title: Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics.
abstract: This paper reports an array-designed C84-embedded Si substrate fabricated using a controlled self-assembly method in an ultra-high vacuum chamber. The characteristics of the C84-embedded Si surface, such as atomic resolution topography, local electronic density of states, band gap energy, field emission properties, nanomechanical stiffness, and surface magnetism, were examined using a variety of surface analysis techniques under ultra, high vacuum (UHV) conditions as well as in an atmospheric system. Experimental results demonstrate the high uniformity of the C84-embedded Si surface fabricated using a controlled self-assembly nanotechnology mechanism, represents an important development in the application of field emission display (FED), optoelectronic device fabrication, MEMS cutting tools, and in efforts to find a suitable replacement for carbide semiconductors. Molecular dynamics (MD) method with semi-empirical potential can be used to study the nanoindentation of C84-embedded Si substrate. A detailed description for performing MD simulation is presented here. Details for a comprehensive study on mechanical analysis of MD simulation such as indentation force, Young's modulus, surface stiffness, atomic stress, and atomic strain are included. The atomic stress and von-Mises strain distributions of the indentation model can be calculated to monitor deformation mechanism with time evaluation in atomistic level.
authors: Department of Physics and Institute of Nanoscience, National Chung Hsing University.
authors: Mon-Shu
authors: MS
authors: Ho
authors: Metallurgy Section, Materials & Electro-Optics Research Division, National Chung-Shan Institute of Science and Technology.
authors: Chih-Pong
authors: CP
authors: Huang
authors: National Center for High-Performance Computing.
authors: Jyun-Hwei
authors: JH
authors: Tsai
authors: Department of Physics and Institute of Nanoscience, National Chung Hsing University.
authors: Che-Fu
authors: CF
authors: Chou
authors: National Center for High-Performance Computing; wjlee@nchc.narl.org.tw.
authors: Wen-Jay
authors: WJ
authors: Lee
mesh_terms: D055119:Elastic Modulus; D037741:Fullerenes / Q000737:chemistry*; D020527:Microscopy, Scanning Probe / Q000379:methods*; D056004:Molecular Dynamics Simulation; D036103:Nanotechnology / Q000379:methods; D012825:Silicon / Q000737:chemistry*
chemical_list: D037741:Fullerenes; D012825:Silicon