title: Structural and Magnetoresistive Properties of Nanometric Films Based on Iron and Chromium Oxides on the Si Substrate.
abstract: Ultraviolet photons of KrF laser (248 nm) was used for the synthesis of nanometric films based on iron and chromium oxides (Fe2O3 - X(0 ≤ x ≤ 1) and Cr3 - XO3 - Y(0 ≤ x ≤ 2; 0 ≤ y ≤ 2)) with variable thickness, stoichiometry, and electrical properties. Film deposition was carried out on the silicon substrate Si < 100 > at the substrate's temperature TS= 293 K. X-ray diffraction and X-ray reflectometry analysis were used for the obtained structure characterization. Such a combined investigation reveals the composition and texture for samples investigated and provides useful information about layer thickness and roughness. Fe2O3 - X(0 ≤ x ≤ 1) nanometric films demonstrate the negative magnetoresistance in magnetic fields up 7 kOe. At the same time, for hybrid systems of the alternate layers Fe2O3 - X(0 ≤ x ≤ 1)/Cr3 - XO3 - Y(0 ≤ x ≤ 2; 0 ≤ y ≤ 2), the positive magnetoresistance as well as the magnetic hysteresis and magnetoresistivity switching effect in the low magnetic fields were observed.
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41 Nauky Ave., Kyiv, 03028, Ukraine.
authors.forename: Aleksey B
authors.initials: AB
authors.lastname: Smirnov
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41 Nauky Ave., Kyiv, 03028, Ukraine.
authors.forename: Serhii B
authors.initials: SB
authors.lastname: Kryvyi
authors.affiliation: G. Kurdyumov Institute for Metal Physics, National Academy of Sciences of Ukraine, 36 Vernadsky Blvd, Kyiv, 03142, Ukraine.
authors.forename: Sergii A
authors.initials: SA
authors.lastname: Mulenko
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41 Nauky Ave., Kyiv, 03028, Ukraine. marialeos@ukr.net.
authors.forename: Maria L
authors.initials: ML
authors.lastname: Sadovnikova
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41 Nauky Ave., Kyiv, 03028, Ukraine.
authors.forename: Rada K
authors.initials: RK
authors.lastname: Savkina
authors.affiliation: National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, Măgurele, PO Box MG-36, Bucharest, 077125, Romania.
authors.forename: Nicolaie
authors.initials: N
authors.lastname: Stefan
keywords: Magnetoresistivity; Nanometric films; Transitional metal oxides