, UMR 5107, F-33405 Talence, France.
authors.forename: D
authors.initials: D
authors.lastname: Batani
authors.affiliation: CELIA (Centre Lasers Intenses et Applications), Université Bordeaux, CNRS, CEA, UMR 5107, F-33405 Talence, France.
authors.forename: G
authors.initials: G
authors.lastname: Boutoux
authors.affiliation: CELIA (Centre Lasers Intenses et Applications), Université Bordeaux, CNRS, CEA, UMR 5107, F-33405 Talence, France.
authors.forename: J-E
authors.initials: JE
authors.lastname: Ducret
authors.affiliation: LOA, ENSTA ParisTech, École Polytechnique, Université Paris-Saclay, CNRS, 91762 Palaiseau, France.
authors.forename: E
authors.initials: E
authors.lastname: Guillaume
authors.affiliation: Institute of Plasma Physics and Laser Microfusion, Hery Street 23, 01-497 Warsaw, Poland.
authors.forename: K
authors.initials: K
authors.lastname: Jakubowska
authors.affiliation: LOA, ENSTA ParisTech, École Polytechnique, Université Paris-Saclay, CNRS, 91762 Palaiseau, France.
authors.forename: C
authors.initials: C
authors.lastname: Thaury
authors.affiliation: CEA DAM DIF, F-91297 Arpajon, France.
authors.forename: I
authors.initials: I
authors.lastname: Thfoin