title: Note: Triggering behavior of a vacuum arc plasma source.
abstract: Axial symmetry of discharge is very important for application of vacuum arc plasma. It is discovered that the triggering method is a significant factor that would influence the symmetry of arc discharge at the final stable stage. Using high-speed multiframe photography, the transition processes from cathode-trigger discharge to cathode-anode discharge were observed. It is shown that the performances of the two triggering methods investigated are quite different. Arc discharge triggered by independent electric source can be stabilized at the center of anode grid, but it is difficult to achieve such good symmetry through resistance triggering. It is also found that the triggering process is highly correlated to the behavior of emitted electrons.
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: C H
authors: CH
authors: Lan
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: J D
authors: JD
authors: Long
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: L
authors: L
authors: Zheng
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: P
authors: P
authors: Dong
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: Z
authors: Z
authors: Yang
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: J
authors: J
authors: Li
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: T
authors: T
authors: Wang
authors: Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, People's Republic of China.
authors: J L
authors: JL
authors: He