title: Radiation endurance in Al2O3nanoceramics.
abstract: The lack of suitable materials solutions stands as a major challenge for the development of advanced nuclear systems. Most issues are related to the simultaneous action of high temperatures, corrosive environments and radiation damage. Oxide nanoceramics are a promising class of materials which may benefit from the radiation tolerance of nanomaterials and the chemical compatibility of ceramics with many highly corrosive environments. Here, using thin films as a model system, we provide new insights into the radiation tolerance of oxide nanoceramics exposed to increasing damage levels at 600 °C -namely 20, 40 and 150 displacements per atom. Specifically, we investigate the evolution of the structural features, the mechanical properties, and the response to impact loading of Al2O3thin films. Initially, the thin films contain a homogeneous dispersion of nanocrystals in an amorphous matrix. Irradiation induces crystallization of the amorphous phase, followed by grain growth. Crystallization brings along an enhancement of hardness, while grain growth induces softening according to the Hall-Petch effect. During grain growth, the excess mechanical energy is dissipated by twinning. The main energy dissipation mechanisms available upon impact loading are lattice plasticity and localized amorphization. These mechanisms are available in the irradiated material, but not in the as-deposited films.
authors.affiliation: Center for Nano Science and Technology @PoliMi, Istituto Italiano di Tecnologia, Via Pascoli 70/3, 20133 Milano (MI), Italia.
authors.forename: F
authors.initials: F
authors.lastname: García Ferré
authors.affiliation: Department of Engineering Physics, University of Wisconsin-Madison, 1500 Engineering Drive, 53715 Wisconsin (WI), USA.
authors.forename: A
authors.initials: A
authors.lastname: Mairov
authors.affiliation: Smart Materials, Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova (GE), Italia.
authors.forename: L
authors.initials: L
authors.lastname: Ceseracciu
authors.affiliation: Laboratoire JANNUS, DEN-Service de Recherches de Métallurgie Physique, CEA, Université Paris Saclay, F-91191 Gif-Sur-Yvette, France.
authors.forename: Y
authors.initials: Y
authors.lastname: Serruys
authors.affiliation: Laboratoire JANNUS, DEN-Service de Recherches de Métallurgie Physique, CEA, Université Paris Saclay, F-91191 Gif-Sur-Yvette, France.
authors.forename: P
authors.initials: P
authors.lastname: Trocellier
authors.affiliation: CNRS/IN2P3/CSNSM/SEMIRAMIS/JANNUS-Orsay, Université Paris Sud, Bat. 108, 91400 Orsay, France.
authors.forename: C
authors.initials: C
authors.lastname: Baumier
authors.affiliation: CNRS/IN2P3/CSNSM/SEMIRAMIS/JANNUS-Orsay, Université Paris Sud, Bat. 108, 91400 Orsay, France.
authors.forename: O
authors.initials: O
authors.lastname: Kaïtasov
authors.affiliation: Department of Nanochemistry, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova (GE), Italia.
authors.forename: R
authors.initials: R
authors.lastname: Brescia
authors.affiliation: Dipartimento di Chimica, Materiali ed Ingegneria dei Materiali, Politecnico di Milano, Via Mancinelli 7, 20131 Milano (MI), Italia.
authors.forename: D
authors.initials: D
authors.lastname: Gastaldi
authors.affiliation: Dipartimento di Chimica, Materiali ed Ingegneria dei Materiali, Politecnico di Milano, Via Mancinelli 7, 20131 Milano (MI), Italia.
authors.forename: P
authors.initials: P
authors.lastname: Vena
authors.affiliation: Dipartimento di Energia, Politecnico di Milano, Via Ponzio 34/3, 20133 Milano (MI), Italia.
authors.forename: M G
authors.initials: MG
authors.lastname: Beghi
authors.affiliation: Laboratoire JANNUS, DEN-Service de Recherches de Métallurgie Physique, CEA, Université Paris Saclay, F-91191 Gif-Sur-Yvette, France.
authors.forename: L
authors.initials: L
authors.lastname: Beck
authors.affiliation: Department of Engineering Physics, University of Wisconsin-Madison, 1500 Engineering Drive, 53715 Wisconsin (WI), USA.
authors.forename: K
authors.initials: K
authors.lastname: Sridharan
authors.affiliation: Center for Nano Science and Technology @PoliMi, Istituto Italiano di Tecnologia, Via Pascoli 70/3, 20133 Milano (MI), Italia.
authors.forename: F
authors.initials: F
authors.lastname: Di Fonzo