title: Solvent-Assisted Gel Printing for Micropatterning Thin Organic-Inorganic Hybrid Perovskite Films.
abstract: While tremendous efforts have been made for developing thin perovskite films suitable for a variety of potential photoelectric applications such as solar cells, field-effect transistors, and photodetectors, only a few works focus on the micropatterning of a perovskite film which is one of the most critical issues for large area and uniform microarrays of perovskite-based devices. Here we demonstrate a simple but robust method of micropatterning a thin perovskite film with controlled crystalline structure which guarantees to preserve its intrinsic photoelectric properties. A variety of micropatterns of a perovskite film are fabricated by either microimprinting or transfer-printing a thin spin-coated precursor film in soft-gel state with a topographically prepatterned elastomeric poly(dimethylsiloxane) (PDMS) mold, followed by thermal treatment for complete conversion of the precursor film to a perovskite one. The key materials development of our solvent-assisted gel printing is to prepare a thin precursor film with a high-boiling temperature solvent, dimethyl sulfoxide. The residual solvent in the precursor gel film makes the film moldable upon microprinting with a patterned PDMS mold, leading to various perovskite micropatterns in resolution of a few micrometers over a large area. Our nondestructive micropatterning process does not harm the intrinsic photoelectric properties of a perovskite film, which allows for realizing arrays of parallel-type photodetectors containing micropatterns of a perovskite film with reliable photoconduction performance. The facile transfer of a micropatterned soft-gel precursor film on other substrates including mechanically flexible plastics can further broaden its applications to flexible photoelectric systems.
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Beomjin
authors: B
authors: Jeong
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Ihn
authors: I
authors: Hwang
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Sung Hwan
authors: SH
authors: Cho
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Eui Hyuk
authors: EH
authors: Kim
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Soonyoung
authors: S
authors: Cha
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Jinseong
authors: J
authors: Lee
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Han Sol
authors: HS
authors: Kang
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Suk Man
authors: SM
authors: Cho
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Hyunyong
authors: H
authors: Choi
authors: Department of Materials Science and Engineering and ‡School of Electrical and Electronic Engineering, Yonsei University , Yonsei-ro 50, Seodaemun-gu, Seoul, 03722 Republic of Korea.
authors: Cheolmin
authors: C
authors: Park
keywords: controlled crystallization; dimethyl sulfoxide; imprinting; micropatterns; organic−inorganic hybrid perovskite films; photodetector; solvent-assisted gel printing; transfer printing