title: Control of Triboelectrification by Engineering Surface Dipole and Surface Electronic State.
abstract: Although triboelectrification is a well-known phenomenon, fundamental understanding of its principle on a material surface has not been studied systematically. Here, we demonstrated that the surface potential, especially the surface dipoles and surface electronic states, governed the triboelectrification by controlling the surface with various electron-donating and -withdrawing functional groups. The functional groups critically affected the surface dipoles and surface electronic states followed by controlling the amount of and even the polarity of triboelectric charges. As a result, only one monolayer with a thickness of less than 1 nm significantly changed the conventional triboelectric series. First-principles simulations confirmed the atomistic origins of triboelectric charges and helped elucidate the triboelectrification mechanism. The simulation also revealed for the first time where charges are retained after triboelectrification. This study provides new insights to understand triboelectrification.
authors.affiliation: Samsung Advanced Institute of Technology , Suwon 443-803, Republic of Korea.
authors.forename: Kyung-Eun
authors.initials: KE
authors.lastname: Byun
authors.affiliation: Samsung Advanced Institute of Technology , Suwon 443-803, Republic of Korea.
authors.forename: Yeonchoo
authors.initials: Y
authors.lastname: Cho
authors.affiliation: Samsung Advanced Institute of Technology , Suwon 443-803, Republic of Korea.
authors.forename: Minsu
authors.initials: M
authors.lastname: Seol
authors.affiliation: School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU) , Suwon 440-746, Republic of Korea.
authors.forename: Seongsu
authors.initials: S
authors.lastname: Kim
authors.affiliation: School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU) , Suwon 440-746, Republic of Korea.
authors.forename: Sang-Woo
authors.initials: SW
authors.lastname: Kim
authors.affiliation: Samsung Advanced Institute of Technology , Suwon 443-803, Republic of Korea.
authors.forename: Hyeon-Jin
authors.initials: HJ
authors.lastname: Shin
authors.affiliation: Samsung Advanced Institute of Technology , Suwon 443-803, Republic of Korea.
authors.forename: Seongjun
authors.initials: S
authors.lastname: Park
authors.affiliation: Samsung Advanced Institute of Technology , Suwon 443-803, Republic of Korea.
authors.forename: Sungwoo
authors.initials: S
authors.lastname: Hwang
keywords: Kelvin force microscopy; electron-donating group; electron-withdrawing group; self-assembled monolayer; triboelectrification