Specific Neuron Placement on Gold and Silicon Nitride-Patterned Substrates through a Two-Step Functionalization Method.
The control of neuron-substrate adhesion has been always a challenge for fabricating neuron-based cell chips and in particular for multielectrode array (MEA) devices, which warrants the investigation of the electrophysiological activity of neuronal networks. The recent introduction of high-density chips based on the complementary metal oxide semiconductor (CMOS) technology, integrating thousands of electrodes, improved the possibility to sense large networks and raised the challenge to develop newly adapted functionalization techniques to further increase neuron electrode localization to avoid the positioning of cells out of the recording area. Here, we present a simple and straightforward chemical functionalization method that leads to the precise and exclusive positioning of the neural cell bodies onto modified electrodes and inhibits, at the same time, cellular adhesion in the surrounding insulator areas. Different from other approaches, this technique does not require any adhesion molecule as well as complex patterning technique such as μ-contact printing. The functionalization was first optimized on gold (Au) and silicon nitride (Si3N4)-patterned surfaces. The procedure consisted of the introduction of a passivating layer of hydrophobic silane molecules (propyltriethoxysilane [PTES]) followed by a treatment of the Au surface using 11-amino-1-undecanethiol hydrochloride (AT). On model substrates, well-ordered neural networks and an optimal coupling between a single neuron and single micrometric functionalized Au surface were achieved. In addition, we presented the preliminary results of this functionalization method directly applied on a CMOS-MEA: the electrical spontaneous spiking and bursting activities of the network recorded for up to 4 weeks demonstrate an excellent and stable neural adhesion and functional behavior comparable with what expected using a standard adhesion factor, such as polylysine or laminin, thus demonstrating that this procedure can be considered a good starting point to develop alternatives to the traditional chip coatings to provide selective and specific neuron-substrate adhesion.
Department of Nanophysics, ‡Department of Nanochemistry, and §Department of Neuroscience and Brain Technologies, Istituto Italiano di Tecnologia (IIT) , Via Morego 30, 16163 Genova, Italy.
Andrea
A
Mescola
Department of Nanophysics, ‡Department of Nanochemistry, and §Department of Neuroscience and Brain Technologies, Istituto Italiano di Tecnologia (IIT) , Via Morego 30, 16163 Genova, Italy.
Claudio
C
Canale
Department of Nanophysics, ‡Department of Nanochemistry, and §Department of Neuroscience and Brain Technologies, Istituto Italiano di Tecnologia (IIT) , Via Morego 30, 16163 Genova, Italy.
Mirko
M
Prato
Department of Nanophysics, ‡Department of Nanochemistry, and §Department of Neuroscience and Brain Technologies, Istituto Italiano di Tecnologia (IIT) , Via Morego 30, 16163 Genova, Italy.
Alberto
A
Diaspro
Department of Nanophysics, ‡Department of Nanochemistry, and §Department of Neuroscience and Brain Technologies, Istituto Italiano di Tecnologia (IIT) , Via Morego 30, 16163 Genova, Italy.
Luca
L
Berdondini
Department of Nanophysics, ‡Department of Nanochemistry, and §Department of Neuroscience and Brain Technologies, Istituto Italiano di Tecnologia (IIT) , Via Morego 30, 16163 Genova, Italy.
Alessandro
A
Maccione
Department of Nanophysics, ‡Department of Nanochemistry, and §Department of Neuroscience and Brain Technologies, Istituto Italiano di Tecnologia (IIT) , Via Morego 30, 16163 Genova, Italy.
Silvia
S
Dante