title: Electrical Contacts on Silicon Nanowires Produced by Metal-Assisted Etching: a Comparative Approach.
abstract: Silicon nanowires fabricated by metal-assisted chemical etching can present low porosity and a rough surface depending on the doping level of the original silicon wafer. In this case, wiring of silicon nanowires may represent a challenging task. We investigated two different approaches to realize the electrical contacts in order to enable electrical measurement on a rough silicon nanowire device: we compared FIB-assisted platinum deposition for the fabrication of electrical contact with EBL technique.
authors.affiliation: Nanoscience and Materials Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, 10135, Turin, Italy. l.dortenzi@inrim.it.
authors.forename: L
authors.initials: L
authors.lastname: D'Ortenzi
authors.affiliation: Nanoscience and Materials Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, 10135, Turin, Italy.|Politecnico di Torino, Corso Duca degli Abruzzi, 24, 10129, Turin, Italy.
authors.forename: R
authors.initials: R
authors.lastname: Monsù
authors.affiliation: Nanoscience and Materials Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, 10135, Turin, Italy.|Politecnico di Torino, Corso Duca degli Abruzzi, 24, 10129, Turin, Italy.
authors.forename: E
authors.initials: E
authors.lastname: Cara
authors.affiliation: Nanoscience and Materials Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, 10135, Turin, Italy.
authors.forename: M
authors.initials: M
authors.lastname: Fretto
authors.affiliation: Nanoscience and Materials Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, 10135, Turin, Italy.|Department of Chemical Engineering, Faculty of Technology, University of Blida 1, route de SOUMÂA B.P. 270, 09000, Blida, Algeria.|Centre de Recherche en Technologie des Semi-conducteurs pour l'Energétique (CRTSE), Thin Films, Surface and Interface Division, 02, Bd. Dr. Frantz Fanon, B.P. 140, Alger-7 Merveilles, 16038, Algiers, Algeria.
authors.forename: S
authors.initials: S
authors.lastname: Kara
authors.affiliation: Nanoscience and Materials Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, 10135, Turin, Italy.|Università di Camerino, Via Madonna delle Carceri 9, 62032, Camerino, Italy.
authors.forename: S J
authors.initials: SJ
authors.lastname: Rezvani
authors.affiliation: Nanoscience and Materials Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, 10135, Turin, Italy.
authors.forename: L
authors.initials: L
authors.lastname: Boarino
keywords: Electrical contacts; Electron beam lithography; Focused ion beam; Metal-assisted chemical etching; Nanosphere lithography; Rough surface; Schottky barrier; Silicon nanowires