title: Three-dimensional particle-in-cell simulation on gain saturation effect of microchannel plate.
abstract: We present here the results of the simulation work, using the three-dimensional particle-in-cell method, on the performance of the lead glass microchannel plate under saturated state. We calculated the electron cascade process with different DC bias voltages under both self-consistent condition and non-self-consistent condition. The comparative results have demonstrated that the strong self-consistent field can suppress the cascade process and make the microchannel plate saturated. The simulation results were also compared to the experimental data and good agreement was obtained. The simulation results also show that the electron multiplication process in the channel is accompanied by the buildup process of positive charges in the channel wall. Though the interactions among the secondary electron cloud in the channel, the positive charges in the channel wall, and the external acceleration field can make the electron-surface collision more frequent, the collision energy will be inevitably reduced, thus the electron gain will also be reduced.
authors.affiliation: Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang, Sichuan 621900, China.
authors.forename: Qiangqiang
authors.initials: Q
authors.lastname: Wang
authors.affiliation: Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang, Sichuan 621900, China.
authors.forename: Zheng
authors.initials: Z
authors.lastname: Yuan
authors.affiliation: Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang, Sichuan 621900, China.
authors.forename: Zhurong
authors.initials: Z
authors.lastname: Cao
authors.affiliation: Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang, Sichuan 621900, China.
authors.forename: Bo
authors.initials: B
authors.lastname: Deng
authors.affiliation: Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang, Sichuan 621900, China.
authors.forename: Tao
authors.initials: T
authors.lastname: Chen
authors.affiliation: Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang, Sichuan 621900, China.
authors.forename: Keli
authors.initials: K
authors.lastname: Deng