title: UV-Induced Disulfide Formation and Reduction for Dynamic Photopatterning.
abstract: UV-induced disulfide formation (UV-DF) and disulfide reduction (UV-DR) reactions for surface functionalization and dynamic photopatterning are presented. Both photochemical reactions allow for the spatially and temporally controlled, reversible transition between thiol- and disulfide-functionalized surfaces. The dynamic photopatterning strategy was demonstrated by the UV-induced attachment, exchange, and detachment on thiol-modified substrates.
authors.affiliation: Institute of Toxicology and Genetics (ITG), Karlsruhe Institute of Technology (KIT), 76021, Karlsruhe, Germany.
authors.forename: Lei
authors.initials: L
authors.lastname: Li
authors.affiliation: Institute of Toxicology and Genetics (ITG), Karlsruhe Institute of Technology (KIT), 76021, Karlsruhe, Germany.|Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, 69120, Heidelberg, Germany.
authors.forename: Wenqian
authors.initials: W
authors.lastname: Feng
authors.affiliation: Institute of Functional Interfaces (IFG), KIT, Germany.|Karlsruhe Nano Micro Facility (KNMF), Germany.
authors.forename: Alexander
authors.initials: A
authors.lastname: Welle
authors.affiliation: Institute of Toxicology and Genetics (ITG), Karlsruhe Institute of Technology (KIT), 76021, Karlsruhe, Germany. levkin@kit.edu.
authors.forename: Pavel A
authors.identifier: 0000-0002-5975-948X
authors.initials: PA
authors.lastname: Levkin
keywords: disulfide formation; disulfide reduction; dynamic photopatterning; photochemistry; surface modification