title: Orientation Control of Block Copolymers Using Surface Active, Phase-Preferential Additives.
abstract: Orientation control of thin film nanostructures derived from block copolymers (BCPs) are of great interest for various emerging technologies like separation membranes, nanopatterning, and energy storage. While many BCP compositions have been developed for these applications, perpendicular orientation of these BCP domains is still very challenging to achieve. Herein we report on a new, integration-friendly approach in which small amounts of a phase-preferential, surface active polymer (SAP) was used as an additive to a polycarbonate-containing BCP formulation to obtain perpendicularly oriented domains with 19 nm natural periodicity upon thermal annealing. In this work, the vertically oriented BCP domains were used to demonstrate next generation patterning applications for advanced semiconductor nodes. Furthermore, these domains were used to demonstrate pattern transfer into a hardmask layer via commonly used etch techniques and graphoepitaxy-based directed self-assembly using existing lithographic integration schemes. We believe that this novel formulation-based approach can easily be extended to other applications beyond nanopatterning.
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Ankit
authors.initials: A
authors.lastname: Vora
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Kristin
authors.initials: K
authors.lastname: Schmidt
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Gabriela
authors.initials: G
authors.lastname: Alva
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Noel
authors.initials: N
authors.lastname: Arellano
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Teddie
authors.initials: T
authors.lastname: Magbitang
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Anindarupa
authors.initials: A
authors.lastname: Chunder
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Leslie E
authors.initials: LE
authors.lastname: Thompson
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Elizabeth
authors.initials: E
authors.lastname: Lofano
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Jed W
authors.initials: JW
authors.lastname: Pitera
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Joy Y
authors.initials: JY
authors.lastname: Cheng
authors.affiliation: IBM Research-Almaden, 650 Harry Rd., San Jose, California 95120, United States.
authors.forename: Daniel P
authors.initials: DP
authors.lastname: Sanders
keywords: aliphatic polycarbonates; block copolymers; directed self-assembly; hexafluoroalcohol; high-χ; surface active polymers; thin film self-assembly