title: Electron-Excited X-Ray Microanalysis at Low Beam Energy: Almost Always an Adventure!
abstract: Scanning electron microscopy with energy-dispersive spectrometry has been applied to the analysis of various materials at low-incident beam energies, E 0≤5 keV, using peak fitting and following the measured standards/matrix corrections protocol embedded in the National Institute of Standards and Technology Desktop Spectrum Analyzer-II analytical software engine. Low beam energy analysis provides improved spatial resolution laterally and in-depth. The lower beam energy restricts the atomic shells that can be ionized, reducing the number of X-ray peak families available to the analyst. At E 0=5 keV, all elements of the periodic table except H and He can be measured. As the beam energy is reduced below 5 keV, elements become inaccessible due to lack of excitation of useful characteristic X-ray peaks. The shallow sampling depth of low beam energy microanalysis makes the technique more sensitive to surface compositional modification due to formation of oxides and other reaction layers. Accurate and precise analysis is possible with the use of appropriate standards and by accumulating high count spectra of unknowns and standards (>1 million counts integrated from 0.1 keV to E 0).
authors: Materials Science Measurement Division, National Institutes of Standards and Technology,Gaithersburg,MD 20899,USA.
authors: Dale E
authors: DE
authors: Newbury
authors: Materials Science Measurement Division, National Institutes of Standards and Technology,Gaithersburg,MD 20899,USA.
authors: Nicholas W M
authors: NW
authors: Ritchie
keywords: DTSA-II; EDS; SEM; X-ray; microanalysis