title: Impact of Surface Chemistry on Copper Deposition in Mesoporous Silicon.
abstract: An easy, efficient, and safe process is developed to metallize mesoporous silicon (PSi) with Cu from the decomposition of a solution of mesitylcopper (CuMes) in an imidazolium-based ionic liquid (IL), [C1C4Im][NTf2]. The impregnation of a solution of CuMes in IL affords the deposition of metallic islands not only on the surface but also deep within the pores of a mesoporous Si layer with small pores below 10 nm. Therefore, this process is well suited to efficiently and completely metallize PSi layers. An in-depth mechanistic study shows that metal deposition is due to the reduction of CuMes by surface silane groups rather than by Si oxidation as observed in aqueous or water-containing media. This could open a new route to the chemical metallization of PSi by less-noble metals difficult to attain by a conventional displacement reaction.
authors.affiliation: CNRS-UMR 5265, 43 Bd du 11 Novembre 1918, 69616 Villeurbanne Cedex, France.
authors.forename: Walid
authors.initials: W
authors.lastname: Darwich
authors.affiliation: CNRS-UMR 5265, 43 Bd du 11 Novembre 1918, 69616 Villeurbanne Cedex, France.
authors.forename: Anthony
authors.initials: A
authors.lastname: Garron
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble, France.|CEA, LETI, MINATEC Campus, F-38054 Grenoble, France.
authors.forename: Piotr
authors.initials: P
authors.lastname: Bockowski
authors.affiliation: CNRS-UMR 5265, 43 Bd du 11 Novembre 1918, 69616 Villeurbanne Cedex, France.
authors.forename: Catherine
authors.initials: C
authors.lastname: Santini
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble, France.|CEA, LETI, MINATEC Campus, F-38054 Grenoble, France.
authors.forename: Frédéric
authors.initials: F
authors.lastname: Gaillard
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble, France.|CEA, LETI, MINATEC Campus, F-38054 Grenoble, France.
authors.forename: Paul-Henri
authors.initials: PH
authors.lastname: Haumesser