title: Hydrogen Generation using non-polar coaxial InGaN/GaN Multiple Quantum Well Structure Formed on Hollow n-GaN Nanowires.
abstract: This article demonstrates for the first time to the best of our knowledge, the merits of InGaN/GaN multiple quantum wells (MQWs) grown on hollow n-GaN nanowires (NWs) as a plausible alternative for stable photoelectrochemical water splitting and efficient hydrogen generation. These hollow nanowires are achieved by a growth method rather not by conventional etching process. Therefore this approach becomes simplistic yet most effective. We believe relatively low Ga flux during the selective area growth (SAG) aids the hollow nanowire to grow. To compare the optoelectronic properties, simultaneously solid nanowires are also studied. In this present communication, we exhibit that lower thermal conductivity of hollow n-GaN NWs affects the material quality of InGaN/GaN MQWs by limiting In diffusion. As a result of this improvement in material quality and structural properties, photocurrent and photosensitivity are enhanced compared to the structures grown on solid n-GaN NWs. An incident photon-to-current efficiency (IPCE) of around ~33.3% is recorded at 365 nm wavelength for hollow NWs. We believe that multiple reflections of incident light inside the hollow n-GaN NWs assists in producing a larger amount of electron hole pairs in the active region. As a result the rate of hydrogen generation is also increased.
authors.affiliation: Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Baekje-daero 567, Jeonju 54896, Republic of Korea.
authors.forename: Ji-Hyeon
authors.initials: JH
authors.lastname: Park
authors.affiliation: Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Baekje-daero 567, Jeonju 54896, Republic of Korea.
authors.forename: Arjun
authors.initials: A
authors.lastname: Mandal
authors.affiliation: Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Baekje-daero 567, Jeonju 54896, Republic of Korea.
authors.forename: San
authors.initials: S
authors.lastname: Kang
authors.affiliation: Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Baekje-daero 567, Jeonju 54896, Republic of Korea.
authors.forename: Uddipta
authors.initials: U
authors.lastname: Chatterjee
authors.affiliation: Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Baekje-daero 567, Jeonju 54896, Republic of Korea.
authors.forename: Jin Soo
authors.initials: JS
authors.lastname: Kim
authors.affiliation: Department of physics, Chungnam National University, 220 Gung-dong, Yuseong-gu, Daejeon 34134, South Korea.
authors.forename: Byung-Guon
authors.initials: BG
authors.lastname: Park
authors.affiliation: Department of physics, Chungnam National University, 220 Gung-dong, Yuseong-gu, Daejeon 34134, South Korea.
authors.forename: Moon-Deock
authors.initials: MD
authors.lastname: Kim
authors.affiliation: Department of Polymer Nano Science and Technology, Chonbuk National University, Baekje-daero 567, Jeonju 54896, Republic of Korea.
authors.forename: Kwang-Un
authors.initials: KU
authors.lastname: Jeong
authors.affiliation: Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Baekje-daero 567, Jeonju 54896, Republic of Korea.
authors.forename: Cheul-Ro
authors.initials: CR
authors.lastname: Lee