Engineering Surfaces through Sequential Stop-Flow Photopatterning.
Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.
Materials Research Laboratory (MRL), University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.|Materials Department, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
Christian W
CW
Pester
Materials Research Laboratory (MRL), University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.|Department of Chemistry and Biochemistry, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
Benjaporn
B
Narupai
Materials Research Laboratory (MRL), University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.|Department of Chemistry and Biochemistry, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
Kaila M
KM
Mattson
Department of Mechanical and Environmental Engineering, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
David P
DP
Bothman
Institut für Pharmazie, Freie Universität Berlin, 14195, Berlin, Germany.
Daniel
D
Klinger
Department of Physics, University of California, Santa Barbara, CA, 93106, USA.
Kenneth W
KW
Lee
Materials Research Laboratory (MRL), University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.|Department of Chemistry and Biochemistry, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
Emre H
EH
Discekici
Materials Research Laboratory (MRL), University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.|Materials Department, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.|Department of Chemistry and Biochemistry, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
Craig J
CJ
Hawker
flow chemistry; lithography; patterning; photochemistry; polymer surfaces