title: Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly.
abstract: High-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography.
authors.affiliation: National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. hjjeon@nnfc.re.kr.|Department of Nano-structured Materials Research, Korea National Nanofab Center, Daejeon, 305-701, Republic of Korea. hjjeon@nnfc.re.kr.
authors.forename: Hwan-Jin
authors.initials: HJ
authors.lastname: Jeon
authors.affiliation: National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.|Power Control Device Research Section, Electronics and Telecommunications Research Institute (ETRI), Daejeon, 305-700, Republic of Korea.
authors.forename: Ju Young
authors.initials: JY
authors.lastname: Kim
authors.affiliation: National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
authors.forename: Woo-Bin
authors.initials: WB
authors.lastname: Jung
authors.affiliation: Soft Innovative Materials Research Center, Korea Institute of Science and Technology (KIST), Wanju-gun, Jeollabuk-do, 565-905, Republic of Korea.
authors.forename: Hyeon-Su
authors.initials: HS
authors.lastname: Jeong
authors.affiliation: Advanced Functional Materials Research Group, Korea Research Institute of Chemical Technology (KRICT), Daejeon, 305-600, Republic of Korea.
authors.forename: Yun Ho
authors.initials: YH
authors.lastname: Kim
authors.affiliation: Power Control Device Research Section, Electronics and Telecommunications Research Institute (ETRI), Daejeon, 305-700, Republic of Korea.
authors.forename: Dong Ok
authors.initials: DO
authors.lastname: Shin
authors.affiliation: National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
authors.forename: Seong-Jun
authors.initials: SJ
authors.lastname: Jeong
authors.affiliation: Advanced Photonic Materials and Devices Laboratory, Department of National Research Laboratory, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. qubit@kaist.ac.kr.
authors.forename: Jonghwa
authors.initials: J
authors.lastname: Shin
authors.affiliation: National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. sangouk.kim@kaist.ac.kr.
authors.forename: Sang Ouk
authors.initials: SO
authors.lastname: Kim
authors.affiliation: National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. heetae@kaist.ac.kr.
authors.forename: Hee-Tae
authors.initials: HT
authors.lastname: Jung
keywords: block copolymers; high aspect ratio; high resolution; plasma reaction; secondary sputtering