title: Experiment and simulation of novel liquid crystal plasma mirrors for high contrast, intense laser pulses.
abstract: We describe the first demonstration of plasma mirrors made using freely suspended, ultra-thin films formed dynamically and in-situ. We also present novel particle-in-cell simulations that for the first time incorporate multiphoton ionization and dielectric models that are necessary for describing plasma mirrors. Dielectric plasma mirrors are a crucial component for high intensity laser applications such as ion acceleration and solid target high harmonic generation because they greatly improve pulse contrast. We use the liquid crystal 8CB and introduce an innovative dynamic film formation device that can tune the film thickness so that it acts as its own antireflection coating. Films can be formed at a prolonged, high repetition rate without the need for subsequent realignment. High intensity reflectance above 75% and low-field reflectance below 0.2% are demonstrated, as well as initial ion acceleration experimental results that demonstrate increased ion energy and yield on shots cleaned with these plasma mirrors.
authors.affiliation: The Ohio State University, Columbus, Ohio 43210, USA.
authors.forename: P L
authors.initials: PL
authors.lastname: Poole
authors.affiliation: Institut de Minéralogie et de Physique des Milieux Condensés, UMR CNRS 7590, Université Pierre et Marie Curie, 75005 Paris, France.
authors.forename: A
authors.initials: A
authors.lastname: Krygier
authors.affiliation: The Ohio State University, Columbus, Ohio 43210, USA.
authors.forename: G E
authors.initials: GE
authors.lastname: Cochran
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: P S
authors.initials: PS
authors.lastname: Foster
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: G G
authors.initials: GG
authors.lastname: Scott
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: L A
authors.initials: LA
authors.lastname: Wilson
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: J
authors.initials: J
authors.lastname: Bailey
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: N
authors.initials: N
authors.lastname: Bourgeois
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: C
authors.initials: C
authors.lastname: Hernandez-Gomez
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: D
authors.initials: D
authors.lastname: Neely
authors.affiliation: Central Laser Facility, STFC Rutherford Appleton Laboratory, Oxfordshire OX11 0QX, UK.
authors.forename: P P
authors.initials: PP
authors.lastname: Rajeev
authors.affiliation: The Ohio State University, Columbus, Ohio 43210, USA.
authors.forename: R R
authors.initials: RR
authors.lastname: Freeman
authors.affiliation: The Ohio State University, Columbus, Ohio 43210, USA.
authors.forename: D W
authors.initials: DW
authors.lastname: Schumacher