title: Introducing saccharic acid as an efficient iron chelate to enhance photo-Fenton degradation of organic contaminants.
abstract: The identification of iron chelates that can enhance photo-Fenton degradation is of great interest in the field of advanced oxidation process. Saccharic acid (SA) is a polyhydroxy carboxylic acid and completely non-toxic. Importantly, it can effectively bind Fe(III) as well as induce photoreduction of Fe(III). Despite having these interesting properties, the effect of SA on photo-Fenton degradation has not been studied. Herein, we demonstrate the first assessment of SA as an iron chelate in photo-Fenton process using methylene blue (MB) as a model organic contaminant. Our results demonstrate that SA has the ability to (i) enhance the photo-Fenton degradation of MB by about 11 times at pH 4.5 (ii) intensify photochemical reduction of Fe(III) to Fe(II) by about 17 times and (iii) accelerate the rate of consumption of H2O2in photo-Fenton process by about 5 times (iv) increase the TOC reduction by about 2 times and (v) improve the photo-Fenton degradation of MB in the presence of a variety of common inorganic ions and organic matter. The influential properties of SA on photo-Fenton degradation is attributed to the efficient photochemical reduction of Fe(III) via LMCT (ligand to metal charge transfer reaction) to Fe(II), which then activated H2O2to generate OH and accelerated photo-Fenton degradation efficiency. Moreover, the effect of operational parameters such as oxidant: contaminant (H2O2: MB) ratio, catalyst: contaminant (Fe(III)SA: MB) ratio, Fe(III): SA stoichiometry and pH on the degradation of MB by photo-Fenton in the presence of SA is demonstrated. Importantly, SA assisted photo-Fenton caused effective degradation of MB and 4-Chlorophenol under natural sunlight irradiation in natural water matrix. The findings strongly support SA as a deserving iron chelate to enhance photo-Fenton degradation.
authors: Dept. of Chemical Engineering, Indian Institute of Science, Bangalore 560012, India. Electronic address: gokul@chemeng.iisc.ernet.in.
authors: Gokulakrishnan
authors: G
authors: Subramanian
authors: Dept. of Chemical Engineering, Indian Institute of Science, Bangalore 560012, India.
authors: Giridhar
authors: G
authors: Madras
mesh_terms: D005937:Glucaric Acid; D006861:Hydrogen Peroxide / Q000737:chemistry; D007501:Iron / Q000737:chemistry*; D007502:Iron Chelating Agents; D010084:Oxidation-Reduction
chemical_list: D007502:Iron Chelating Agents; D006861:Hydrogen Peroxide; D007501:Iron; D005937:Glucaric Acid
keywords: Advanced oxidation process; Iron chelate; Photo-Fenton; Photocatalytic degradation; Saccharic acid