title: Anisotropic multi-step etching for large-area fabrication of surface microstructures on stainless steel to control thermal radiation.
abstract: Controlling the thermal radiation spectra of materials is one of the promising ways to advance energy system efficiency. It is well known that the thermal radiation spectrum can be controlled through the introduction of periodic surface microstructures. Herein, a method for the large-area fabrication of periodic microstructures based on multi-step wet etching is described. The method consists of three main steps, i.e., resist mask fabrication via photolithography, electrochemical wet etching, and side wall protection. Using this method, high-aspect micro-holes (0.82 aspect ratio) arrayed with hexagonal symmetry were fabricated on a stainless steel substrate. The conventional wet etching process method typically provides an aspect ratio of 0.3. The optical absorption peak attributed to the fabricated micro-hole array appeared at 0.8μm, and the peak absorbance exceeded 0.8 for the micro-holes with a 0.82 aspect ratio. While argon plasma etching in a vacuum chamber was used in the present study for the formation of the protective layer, atmospheric plasma etching should be possible and will expand the applicability of this new method for the large-area fabrication of high-aspect materials.
authors.affiliation: Department of Mechanical Systems and Design, Graduate School of Engineering, Tohoku University, Japan.
authors.forename: M
authors.initials: M
authors.lastname: Shimizu
authors.affiliation: Business Creation Department, Research & Development Division, Dexerials Corporation, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Yamada
authors.affiliation: Business Creation Department, Research & Development Division, Dexerials Corporation, Japan.
authors.forename: K
authors.initials: K
authors.lastname: Sasaki
authors.affiliation: Business Creation Department, Research & Development Division, Dexerials Corporation, Japan.
authors.forename: A
authors.initials: A
authors.lastname: Takada
authors.affiliation: Business Creation Department, Research & Development Division, Dexerials Corporation, Japan.
authors.forename: H
authors.initials: H
authors.lastname: Nomura
authors.affiliation: Department of Mechanical Systems and Design, Graduate School of Engineering, Tohoku University, Japan.
authors.forename: F
authors.initials: F
authors.lastname: Iguchi
authors.affiliation: Department of Mechanical Systems and Design, Graduate School of Engineering, Tohoku University, Japan.
authors.forename: H
authors.initials: H
authors.lastname: Yugami
keywords: inteference lithography; thermal radiation; wet etching