Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy.
Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.
DWI-Leibniz-Institute für Interaktiven Materialien and Institut für Physikalische Chemie, RWTH Aachen University, Forckenbeckstraße 50, 52056, Aachen, Germany.
Sungjune
S
Park
DWI-Leibniz-Institute für Interaktiven Materialien and Institut für Physikalische Chemie, RWTH Aachen University, Forckenbeckstraße 50, 52056, Aachen, Germany.
Xiao
X
Cheng
Fraunhofer-Institut für Angewandte Polymerforschung, Lehrstuhl für Polymermaterialien und Polymertechnologie, Universität Potsdam, Geiselbergstraße 69, 14476, Potsdam-Golm, Germany.
Alexander
A
Böker
DWI-Leibniz-Institute für Interaktiven Materialien and Institut für Physikalische Chemie, RWTH Aachen University, Forckenbeckstraße 50, 52056, Aachen, Germany.
Larisa
L
Tsarkova
block copolymer lithography; buckled structures; hierarchical surface patterns; topographic substrates