title: Perpendicular Magnetic Anisotropy in FePt Patterned Media Employing a CrV Seed Layer.
abstract: A thin FePt film was deposited onto a CrV seed layer at 400°C and showed a high coercivity (~3,400 Oe) and high magnetization (900-1,000 emu/cm(3)) characteristic of L 10 phase. However, the magnetic properties of patterned media fabricated from the film stack were degraded due to the Ar-ion bombardment. We employed a deposition-last process, in which FePt film deposited at room temperature underwent lift-off and post-annealing processes, to avoid the exposure of FePt to Ar plasma. A patterned medium with 100-nm nano-columns showed an out-of-plane coercivity fivefold larger than its in-plane counterpart and a remanent magnetization comparable to saturation magnetization in the out-of-plane direction, indicating a high perpendicular anisotropy. These results demonstrate the high perpendicular anisotropy in FePt patterned media using a Cr-based compound seed layer for the first time and suggest that ultra-high-density magnetic recording media can be achieved using this optimized top-down approach.
authors: Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea.
authors: Hyunsu
authors: H
authors: Kim
authors: Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea.
authors: Jin-Seo
authors: JS
authors: Noh
authors: Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea.
authors: Jong Wook
authors: JW
authors: Roh
authors: Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 136-761, Korea.
authors: Dong Won
authors: DW
authors: Chun
authors: Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 136-761, Korea.
authors: Sungman
authors: S
authors: Kim
authors: Nano Process Division, Korea Advanced Nano Fab. Center, Gyeonggi, 443-270, Korea.
authors: Sang Hyun
authors: SH
authors: Jung
authors: Nano Process Division, Korea Advanced Nano Fab. Center, Gyeonggi, 443-270, Korea.
authors: Ho Kwan
authors: HK
authors: Kang
authors: Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 136-761, Korea.
authors: Won Yong
authors: WY
authors: Jeong
authors: Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea. wooyoung@yonsei.ac.kr.
authors: Wooyoung
authors: W
authors: Lee
keywords: CrV underlayer; E-beam lithography; FePt; Patterned media