title: A flexible method for the preparation of thin film samples for in situ TEM characterization combining shadow-FIB milling and electron-beam-assisted etching.
abstract: A new method for the preparation of freestanding thin film samples for mechanical testing in transmission electron microscopes is presented. It is based on a combination of focused ion beam (FIB) milling and electron-beam-assisted etching with xenon difluoride (XeF2) precursor gas. The use of the FIB allows for the target preparation of microstructural defects and enables well-defined sample geometries which can be easily adapted in order to meet the requirements of various testing setups. In contrast to existing FIB-based preparation approaches, the area of interest is never exposed to ion beam irradiation which preserves a pristine microstructure. The method can be applied to a wide range of thin film material systems compatible with XeF2etching. Its feasibility is demonstrated for gold and alloyed copper thin films and its practical application is discussed.
authors.affiliation: Department of Materials Science and Engineering, Institute I, Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Martensstr. 5, 91058 Erlangen, Germany. Electronic address: jan.p.liebig@fau.de.
authors.forename: J P
authors.initials: JP
authors.lastname: Liebig
authors.affiliation: Department of Materials Science and Engineering, Institute I, Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Martensstr. 5, 91058 Erlangen, Germany.
authors.forename: M
authors.initials: M
authors.lastname: Göken
authors.affiliation: Max Planck Institute for Intelligent Systems, Heisenbergstr. 3, 70569 Stuttgart, Germany.
authors.forename: G
authors.initials: G
authors.lastname: Richter
authors.affiliation: Institute of Micro, and Nanostructure Research & Center for Nanoanalysis and Electron Microscopy (CENEM), Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Cauerstr. 6, 91058 Erlangen, Germany.
authors.forename: M
authors.initials: M
authors.lastname: Mačković
authors.affiliation: Institute of Micro, and Nanostructure Research & Center for Nanoanalysis and Electron Microscopy (CENEM), Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Cauerstr. 6, 91058 Erlangen, Germany.
authors.forename: T
authors.initials: T
authors.lastname: Przybilla
authors.affiliation: Institute of Micro, and Nanostructure Research & Center for Nanoanalysis and Electron Microscopy (CENEM), Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Cauerstr. 6, 91058 Erlangen, Germany.
authors.forename: E
authors.initials: E
authors.lastname: Spiecker
authors.affiliation: G. W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0405, USA.
authors.forename: O N
authors.initials: ON
authors.lastname: Pierron
authors.affiliation: Department of Materials Science and Engineering, Institute I, Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Martensstr. 5, 91058 Erlangen, Germany.
authors.forename: B
authors.initials: B
authors.lastname: Merle
keywords: Electron-beam-assisted etching; FIB; Micromechanical testing; Thin films; XeF2