title: Vacancy-Induced Semiconductor-Insulator-Metal Transitions in Nonstoichiometric Nickel and Tungsten Oxides.
abstract: Metal-insulator transitions in strongly correlated oxides induced by electrochemical charging have been attributed to formation of vacancy defects. However, the role of native defects in affecting these transitions is not clear. Here, we report a new type of phase transition in p-type, nonstoichiometric nickel oxide involving a semiconductor-to-insulator-to-metal transition along with the complete reversal of conductivity from p- to n-type at room temperature induced by electrochemical charging in a Li+-containing electrolyte. Direct observation of vacancy-ion interactions using in situ near-infrared photoluminescence spectroscopy show that the transition is a result of passivation of native nickel (cationic) vacancy defects and subsequent formation of oxygen (anionic) vacancy defects driven by Li+insertion into the lattice. Changes in the oxidation states of nickel due to defect interactions probed by X-ray photoemission spectroscopy support the above conclusions. In contrast, n-type, nonstoichiometric tungsten oxide shows only insulator-to-metal transition, which is a result of oxygen vacancy formation. The defect-property correlations shown here in these model systems can be extended to other oxides.
authors.affiliation: Howard P. Isermann Department of Chemical and Biological Engineering and ‡Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute , Troy, New York 12180, United States.
authors.forename: Qi
authors.initials: Q
authors.lastname: Wang
authors.affiliation: Howard P. Isermann Department of Chemical and Biological Engineering and ‡Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute , Troy, New York 12180, United States.
authors.forename: Ajinkya
authors.initials: A
authors.lastname: Puntambekar
authors.affiliation: Howard P. Isermann Department of Chemical and Biological Engineering and ‡Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute , Troy, New York 12180, United States.
authors.forename: Vidhya
authors.initials: V
authors.lastname: Chakrapani
keywords: Li+ insertion; Nickel oxide; electronic structure; metal-to-insulator transition; vacancy defects