title: Atomic Layer Deposition in Bio-Nanotechnology: A Brief Overview.
abstract: Atomic layer deposition (ALD) is a technique increasingly used in nanotechnology and ultrathin film deposition; it is ideal for films in the nanometer and Angstrom length scales. ALD can effectively be used to modify the surface chemistry and functionalization of engineering-related and biologically important surfaces. It can also be used to alter the mechanical, electrical, chemical, and other properties of materials that are increasingly used in biomedical engineering and biological sciences. ALD is a relatively new technique for optimizing materials for use in bio-nanotechnology. Here, after a brief review of the more widely used modes of ALD and a few of its applications in biotechnology, selected results that show the potential of ALD in bio-nanotechnology are presented. ALD seems to be a promising means for tuning the hydrophilicity/hydrophobicity characteristics of biomedical surfaces, forming conformal ultrathin coatings with desirable properties on biomedical substrates with a high aspect ratio, tuning the antibacterial properties of substrate surfaces of interest, and yielding multifunctional biomaterials for medical implants and other devices.
authors.affiliation: Department of Bioengineering, University of Illinois at Chicago, Chicago, IL.
authors.forename: Arghya K
authors.initials: AK
authors.lastname: Bishal
authors.affiliation: Department of Bioengineering, University of Illinois at Chicago, Chicago, IL.
authors.forename: Arman
authors.initials: A
authors.lastname: Butt
authors.affiliation: Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL.
authors.forename: Sathees K
authors.initials: SK
authors.lastname: Selvaraj
authors.affiliation: Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL.
authors.forename: Bela
authors.initials: B
authors.lastname: Joshi
authors.affiliation: Department of Bioengineering, University of Illinois at Chicago, Chicago, IL; Department of Mechanical Engineering, Michigan Technological University, Houghton, MI.
authors.forename: Sweetu B
authors.initials: SB
authors.lastname: Patel
authors.affiliation: Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL.
authors.forename: Su
authors.initials: S
authors.lastname: Huang
authors.affiliation: Department of Mechanical Engineering, Michigan Technological University, Houghton, MI.
authors.forename: Bin
authors.initials: B
authors.lastname: Yang
authors.affiliation: Department of Bioengineering, University of Illinois at Chicago, Chicago, IL; Department of Mechanical Engineering, Michigan Technological University, Houghton, MI.
authors.forename: Tolou
authors.initials: T
authors.lastname: Shukohfar
authors.affiliation: Department of Restorative Dentistry, University of Illinois at Chicago, Chicago, IL.
authors.forename: Cortino
authors.initials: C
authors.lastname: Sukotjo
authors.affiliation: Department of Bioengineering, University of Illinois at Chicago, Chicago, IL; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL.
authors.forename: Christos G
authors.initials: CG
authors.lastname: Takoudis
mesh_terms: D049329:Nanostructures; D036103:Nanotechnology / Q000379:methods*