title: Formation of defect-fluorite structured NdNiOxHy epitaxial thin films via a soft chemical route from NdNiO3 precursors.
abstract: A new phase of oxyhydride NdNiOxHy with a defect-fluorite structure was obtained by a soft chemical reaction of NdNiO3 epitaxial thin films on a substrate of SrTiO3 (100) with CaH2. The epitaxial relationship of this phase relative to SrTiO3 could be controlled by changing the reaction temperature. At 240 °C, NdNiOxHy grew with a [001] orientation, forming a thin layer of infinite-layer NdNiO2 at the interface between the NdNiOxHy and the substrate. Meanwhile, a high-temperature reaction at 400 °C formed [110]-oriented NdNiOxHy without NdNiO2.
authors.affiliation: Department of Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-0033, Japan. chikamatsu@chem.s.u-tokyo.ac.jp.
authors.forename: T
authors.initials: T
authors.lastname: Onozuka
authors.affiliation: Department of Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-0033, Japan. chikamatsu@chem.s.u-tokyo.ac.jp.
authors.forename: A
authors.initials: A
authors.lastname: Chikamatsu
authors.affiliation: Department of Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-0033, Japan. chikamatsu@chem.s.u-tokyo.ac.jp.
authors.forename: T
authors.initials: T
authors.lastname: Katayama
authors.affiliation: Department of Chemistry, Tohoku University, Sendai, Miyagi 980-8578, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Fukumura
authors.affiliation: Department of Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-0033, Japan. chikamatsu@chem.s.u-tokyo.ac.jp and Kanagawa Academy of Science and Technology (KAST), Kawasaki, Kanagawa 213-0012, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Hasegawa