title: Ultra-precision fabrication of 500 mm long and laterally graded Ru/C multilayer mirrors for X-ray light sources.
abstract: X-ray mirrors are needed for beam shaping and monochromatization at advanced research light sources, for instance, free-electron lasers and synchrotron sources. Such mirrors consist of a substrate and a coating. The shape accuracy of the substrate and the layer precision of the coating are the crucial parameters that determine the beam properties required for various applications. In principal, the selection of the layer materials determines the mirror reflectivity. A single layer mirror offers high reflectivity in the range of total external reflection, whereas the reflectivity is reduced considerably above the critical angle. A periodic multilayer can enhance the reflectivity at higher angles due to Bragg reflection. Here, the selection of a suitable combination of layer materials is essential to achieve a high flux at distinct photon energies, which is often required for applications such as microtomography, diffraction, or protein crystallography. This contribution presents the current development of a Ru/C multilayer mirror prepared by magnetron sputtering with a sputtering facility that was designed in-house at the Helmholtz-Zentrum Geesthacht. The deposition conditions were optimized in order to achieve ultra-high precision and high flux in future mirrors. Input for the improved deposition parameters came from investigations by transmission electron microscopy. The X-ray optical properties were investigated by means of X-ray reflectometry using Cu- and Mo-radiation. The change of the multilayer d-spacing over the mirror dimensions and the variation of the Bragg angles were determined. The results demonstrate the ability to precisely control the variation in thickness over the whole mirror length of 500 mm thus achieving picometer-precision in the meter-range.
authors.affiliation: Helmholtz-Zentrum Geesthacht, Institute of Materials Research, Max-Planck-Straße 1, D-21502 Geesthacht, Germany.
authors.forename: M
authors.initials: M
authors.lastname: Störmer
authors.affiliation: Helmholtz-Zentrum Geesthacht, Institute of Materials Research, Max-Planck-Straße 1, D-21502 Geesthacht, Germany.
authors.forename: H
authors.initials: H
authors.lastname: Gabrisch
authors.affiliation: Helmholtz-Zentrum Geesthacht, Institute of Materials Research, Max-Planck-Straße 1, D-21502 Geesthacht, Germany.
authors.forename: C
authors.initials: C
authors.lastname: Horstmann
authors.affiliation: Incoatec GmbH, Max-Planck-Str. 2, D-21502 Geesthacht, Germany.
authors.forename: U
authors.initials: U
authors.lastname: Heidorn
authors.affiliation: Incoatec GmbH, Max-Planck-Str. 2, D-21502 Geesthacht, Germany.
authors.forename: F
authors.initials: F
authors.lastname: Hertlein
authors.affiliation: Incoatec GmbH, Max-Planck-Str. 2, D-21502 Geesthacht, Germany.
authors.forename: J
authors.initials: J
authors.lastname: Wiesmann
authors.affiliation: Helmholtz-Zentrum Berlin, Albert-Einstein-Straße 15, D-12489 Berlin, Germany.
authors.forename: F
authors.initials: F
authors.lastname: Siewert
authors.affiliation: European Synchrotron Radiation Facility, CS 40220, 38043 Grenoble, France.
authors.forename: A
authors.initials: A
authors.lastname: Rack