The development of the spatially correlated adjustment wavelet filter for atomic force microscopy data.
In this paper a novel approach for the practical utilization of the 2D wavelet filter in terms of the artifacts removal from atomic force microscopy measurements results is presented. The utilization of additional data such as summary photodiode signal map is implemented in terms of the identification of the areas requiring the data processing, filtering settings optimization and the verification of the process performance. Such an approach allows to perform the filtering parameters adjustment by average user, while the straightforward method requires an expertise in this field. The procedure was developed as the function of the Gwyddion software. The examples of filtering the phase imaging and Electrostatic Force Microscopy measurement result are presented. As the wavelet filtering feature may remove a local artifacts, its superior efficiency over similar approach with 2D Fast Fourier Transformate based filter (2D FFT) can be noticed.
Electrotechnical Institute, Division of Electrotechnology and Materials Science, M. Skłodowskiej-Curie 55/61, 50-369 Wrocław, Poland. Electronic address: sikora@iel.wroc.pl.
Andrzej
A
Sikora
Faculty of Electronics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland.
Aleksander
A
Rodak
Institute of Computer Engineering, Control and Robotics, Faculty of Electronics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland.
Olgierd
O
Unold
Czech Metrology Institute, Okružní 31, 638 00 Brno, Czech Republic.
Petr
P
Klapetek
Artifacts removal; Atomic force microscopy; Data processing; Wavelet filter