title: Defect-Rich Dopant-Free ZrO2 Nanostructures with Superior Dilute Ferromagnetic Semiconductor Properties.
abstract: Control of the spin degree of freedom of an electron has brought about a new era in spin-based applications, particularly spin-based electronics, with the potential to outperform the traditional charge-based semiconductor technology for data storage and information processing. However, the realization of functional spin-based devices for information processing remains elusive due to several fundamental challenges such as the low Curie temperature of group III-V and II-VI semiconductors (<200 K), and the low spin-injection efficiencies of existing III-V, II-VI, and transparent conductive oxide semiconductors in a multilayer device structure, which are caused by precipitation and migration of dopants from the host layer to the adjacent layers. Here, we use catalyst-assisted pulsed laser deposition to grow, for the first time, oxygen vacancy defect-rich, dopant-free ZrO2 nanostructures with high TC (700 K) and high magnetization (5.9 emu/g). The observed magnetization is significantly greater than both doped and defect-rich transparent conductive oxide nanomaterials reported to date. We also provide the first experimental evidence that it is the amounts and types of oxygen vacancy defects in, and not the phase of ZrO2 that control the ferromagnetic order in undoped ZrO2 nanostructures. To explain the origin of ferromagnetism in these ZrO2 nanostructures, we hypothesize a new defect-induced bound polaron model, which is generally applicable to other defect-rich, dopant-free transparent conductive oxide nanostructures. These results provide new insights into magnetic ordering in undoped dilute ferromagnetic semiconductor oxides and contribute to the design of exotic magnetic and novel multifunctional materials.
authors.affiliation: WATLab and Department of Chemistry, University of Waterloo , Waterloo, Ontario N2L 3G1, Canada.
authors.forename: Md Anisur
authors.initials: MA
authors.lastname: Rahman
authors.affiliation: WATLab and Department of Chemistry, University of Waterloo , Waterloo, Ontario N2L 3G1, Canada.
authors.forename: S
authors.initials: S
authors.lastname: Rout
authors.affiliation: WATLab and Department of Chemistry, University of Waterloo , Waterloo, Ontario N2L 3G1, Canada.
authors.forename: Joseph P
authors.initials: JP
authors.lastname: Thomas
authors.affiliation: WATLab and Department of Chemistry, University of Waterloo , Waterloo, Ontario N2L 3G1, Canada.
authors.forename: Donald
authors.initials: D
authors.lastname: McGillivray
authors.affiliation: WATLab and Department of Chemistry, University of Waterloo , Waterloo, Ontario N2L 3G1, Canada.
authors.forename: Kam Tong
authors.initials: KT
authors.lastname: Leung