Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation.
The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal-organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.|Department of Materials Research and Technology, Luxembourg Institute of Science and Technology, 5 Avenue des Hauts-Fourneaux, Esch/Alzette, L-4362, Luxembourg.
Nicolas D
ND
Boscher
Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
Minghui
M
Wang
Department of Applied Physics, Eindhoven University of Technology, 5600, MB Eindhoven, The Netherlands.
Alberto
A
Perrotta
Institute of Inorganic and Analytical Chemistry, Johannes Gutenberg University of Mainz, Duesbergweg 10-14, D-55128, Mainz, Germany.
Katja
K
Heinze
Department of Applied Physics, Eindhoven University of Technology, 5600, MB Eindhoven, The Netherlands.
Mariadriana
M
Creatore
Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA. kkg@mit.edu.
Karen K
KK
Gleason
free-radical polymerization; gas separation; iPECVD; metal-organic covalent networks; metalloporphyrins