title: ZnSe-material phase mask applied to athermalization of infrared imaging systems.
abstract: This paper reports a ZnSe-material phase mask that is applied to athermalization of a conventional infrared imaging system. Its principle, design, manufacture, measurement, and performance validation are successively discussed. This paper concludes that a ZnSe-material phase mask has a permissible manufacturing error 2.14 times as large as a Ge-material phase mask. By constructing and solving an optimization problem, the ZnSe-material phase mask is optimally designed. The optimal phase mask is manufactured and measured with a form manufacturing error of 1.370 μm and a surface roughness value of 9.926 nm. Experiments prove that the wavefront coding athermalized longwave infrared (LWIR) imaging system works well over the temperature range from -40°C to +60°C.
authors.forename: Bin
authors.initials: B
authors.lastname: Feng
authors.forename: Zelin
authors.initials: Z
authors.lastname: Shi
authors.forename: Baoshu
authors.initials: B
authors.lastname: Xu
authors.forename: Chengshuo
authors.initials: C
authors.lastname: Zhang
authors.forename: Xiaodong
authors.initials: X
authors.lastname: Zhang