The effect of rod orientation on electrical anisotropy in silver nanowire networks for ultra-transparent electrodes.
Two-dimensional networks made of metal nanowires are excellent paradigms for the experimental observation of electrical percolation caused by continuous jackstraw-like physical pathways. Such systems became very interesting as alternative material in transparent electrodes, which are fundamental components in display devices. This work presents the experimental characterization of low-haze and ultra-transparent electrodes based on silver nanowires. The films are created by dip-coating, a feasible and scalable liquid film coating technique. We have found dominant alignment of the silver nanowires in withdrawal direction. The impact of this structural anisotropy on electrical anisotropy becomes more pronounced for low area coverage. The rod alignment does not influence the technical usability of the films as significant electrical anisotropy occurs only at optical transmission higher than 99 %. For films with lower transmission, electrical anisotropy becomes negligible. In addition to the experimental work, we have carried out computational studies in order to explain our findings further and compare them to our experiments and previous literature. This paper presents the first experimental observation of electrical anisotropy in two-dimensional silver nanowire networks close at the percolation threshold.
Graduate School of Excellence in Advanced Manufacturing Engineering, University of Stuttgart, Nobelstr. 12, 70569 Stuttgart, Germany.|Fraunhofer Institute for Manufacturing Engineering and Automation, Nobelstr. 12, 70569 Stuttgart, Germany.
Thomas
T
Ackermann
Fraunhofer Institute for Manufacturing Engineering and Automation, Nobelstr. 12, 70569 Stuttgart, Germany.|Institute for Industrial Manufacturing and Management, University of Stuttgart, Allmandring 35, 70569 Stuttgart, Germany.
Raphael
R
Neuhaus
Alan G. MacDiarmid NanoTech Institute, University of Texas at Dallas, 800 West Campbell Rd., Richardson, TX 75080, USA.|Sineurop Nanotech GmbH, Muenchner Freiheit 6, 80802 Munich, Germany.
Siegmar
S
Roth
Nanotechnology. 2011 Feb 18;22(7):075201
21233544
Nano Lett. 2015 Oct 14;15(10):6722-6
26390188
Nanotechnology. 2013 Nov 15;24(45):452001
24121527
Nat Nanotechnol. 2010 Aug;5(8):574-8
20562870
ACS Nano. 2012 Nov 27;6(11):9737-44
23038980
Phys Rev E Stat Nonlin Soft Matter Phys. 2010 Feb;81(2 Pt 1):021120
20365543
Chem Soc Rev. 2010 Jul;39(7):2477-83
20502813
Phys Chem Chem Phys. 2015 Mar 14;17(10):6874-80
25673219
J Colloid Interface Sci. 2011 Feb 1;354(1):359-63
21094494
Nanoscale. 2015 Nov 7;7(41):17410-23
26437607
Adv Mater. 2011 Apr 5;23(13):1482-513
21322065
Sci Rep. 2014 Apr 25;4:4804
24763208
Adv Mater. 2014 Oct 22;26(39):6670-87
25252266
Phys Rev E Stat Nonlin Soft Matter Phys. 2013 Apr;87(4):042106
23679372
ACS Nano. 2010 Dec 28;4(12):7064-72
21133390
Sci Rep. 2015 May 15;5:10219
25976936
Phys Rev E Stat Nonlin Soft Matter Phys. 2009 Oct;80(4 Pt 1):040104
19905260
ACS Nano. 2013 Sep 24;7(9):7654-63
23930701
Phys Rev E Stat Nonlin Soft Matter Phys. 2011 Dec;84(6 Pt 1):062701
22304136
Adv Mater. 2014 Apr 2;26(13):1958-91
24591083
Science. 1994 Sep 30;265(5181):2096-8
7522347
Adv Mater. 2011 Oct 11;23(38):4371-5
21861269
Nanoscale. 2012 Mar 21;4(6):1996-2004
22349106