title: Multiscale conformal pattern transfer.
abstract: We demonstrate a method for seamless transfer from a parent flat substrate of basically any lithographic top-down or bottom-up pattern onto essentially any kind of surface. The nano- or microscale patterns, spanning macroscopic surface areas, can be transferred with high conformity onto a large variety of surfaces when such patterns are produced on a thin carbon film, grown on top of a sacrificial layer. The latter allows lifting the patterns from the flat parent substrate onto a water-air interface to be picked up by the host surface of choice. We illustrate the power of this technique by functionalizing broad range of materials including glass, plastics, metals, rough semiconductors and polymers, highlighting the potential applications in in situ colorimetry of the chemistry of materials, anti-counterfeit technologies, biomolecular and biomedical studies, light-matter interactions at the nanoscale, conformal photovoltaics and flexible electronics.
authors.affiliation: Department of Physics, Chalmers University of Technology, 41296 Gothenburg, Sweden.
authors.forename: Kristof
authors.initials: K
authors.lastname: Lodewijks
authors.affiliation: Department of Physics, Chalmers University of Technology, 41296 Gothenburg, Sweden.
authors.forename: Vladimir
authors.initials: V
authors.lastname: Miljkovic
authors.affiliation: Department of Physics, Chalmers University of Technology, 41296 Gothenburg, Sweden.
authors.forename: Inès
authors.initials: I
authors.lastname: Massiot
authors.affiliation: Department of Physics, Chalmers University of Technology, 41296 Gothenburg, Sweden.
authors.forename: Addis
authors.initials: A
authors.lastname: Mekonnen
authors.affiliation: Department of Physics, Chalmers University of Technology, 41296 Gothenburg, Sweden.
authors.forename: Ruggero
authors.initials: R
authors.lastname: Verre
authors.affiliation: Department of Physics, Chalmers University of Technology, 41296 Gothenburg, Sweden.
authors.forename: Eva
authors.initials: E
authors.lastname: Olsson
authors.affiliation: Department of Physics, Chalmers University of Technology, 41296 Gothenburg, Sweden.|Department of Physics, University of Gothenburg, 41296 Gothenburg, Sweden.
authors.forename: Alexandre
authors.initials: A
authors.lastname: Dmitriev