title: Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks.
abstract: We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO2/SiO2/Si and Ti/SiO2/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity curves measured versus the incidence angle at different soft x-ray reflection (SXR) photon energies. The results were confirmed by the conventional techniques of hard x-ray photoelectron spectroscopy (HXPES) and high-resolution transmission electron microscopy (HRTEM). The depth variation of the chemical composition, thicknesses and densities of individual layers extracted from SXR and HXPES measurements are in close agreement and correlate well with the HRTEM images.
authors.affiliation: St Petersburg State University, St Petersburg, 198504, Russia.
authors.forename: Elena O
authors.initials: EO
authors.lastname: Filatova
authors.affiliation: Institute of Crystallography, Moscow, 119333, Russia.
authors.forename: Igor V
authors.initials: IV
authors.lastname: Kozhevnikov
authors.affiliation: St Petersburg State University, St Petersburg, 198504, Russia.
authors.forename: Andrey A
authors.initials: AA
authors.lastname: Sokolov
authors.affiliation: St Petersburg State University, St Petersburg, 198504, Russia.
authors.forename: Evgeniy V
authors.initials: EV
authors.lastname: Ubyivovk
authors.affiliation: Fraunhofer Institut Angewandte Optik und Feinmechanik, Albert Einstein Str. 7, 07745 Jena, Germany.
authors.forename: Sergey
authors.initials: S
authors.lastname: Yulin
authors.affiliation: Helmholtz Zentrum Berlin für Materialien und Energie, (HZB-BESSY II), Albert-Einstein-Strasse 15, 12489, Berlin, Germany.
authors.forename: Mihaela
authors.initials: M
authors.lastname: Gorgoi
authors.affiliation: Helmholtz Zentrum Berlin für Materialien und Energie, (HZB-BESSY II), Albert-Einstein-Strasse 15, 12489, Berlin, Germany.
authors.forename: Franz
authors.initials: F
authors.lastname: Schäfers
keywords: HRTEM; HXPES; Interface; Metallic titanium; Soft x-ray reflectometry (SXR); Thin films; Titanium dioxide