title: The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint.
abstract: Based on a silica sol-gel technique, highly-structurally ordered silica photonic structures were fabricated by UV lithography and hot manual nanoimprint efforts, which makes large-scale fabrication of silica photonic crystals easy and results in low-cost. These photonic structures show perfect periodicity, smooth and flat surfaces and consistent aspect ratios, which are checked by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In addition, glass substrates with imprinted photonic nanostructures show good diffraction performance in both transmission and reflection mode. Furthermore, the reflection efficiency can be enhanced by 5 nm Au nanoparticle coating, which does not affect the original imprint structure. Also the refractive index and dielectric constant of the imprinted silica is close to that of the dielectric layer in nanodevices. In addition, the polarization characteristics of the reflected light can be modulated by stripe nanostructures through changing the incident light angle. The experimental findings match with theoretical results, making silica photonic nanostructures functional integration layers in many optical or optoelectronic devices, such as LED and microlasers to enhance the optical performance and modulate polarization properties in an economical and large-scale way.
authors.affiliation: Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, Institute of Physics, Beijing Institute of Technology, Beijing 100081, China.
authors.forename: Shuai
authors.initials: S
authors.lastname: Guo
authors.affiliation: School of Instrument Science and Opto-electronic Engineering, Beijing University of Information Science &Technology, Beijing 100192, China.
authors.forename: Chunhui
authors.initials: C
authors.lastname: Niu
authors.affiliation: Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, Institute of Physics, Beijing Institute of Technology, Beijing 100081, China.
authors.forename: Liang
authors.initials: L
authors.lastname: Liang
authors.affiliation: Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, Institute of Physics, Beijing Institute of Technology, Beijing 100081, China.
authors.forename: Ke
authors.initials: K
authors.lastname: Chai
authors.affiliation: Beijing institute of metrology, Beijing 100029, China.
authors.forename: Yaqing
authors.initials: Y
authors.lastname: Jia
authors.affiliation: Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, Institute of Physics, Beijing Institute of Technology, Beijing 100081, China.
authors.forename: Fangyin
authors.initials: F
authors.lastname: Zhao
authors.affiliation: Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, Institute of Physics, Beijing Institute of Technology, Beijing 100081, China.
authors.forename: Ya
authors.initials: Y
authors.lastname: Li
authors.affiliation: Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, Institute of Physics, Beijing Institute of Technology, Beijing 100081, China.
authors.forename: Bingsuo
authors.initials: B
authors.lastname: Zou
authors.affiliation: Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, Institute of Physics, Beijing Institute of Technology, Beijing 100081, China.
authors.forename: Ruibin
authors.initials: R
authors.lastname: Liu