title: Site-Selective Plasmonic Etching of Silver Nanocubes.
abstract: Plasmon-induced charge separation (PICS) at the interface between a plasmonic nanoparticle and semiconductor is now widely used for photovoltaics and photocatalysis. Here we take advantage of PICS for site-selective nanoetching of silver nanocubes on TiO2beyond the diffraction limit. A silver nanocube exhibits two resonance modes localized at the top and bottom of the nanocube (distal and proximal modes, respectively) when it is placed on TiO2. We achieved selective etching at the top and the bottom of the nanocubes by PICS based on the distal and proximal modes, respectively. The site-selective nanophotonic etching reveals that the anodic reaction involved in PICS is induced by the plasmonic near field, which causes an external photoelectric effect. In particular, the distal mode etching at the top edges is explained in terms of ejection of energetic electrons (or hot electrons) from the distal site to TiO2across the nanocube.
authors: Institute of Industrial Science, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan.
authors: Koichiro
authors: K
authors: Saito
authors: Institute of Industrial Science, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan.
authors: Ichiro
authors: I
authors: Tanabe
authors: Institute of Industrial Science, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan.
authors: Tetsu
authors: T
authors: Tatsuma