title: Significant Radiation Tolerance and Moderate Reduction in Thermal Transport of a Tungsten Nanofilm by Inserting Monolayer Graphene.
abstract: Tungsten-graphene multilayer composites are fabricated using a stacking method. The thermal resistance induced by the graphene interlayer is moderate. An ion-implantation method is used to verify the radiation tolerance. The results show that graphene inserted among tungsten films plays a dominant role in reducing radiation damage. Furthermore, the performance of different tungsten period-thicknesses in radiation tolerance is systematically analyzed.
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nanostructures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Shuyao
authors.initials: S
authors.lastname: Si
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nanostructures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Wenqing
authors.initials: W
authors.lastname: Li
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nanostructures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Xiaolong
authors.initials: X
authors.lastname: Zhao
authors.affiliation: Department of Mechanical Engineering, Iowa State University, Ames, IA, 50010, USA.
authors.forename: Meng
authors.initials: M
authors.lastname: Han
authors.affiliation: School of Power and Mechanical Engineering, Wuhan University, Wuhan, Hubei, 430072, China.
authors.forename: Yanan
authors.initials: Y
authors.lastname: Yue
authors.affiliation: Laboratory of Printable Functional Nanomaterials and Printed Electronics, School of Printing and Packaging, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Wei
authors.initials: W
authors.lastname: Wu
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nanostructures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Shishang
authors.initials: S
authors.lastname: Guo
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nanostructures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Xingang
authors.initials: X
authors.lastname: Zhang
authors.affiliation: Laboratory of Printable Functional Nanomaterials and Printed Electronics, School of Printing and Packaging, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Zhigao
authors.initials: Z
authors.lastname: Dai
authors.affiliation: Department of Mechanical Engineering, Iowa State University, Ames, IA, 50010, USA.
authors.forename: Xinwei
authors.initials: X
authors.lastname: Wang
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nanostructures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Xiangheng
authors.initials: X
authors.lastname: Xiao
authors.affiliation: Department of Physics and Key Laboratory of Artificial Micro- and Nanostructures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.
authors.forename: Changzhong
authors.initials: C
authors.lastname: Jiang
keywords: graphene; multilayer nanofilms; radiation tolerance; thermal resistance