title: Chromatic Aberration Correction for Atomic Resolution TEM Imaging from 20 to 80 kV.
abstract: Atomic resolution in transmission electron microscopy of thin and light-atom materials requires a rigorous reduction of the beam energy to reduce knockon damage. However, at the same time, the chromatic aberration deteriorates the resolution of the TEM image dramatically. Within the framework of the SALVE project, we introduce a newly developed C_{c}/C_{s} corrector that is capable of correcting both the chromatic and the spherical aberration in the range of accelerating voltages from 20 to 80 kV. The corrector allows correcting axial aberrations up to fifth order as well as the dominating off-axial aberrations. Over the entire voltage range, optimum phase-contrast imaging conditions for weak signals from light atoms can be adjusted for an optical aperture of at least 55 mrad. The information transfer within this aperture is no longer limited by chromatic aberrations. We demonstrate the performance of the microscope using the examples of 30 kV phase-contrast TEM images of graphene and molybdenum disulfide, showing unprecedented contrast and resolution that matches image calculations.
authors: Corrected Electron Optical Systems GmbH, Englerstrasse 28, D-69126 Heidelberg, Germany.
authors: Martin
authors: M
authors: Linck
authors: Corrected Electron Optical Systems GmbH, Englerstrasse 28, D-69126 Heidelberg, Germany.
authors: Peter
authors: P
authors: Hartel
authors: Corrected Electron Optical Systems GmbH, Englerstrasse 28, D-69126 Heidelberg, Germany.
authors: Stephan
authors: S
authors: Uhlemann
authors: Corrected Electron Optical Systems GmbH, Englerstrasse 28, D-69126 Heidelberg, Germany.
authors: Frank
authors: F
authors: Kahl
authors: Corrected Electron Optical Systems GmbH, Englerstrasse 28, D-69126 Heidelberg, Germany.
authors: Heiko
authors: H
authors: Müller
authors: Corrected Electron Optical Systems GmbH, Englerstrasse 28, D-69126 Heidelberg, Germany.
authors: Joachim
authors: J
authors: Zach
authors: Corrected Electron Optical Systems GmbH, Englerstrasse 28, D-69126 Heidelberg, Germany.
authors: Max
authors: M
authors: Haider
authors: FEI Company, Achtseweg Noord 5, 5651 GG Eindhoven, Netherlands.
authors: Marcel
authors: M
authors: Niestadt
authors: FEI Company, Achtseweg Noord 5, 5651 GG Eindhoven, Netherlands.
authors: Maarten
authors: M
authors: Bischoff
authors: Central facility of electron microscopy, Ulm University, Albert-Einstein-Allee 11, D-89081 Ulm, Germany.
authors: Johannes
authors: J
authors: Biskupek
authors: Central facility of electron microscopy, Ulm University, Albert-Einstein-Allee 11, D-89081 Ulm, Germany.
authors: Zhongbo
authors: Z
authors: Lee
authors: Central facility of electron microscopy, Ulm University, Albert-Einstein-Allee 11, D-89081 Ulm, Germany.
authors: Tibor
authors: T
authors: Lehnert
authors: Central facility of electron microscopy, Ulm University, Albert-Einstein-Allee 11, D-89081 Ulm, Germany.
authors: Felix
authors: F
authors: Börrnert
authors: Central facility of electron microscopy, Ulm University, Albert-Einstein-Allee 11, D-89081 Ulm, Germany.
authors: Harald
authors: H
authors: Rose
authors: Central facility of electron microscopy, Ulm University, Albert-Einstein-Allee 11, D-89081 Ulm, Germany.
authors: Ute
authors: U
authors: Kaiser