title: Self-folding nanostructures with imprint patterned surfaces (SNIPS).
abstract: A significant need in nanotechnology is the development of methods to mass-produce three-dimensional (3D) nanostructures and their ordered assemblies with patterns of functional materials such as metals, ceramics, device grade semiconductors, and polymers. While top-down lithography approaches can enable heterogeneous integration, tunability, and significant material versatility, these methods enable inherently two-dimensional (2D) patterning. Bottom-up approaches enable mass-production of 3D nanostructures and their assemblies but with limited precision, and tunability in surface patterning. Here, we demonstrate a methodology to create Self-folding Nanostructures with Imprint Patterned Surfaces (SNIPS). By a variety of examples, we illustrate that SNIPS, either individually or in ordered arrays, are mass-producible and have significant tunability, material heterogeneity, and patterning precision.
authors.affiliation: Department of Chemical and Biomolecular Engineering, Johns Hopkins University, Baltimore, MD 21218, USA. dgracias@jhu.edu.
authors.forename: Hye Rin
authors.initials: HR
authors.lastname: Kwag
authors.forename: Jeong-Hyun
authors.initials: JH
authors.lastname: Cho
authors.forename: Si-Young
authors.initials: SY
authors.lastname: Park
authors.forename: Jaehyun
authors.initials: J
authors.lastname: Park
authors.forename: David H
authors.initials: DH
authors.lastname: Gracias