title: Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization.
abstract: A facile method for the fabrication of a highly sensitive surface relief is demonstrated, which operates on the principle of spatially patterned photopolymerization-induced mass transport in the amorphous films of a series of bisanthracene compounds. The stability of the resultant colorless transparent relief structure is dramatically improved owing to the polymerization of the bisanthracene.
authors: Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University , 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan.
authors: Takashi
authors: T
authors: Ubukata
authors: Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University , 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan.
authors: Megumi
authors: M
authors: Nakayama
authors: Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University , 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan.
authors: Taishi
authors: T
authors: Sonoda
authors: Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University , 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan.
authors: Yasushi
authors: Y
authors: Yokoyama
authors: Research Institute for Sustainable Chemistry (ISCHEM), National Institute of Advanced Industrial Science and Technology (AIST) , Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.
authors: Hideyuki
authors: H
authors: Kihara
keywords: anthracene; photodimerization; photopolymerization; phototriggered mass migration; surface relief structure