Metasurfaces: Continuous-Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate (Adv. Mater. 23/2016).
A continuous-gradient approach of material evaporation is employed by L. Shao, M. Käll, and co-workers to fabricate nanostructures with varying geometric parameters such as thickness, lateral positioning, and orientation on a single substrate. This method for mask lithography, described on page 4658, allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces.
Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
Robin
R
Ogier
Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
Lei
L
Shao
Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
Mikael
M
Svedendahl
Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
Mikael
M
Käll
continuous parameter tuning; electron-beam evaporation; gradient metasurfaces; hole-mask colloidal lithography; plasmonic nanostructures