title: Chemical photoallergy: photobiochemical mechanisms, classification, and risk assessments.
abstract: Chemical photosensitivity can be elicited by exposure of the skin to various pharmaceutical substances, foods, cosmetics and other environmental chemicals, followed by exposure to sunlight. There are at least three types of chemical photosensitivity, i.e., photoirritancy (narrowly defined as phototoxicity), photogenotoxicity and photoallergenicity, and their clinical characteristics and mechanisms are quite different. Concerns about chemical photoallergy is increasing, and various studies have been made to clarify the photobiochemical characteristics of photoallergens and the mechanisms involved. Various methodologies, including in silico prediction models, photochemical assay systems, and in vitro phototoxicity prediction tools, have been developed to predict the photoallergenic potential of chemicals over the past few years. The aim of this manuscript is to review the clinical characteristics, pathogenetic mechanisms and photobiochemical features of photoallergens, with special emphasis on the current status about development of screening systems for predicting photoallergenic potential of chemicals.
authors.affiliation: Department of Pharmacokinetics and Pharmacodynamics, School of Pharmaceutical Sciences, University of Shizuoka, 52-1 Yada, Suruga-ku, Shizuoka 422-8526, Japan. Electronic address: onoue@u-shizuoka-ken.ac.jp.
authors.forename: Satomi
authors.initials: S
authors.lastname: Onoue
authors.affiliation: Department of Pharmacokinetics and Pharmacodynamics, School of Pharmaceutical Sciences, University of Shizuoka, 52-1 Yada, Suruga-ku, Shizuoka 422-8526, Japan.
authors.forename: Yoshiki
authors.initials: Y
authors.lastname: Seto
authors.affiliation: Department of Pharmacokinetics and Pharmacodynamics, School of Pharmaceutical Sciences, University of Shizuoka, 52-1 Yada, Suruga-ku, Shizuoka 422-8526, Japan.
authors.forename: Hideyuki
authors.initials: H
authors.lastname: Sato
authors.affiliation: Shiseido Global Innovation Center, Shiseido Co. Ltd., 2-2-1 Hayabuchi, Tsuzuki-ku, Yokohama-shi, Kanagawa, 226-8553, Japan.
authors.forename: Hayato
authors.initials: H
authors.lastname: Nishida
authors.affiliation: Shiseido Global Innovation Center, Shiseido Co. Ltd., 2-2-1 Hayabuchi, Tsuzuki-ku, Yokohama-shi, Kanagawa, 226-8553, Japan.
authors.forename: Morihiko
authors.initials: M
authors.lastname: Hirota
authors.affiliation: Shiseido Global Innovation Center, Shiseido Co. Ltd., 2-2-1 Hayabuchi, Tsuzuki-ku, Yokohama-shi, Kanagawa, 226-8553, Japan.
authors.forename: Takao
authors.initials: T
authors.lastname: Ashikaga
authors.affiliation: Research Institute for Fragrance Materials, Inc., 50 Tice Boulevard, Woodcliff Lake, NJ, USA.
authors.forename: Anne Marie
authors.initials: AM
authors.lastname: Api
authors.affiliation: DABMEB Consultancy Ltd., 2, Normans Road, Sharnbrook, Bedfordshire MK44 1PR, UK.
authors.forename: David
authors.initials: D
authors.lastname: Basketter
authors.affiliation: Department of Dermatology, Hamamatsu University School of Medicine, 1-20-1 Handayama, Higashi-ku, Hamamatsu 431-3192, Japan.
authors.forename: Yoshiki
authors.initials: Y
authors.lastname: Tokura
mesh_terms: D000485:Allergens / Q000009:adverse effects*; D064419:Chemically-Induced Disorders / Q000209:etiology*; D003358:Cosmetics / Q000009:adverse effects; D017454:Dermatitis, Photoallergic / Q000209:etiology*; D017484:Dermatitis, Phototoxic / Q000209:etiology*; D064420:Drug-Related Side Effects and Adverse Reactions / Q000209:etiology; D006801:Humans; D018570:Risk Assessment; D014466:Ultraviolet Rays / Q000009:adverse effects*
chemical_list: D000485:Allergens; D003358:Cosmetics
keywords: Photoallergen; Photoallergy; Photosafety assessment; Photosensitivity; Phototoxicity