Sensitivity Enhancement of Transition Metal Dichalcogenides/Silicon Nanostructure-based Surface Plasmon Resonance Biosensor.
In this work, we designed a sensitivity-enhanced surface plasmon resonance biosensor structure based on silicon nanosheet and two-dimensional transition metal dichalcogenides. This configuration contains six components: SF10 triangular prism, gold thin film, silicon nanosheet, two-dimensional MoS2/MoSe2/WS2/WSe2 (defined as MX2) layers, biomolecular analyte layer and sensing medium. The minimum reflectivity, sensitivity as well as the Full Width at Half Maximum of SPR curve are systematically examined by using Fresnel equations and the transfer matrix method in the visible and near infrared wavelength range (600 nm to 1024 nm). The variation of the minimum reflectivity and the change in resonance angle as the function of the number of MX2 layers are presented respectively. The results show that silicon nanosheet and MX2 layers can be served as effective light absorption medium. Under resonance conditions, the electrons in these additional dielectric layers can be transferred to the surface of gold thin film. All silicon-MX2 enhanced sensing models show much better performance than that of the conventional sensing scheme where pure Au thin film is used, the highest sensitivity can be achieved by employing 600 nm excitation light wavelength with 35 nm gold thin film and 7 nm thickness silicon nanosheet coated with monolayer WS2.
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798.|CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, 50 Nanyang Drive, Border X Block, Singapore, 637553.
Qingling
Q
Ouyang
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798.|CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, 50 Nanyang Drive, Border X Block, Singapore, 637553.
Shuwen
S
Zeng
CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, 50 Nanyang Drive, Border X Block, Singapore, 637553.|State Key Laboratory of Modern Optical Instrumentation, Centre for Optical and Electromagnetics Research, Zhejiang University, Hangzhou 310058, China.
Li
L
Jiang
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798.
Liying
L
Hong
CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, 50 Nanyang Drive, Border X Block, Singapore, 637553.|Key Laboratory of Optoelectronics Devices and Systems of Ministry of Education/Guangdong Province, College of Optoelectronic Engineering, Shenzhen University, Shenzhen, P. R. China.
Gaixia
G
Xu
CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, 50 Nanyang Drive, Border X Block, Singapore, 637553.
Xuan-Quyen
XQ
Dinh
State Key Laboratory of Modern Optical Instrumentation, Centre for Optical and Electromagnetics Research, Zhejiang University, Hangzhou 310058, China.
Jun
J
Qian
State Key Laboratory of Modern Optical Instrumentation, Centre for Optical and Electromagnetics Research, Zhejiang University, Hangzhou 310058, China.
Sailing
S
He
Key Laboratory of Optoelectronics Devices and Systems of Ministry of Education/Guangdong Province, College of Optoelectronic Engineering, Shenzhen University, Shenzhen, P. R. China.
Junle
J
Qu
CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, 50 Nanyang Drive, Border X Block, Singapore, 637553.|Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN), CNRS UMR 8520 - Université de Lille 1, 59650 Villeneuve d'Ascq, France.
Philippe
P
Coquet
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798.|CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, 50 Nanyang Drive, Border X Block, Singapore, 637553.
Ken-Tye
KT
Yong
D015374:Biosensing Techniques / Q000295:instrumentation / Q000379:methods*; D006046:Gold / Q000737:chemistry; D008027:Light; D053768:Metal Nanoparticles / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D020349:Surface Plasmon Resonance / Q000295:instrumentation* / Q000379:methods*
D006046:Gold; D012825:Silicon