title: Vapor-Phase Deposition and Modification of Metal-Organic Frameworks: State-of-the-Art and Future Directions.
abstract: Materials processing, and thin-film deposition in particular, is decisive in the implementation of functional materials in industry and real-world applications. Vapor processing of materials plays a central role in manufacturing, especially in electronics. Metal-organic frameworks (MOFs) are a class of nanoporous crystalline materials on the brink of breakthrough in many application areas. Vapor deposition of MOF thin films will facilitate their implementation in micro- and nanofabrication research and industries. In addition, vapor-solid modification can be used for postsynthetic tailoring of MOF properties. In this context, we review the recent progress in vapor processing of MOFs, summarize the underpinning chemistry and principles, and highlight promising directions for future research.
authors.affiliation: Centre for Surface Chemistry and Catalysis, KU Leuven-University of Leuven, Celestijnenlaan 200F, 3001, Leuven, Belgium.
authors.forename: Ivo
authors.identifier: http://orcid.org/0000-0003-3997-653X
authors.initials: I
authors.lastname: Stassen
authors.affiliation: Centre for Surface Chemistry and Catalysis, KU Leuven-University of Leuven, Celestijnenlaan 200F, 3001, Leuven, Belgium.
authors.forename: Dirk
authors.initials: D
authors.lastname: De Vos
authors.affiliation: Centre for Surface Chemistry and Catalysis, KU Leuven-University of Leuven, Celestijnenlaan 200F, 3001, Leuven, Belgium. rob.ameloot@biw.kuleuven.be.
authors.forename: Rob
authors.identifier: http://orcid.org/0000-0003-3178-5480
authors.initials: R
authors.lastname: Ameloot
keywords: atomic layer deposition; chemical vapor deposition; metal-organic frameworks; solvent-free crystallization; vapor processing