title: Perfluorodecyltrichlorosilane-based seed-layer for improved chemical vapour deposition of ultrathin hafnium dioxide films on graphene.
abstract: We investigate the use of perfluorodecyltrichlorosilane-based self-assembled monolayer as seeding layer for chemical vapour deposition of HfO2 on large area CVD graphene. The deposition and evolution of the FDTS-based seed layer is investigated by X-ray photoelectron spectroscopy, Auger electron spectroscopy, and transmission electron microscopy. Crystalline quality of graphene transferred from Cu is monitored during formation of the seed layer as well as the HfO2 growth using Raman spectroscopy. We demonstrate that FDTS-based seed layer significantly improves nucleation of HfO2 layers so that graphene can be coated in a conformal way with HfO2 layers as thin as 10 nm. Proof-of-concept experiments on 200 mm wafers presented here validate applicability of the proposed approach to wafer scale graphene device fabrication.
authors.affiliation: IHP GmbH-Leibniz institute for innovative microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
authors.forename: Julia
authors.initials: J
authors.lastname: Kitzmann
authors.affiliation: IHP GmbH-Leibniz institute for innovative microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
authors.forename: Alexander
authors.initials: A
authors.lastname: Göritz
authors.affiliation: IHP GmbH-Leibniz institute for innovative microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
authors.forename: Mirko
authors.initials: M
authors.lastname: Fraschke
authors.affiliation: IHP GmbH-Leibniz institute for innovative microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
authors.forename: Mindaugas
authors.initials: M
authors.lastname: Lukosius
authors.affiliation: IHP GmbH-Leibniz institute for innovative microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
authors.forename: Christian
authors.initials: C
authors.lastname: Wenger
authors.affiliation: IHP GmbH-Leibniz institute for innovative microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
authors.forename: Andre
authors.initials: A
authors.lastname: Wolff
authors.affiliation: IHP GmbH-Leibniz institute for innovative microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
authors.forename: Grzegorz
authors.initials: G
authors.lastname: Lupina