title: Comparative Study of the Oxidation of NiAl(100) by Molecular Oxygen and Water Vapor Using Ambient-Pressure X-ray Photoelectron Spectroscopy.
abstract: The oxidation behavior of NiAl(100) by molecular oxygen and water vapor under a near-ambient pressure of 0.2 Torr is monitored using ambient-pressure X-ray photoelectron spectroscopy. O2exposure leads to the selective oxidation of Al at temperatures ranging from 40 to 500 °C. By contrast, H2O exposure results in the selective oxidation of Al at 40 and 200 °C, and increasing the oxidation temperature above 300 °C leads to simultaneous formation of both Al and Ni oxides. These results demonstrate that the O2oxidation forms a nearly stoichiometric Al2O3structure that provides improved protection to the metallic substrate by barring the outward diffusion of metals. By contrast, the H2O oxidation results in the formation of a defective oxide layer that allows outward diffusion of Ni at elevated temperatures for simultaneous NiO formation.
authors.affiliation: Department of Mechanical Engineering & Multidisciplinary Program in Materials Science and Engineering, State University of New York , Binghamton, New York 13902, United States.
authors.forename: Qianqian
authors.initials: Q
authors.lastname: Liu
authors.affiliation: Department of Mechanical Engineering & Multidisciplinary Program in Materials Science and Engineering, State University of New York , Binghamton, New York 13902, United States.
authors.forename: Hailang
authors.initials: H
authors.lastname: Qin
authors.affiliation: Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973, United States.
authors.forename: Jorge Anibal
authors.initials: JA
authors.lastname: Boscoboinik
authors.affiliation: Department of Mechanical Engineering & Multidisciplinary Program in Materials Science and Engineering, State University of New York , Binghamton, New York 13902, United States.
authors.forename: Guangwen
authors.initials: G
authors.lastname: Zhou