title: Designs and processes toward high-aspect-ratio nanostructures at the deep nanoscale: unconventional nanolithography and its applications.
abstract: The patterning of high-resolution-featured deep-nanoscale structures with a high aspect ratio (AR) has received increasing attention in recent years as a promising technique for a wide range of applications, including electrical, optical, mechanical and biological systems. Despite extensive efforts to develop viable nanostructure fabrication processes, a superior technique enabling defect-free, high-resolution control over a large area is still required. In this review, we focus on recent important advances in the designs and processes of high-resolution nanostructures possessing a high AR, including hierarchical and 3D patterns. The unique applications of these materials are also discussed.
authors: School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon 440-746, Korea.
authors: Sori
authors: S
authors: Lee
authors: Byeonghak
authors: B
authors: Park
authors: Jun Sik
authors: JS
authors: Kim
authors: Tae-Il
authors: TI
authors: Kim