title: Enhanced Electrical Resistivity and Properties via Ion Bombardment of Ferroelectric Thin Films.
abstract: A novel approach to on-demand improvement of electronic properties in complex-oxide ferroelectrics is demonstrated whereby ion bombardment - commonly used in classic semiconductor materials - is applied to the PbTiO3system. The result is deterministic reduction in leakage currents by 5 orders of magnitude, improved ferroelectric switching, and unprecedented insights into the nature of defects and intergap state evolution in these materials.
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.
authors.forename: Sahar
authors.initials: S
authors.lastname: Saremi
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.
authors.forename: Ruijuan
authors.initials: R
authors.lastname: Xu
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.
authors.forename: Liv R
authors.initials: LR
authors.lastname: Dedon
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.|Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
authors.forename: Julia A
authors.initials: JA
authors.lastname: Mundy
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.|Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
authors.forename: Shang-Lin
authors.initials: SL
authors.lastname: Hsu
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.|Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
authors.forename: Zuhuang
authors.initials: Z
authors.lastname: Chen
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.
authors.forename: Anoop R
authors.initials: AR
authors.lastname: Damodaran
authors.affiliation: Radiant Technologies, Inc, 2835 Pan American Fwy., Ste. B/C, Albuquerque, NM, 87107, USA.
authors.forename: Scott P
authors.initials: SP
authors.lastname: Chapman
authors.affiliation: Radiant Technologies, Inc, 2835 Pan American Fwy., Ste. B/C, Albuquerque, NM, 87107, USA.
authors.forename: Joseph T
authors.initials: JT
authors.lastname: Evans
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA.|Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
authors.forename: Lane W
authors.initials: LW
authors.lastname: Martin
keywords: electrical resistivity; ferroelectric; ion bombardment; lead titanate; thin films