title: High energy X-ray phase and dark-field imaging using a random absorption mask.
abstract: High energy X-ray imaging has unique advantage over conventional X-ray imaging, since it enables higher penetration into materials with significantly reduced radiation damage. However, the absorption contrast in high energy region is considerably low due to the reduced X-ray absorption cross section for most materials. Even though the X-ray phase and dark-field imaging techniques can provide substantially increased contrast and complementary information, fabricating dedicated optics for high energies still remain a challenge. To address this issue, we present an alternative X-ray imaging approach to produce transmission, phase and scattering signals at high X-ray energies by using a random absorption mask. Importantly, in addition to the synchrotron radiation source, this approach has been demonstrated for practical imaging application with a laboratory-based microfocus X-ray source. This new imaging method could be potentially useful for studying thick samples or heavy materials for advanced research in materials science.
authors.affiliation: Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot, OX11 0DE, UK.
authors.forename: Hongchang
authors.initials: H
authors.lastname: Wang
authors.affiliation: Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot, OX11 0DE, UK.
authors.forename: Yogesh
authors.initials: Y
authors.lastname: Kashyap
authors.affiliation: School of Materials, University of Manchester, Manchester, M13 9PL, UK.|Research Complex at Harwell, Rutherford Appleton Laboratory, Harwell, Oxfordshire, OX11 0FA, UK.
authors.forename: Biao
authors.initials: B
authors.lastname: Cai
authors.affiliation: Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot, OX11 0DE, UK.
authors.forename: Kawal
authors.initials: K
authors.lastname: Sawhney