title: Fabrication of Laser-reduced Graphene Oxide in Liquid Nitrogen Environment.
abstract: Porous structure of reduced graphene oxide (rGO) plays an important role in developing flexible graphene-based devices. In this work, we report a novel methodology for reduction of freestanding graphite oxide (GO) sheet by picosecond pulse laser direct writing in liquid nitrogen. Non-agglomerate and porous structure of rGO is fabricated successfully due to frozen effect during laser processing. Compared with laser-irradiated rGO developed in N2 gas at ambient environment, the frozen rGO developed in liquid N2 shows better ordered structure with less defects, crack-free morphology as well as better electron supercapacitor performance including 50-60 Ω/sq in sheet electrical resistance. Mechanism of cryotemperature photoreduction GO is also discussed.
authors.affiliation: Beihang University, 37 Xueyuan Road, Beijing, 100191, China.|Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075, Singapore.
authors.forename: Y C
authors.initials: YC
authors.lastname: Guan
authors.affiliation: Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075, Singapore.
authors.forename: Y W
authors.initials: YW
authors.lastname: Fang
authors.affiliation: Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075, Singapore.
authors.forename: G C
authors.initials: GC
authors.lastname: Lim
authors.affiliation: Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075, Singapore.
authors.forename: H Y
authors.initials: HY
authors.lastname: Zheng
authors.affiliation: National University of Singapore, 4 Engineering Drive 3, 117576, Singapore.
authors.forename: M H
authors.initials: MH
authors.lastname: Hong