Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope.
Extended defects such as dislocations and grain boundaries have a strong influence on the performance of microelectronic devices and on other applications of semiconductor materials. However, it is still under debate how the defect structure determines the band structure, and therefore, the recombination behavior of electron-hole pairs responsible for the optical and electrical properties of the extended defects. The present paper is a survey of procedures for the spatially resolved investigation of structural and of physical properties of extended defects in semiconductor materials with a scanning electron microscope (SEM). Representative examples are given for crystalline silicon. The luminescence behavior of extended defects can be investigated by cathodoluminescence (CL) measurements. They are particularly valuable because spectrally and spatially resolved information can be obtained simultaneously. For silicon, with an indirect electronic band structure, CL measurements should be carried out at low temperatures down to 5 K due to the low fraction of radiative recombination processes in comparison to non-radiative transitions at room temperature. For the study of the electrical properties of extended defects, the electron beam induced current (EBIC) technique can be applied. The EBIC image reflects the local distribution of defects due to the increased charge-carrier recombination in their vicinity. The procedure for EBIC investigations is described for measurements at room temperature and at low temperatures. Internal strain fields arising from extended defects can be determined quantitatively by cross-correlation electron backscatter diffraction (ccEBSD). This method is challenging because of the necessary preparation of the sample surface and because of the quality of the diffraction patterns which are recorded during the mapping of the sample. The spatial resolution of the three experimental techniques is compared.
Institute of Applied Physics, Semiconductor Physics, Technische Universität Dresden; ellen.hieckmann@tu-dresden.de.
Ellen
E
Hieckmann
Institute of Applied Physics, Semiconductor Physics, Technische Universität Dresden.
Markus
M
Nacke
Institute of Applied Physics, Semiconductor Physics, Technische Universität Dresden.
Matthias
M
Allardt
Institute of Applied Physics, Semiconductor Physics, Technische Universität Dresden.
Yury
Y
Bodrov
Institut für Strukturphysik, Technische Universität Dresden.
Paul
P
Chekhonin
Institut für Strukturphysik, Technische Universität Dresden.
Werner
W
Skrotzki
Institute of Applied Physics, Semiconductor Physics, Technische Universität Dresden.
Jörg
J
Weber
D008422:Materials Testing; D008855:Microscopy, Electron, Scanning / Q000379:methods*; D012666:Semiconductors; D012825:Silicon / Q000737:chemistry; D014961:X-Ray Diffraction
D012825:Silicon