title: Wafer-Scale Nanopillars Derived from Block Copolymer Lithography for Surface-Enhanced Raman Spectroscopy.
abstract: We report a novel nanofabrication process via block copolymer lithography using solvent vapor annealing. The nanolithography process is facile and scalable, enabling fabrication of highly ordered periodic patterns over entire wafers as substrates for surface-enhanced Raman spectroscopy (SERS). Direct silicon etching with high aspect ratio templated by the block copolymer mask is realized without any intermediate layer or external precursors. Uniquely, an atomic layer deposition (ALD)-assisted method is introduced to allow reversing of the morphology relative to the initial pattern. As a result, highly ordered silicon nanopillar arrays are fabricated with controlled aspect ratios. After metallization, the resulting nanopillar arrays are suitable for SERS applications. These structures readily exhibit an average SERS enhancement factor of above 10(8), SERS uniformities of 8.5% relative standard deviation across 4 cm, and 6.5% relative standard deviation over 5 × 5 mm(2) surface area, as well as a very low SERS background. The as-prepared SERS substrate, with a good enhancement and large-area uniformity, is promising for practical SERS sensing applications.
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Tao
authors.initials: T
authors.lastname: Li
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Kaiyu
authors.initials: K
authors.lastname: Wu
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Tomas
authors.initials: T
authors.lastname: Rindzevicius
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Zhongli
authors.initials: Z
authors.lastname: Wang
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Lars
authors.initials: L
authors.lastname: Schulte
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Michael S
authors.initials: MS
authors.lastname: Schmidt
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Anja
authors.initials: A
authors.lastname: Boisen
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark (DTU) , Anker Engelunds Vej 1, Kongens Lyngby 2800, Denmark.
authors.forename: Sokol
authors.initials: S
authors.lastname: Ndoni
keywords: SERS uniformity; block copolymer lithography; nanofabrication; plasmonic nanomaterials; surface-enhanced Raman spectroscopy