title: Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication.
abstract: It is very difficult to realize sub-3 nm patterns using conventional lithography for next-generation high-performance nanosensing, photonic, and computing devices. Here we propose a completely original and novel concept, termed self-shrinking dielectric mask (SDM), to fabricate sub-3 nm patterns. Instead of focusing the electron and ion beams or light to an extreme scale, the SDM method relies on a hard dielectric mask which shrinks the critical dimension of nanopatterns during the ion irradiation. Based on the SDM method, a linewidth as low as 2.1 nm was achieved along with a high aspect ratio in the sub-10 nm scale. In addition, numerous patterns with assorted shapes can be fabricated simultaneously using the SDM technique, exhibiting a much higher throughput than conventional ion beam lithography. Therefore, the SDM method can be widely applied in the fields which need extreme nanoscale fabrication.
authors.affiliation: Department of Materials Science and Engineering, National Taiwan University, 1, Roosevelt Road, Sec. 4, Taipei, 106, ROC Taiwan.
authors.forename: Po-Shuan
authors.initials: PS
authors.lastname: Yang
authors.affiliation: Department of Materials Science and Engineering, National Taiwan University, 1, Roosevelt Road, Sec. 4, Taipei, 106, ROC Taiwan.
authors.forename: Po-Hsien
authors.initials: PH
authors.lastname: Cheng
authors.affiliation: Department of Materials Science and Engineering, National Taiwan University, 1, Roosevelt Road, Sec. 4, Taipei, 106, ROC Taiwan.
authors.forename: C Robert
authors.initials: CR
authors.lastname: Kao
authors.affiliation: Department of Materials Science and Engineering, National Taiwan University, 1, Roosevelt Road, Sec. 4, Taipei, 106, ROC Taiwan.
authors.forename: Miin-Jang
authors.initials: MJ
authors.lastname: Chen