title: Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics.
abstract: The laser damage precursors in subsurface of fused silica (e.g. photosensitive impurities, scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-frequency ultrasonic agitation, respectively. The comparison of scratches morphology after static etching and high-frequency ultrasonic agitation etching was devoted in our case. And comparison of laser induce damage resistance of scratched and non-scratched fused silica surfaces after HF etching with high-frequency ultrasonic agitation were also investigated in this study. The global laser induce damage resistance was increased significantly after the laser damage precursors were mitigated in this case. The redeposition of reaction produce was avoided by involving multi-frequency ultrasonic and chemical leaching process. These methods made the increase of laser damage threshold more stable. In addition, there is no scratch related damage initiations found on the samples which were treated by Advanced Mitigation Process.
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.|School of Materials, the University of Manchester, Manchester, M13 9PL, United Kingdom.
authors.forename: Xin
authors.initials: X
authors.lastname: Ye
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.|Anhui Institute of Optics and Fine Mechanics, the university of Science and Technology of China, Hefei, Anhui 230026, P. R. China.
authors.forename: Jin
authors.initials: J
authors.lastname: Huang
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.
authors.forename: Hongjie
authors.initials: H
authors.lastname: Liu
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.
authors.forename: Feng
authors.initials: F
authors.lastname: Geng
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.
authors.forename: Laixi
authors.initials: L
authors.lastname: Sun
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.
authors.forename: Xiaodong
authors.initials: X
authors.lastname: Jiang
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.
authors.forename: Weidong
authors.initials: W
authors.lastname: Wu
authors.affiliation: School of Materials, the University of Manchester, Manchester, M13 9PL, United Kingdom.
authors.forename: Liang
authors.initials: L
authors.lastname: Qiao
authors.affiliation: School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu, 610054, P. R. China.
authors.forename: Xiaotao
authors.initials: X
authors.lastname: Zu
authors.affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P. R. China.|IFSA Collaborative Innovation center, Shanghai jiao tong University, Shanghai, 200240, P. R. China.
authors.forename: Wanguo
authors.initials: W
authors.lastname: Zheng