title: Silica based polishing of {100} and {111} single crystal diamond.
abstract: Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.
authors.affiliation: Cardiff School of Physics and Astronomy, Cardiff University, Cardiff, UK.
authors.forename: Evan L H
authors.initials: EL
authors.lastname: Thomas
authors.affiliation: Cardiff School of Physics and Astronomy, Cardiff University, Cardiff, UK.
authors.forename: Soumen
authors.initials: S
authors.lastname: Mandal
authors.affiliation: Cardiff School of Engineering, Cardiff University, Cardiff, UK.
authors.forename: Emmanuel B
authors.initials: EB
authors.lastname: Brousseau
authors.affiliation: Cardiff School of Physics and Astronomy, Cardiff University, Cardiff, UK.
authors.forename: Oliver A
authors.initials: OA
authors.lastname: Williams
keywords: 81.05.U-; 81.05.ug; chemical mechanical polishing; diamond polishing; single crystal diamond