title: Turning an organic semiconductor into a low-resistance material by ion implantation.
abstract: We report on the effects of low energy ion implantation on thin films of pentacene, carried out to investigate the efficacy of this process in the fabrication of organic electronic devices. Two different ions, Ne and N, have been implanted and compared, to assess the effects of different reactivity within the hydrocarbon matrix. Strong modification of the electrical conductivity, stable in time, is observed following ion implantation. This effect is significantly larger for N implants (up to six orders of magnitude), which are shown to introduce stable charged species within the hydrocarbon matrix, not only damage as is the case for Ne implants. Fully operational pentacene thin film transistors have also been implanted and we show how a controlled N ion implantation process can induce stable modifications in the threshold voltage, without affecting the device performance.
authors.affiliation: Dipartimento di Fisica e Astronomia, Università di Bologna, viale Berti Pichat 6/2, 40127 Bologna, Italy.
authors.forename: Beatrice
authors.initials: B
authors.lastname: Fraboni
authors.affiliation: Dipartimento di Fisica e Astronomia, Università di Bologna, viale Berti Pichat 6/2, 40127 Bologna, Italy.
authors.forename: Alessandra
authors.initials: A
authors.lastname: Scidà
authors.affiliation: Dipartimento di Ingegneria Elettrica ed Elettronica, Università di Cagliari, piazza d'Armi, 09123 Cagliari, Italy; CNR-INFM S3, via Campi 213/a, 41100 Modena, Italy.
authors.forename: Piero
authors.initials: P
authors.lastname: Cosseddu
authors.affiliation: Los Alamos National Laboratory, MS-K771, Los Alamos, NM 87545, USA.
authors.forename: Yongqiang
authors.initials: Y
authors.lastname: Wang
authors.affiliation: Nebraska Center for Energy Sciences Research (NCESR), University of Nebraska-Lincoln, NE 68588, USA.
authors.forename: Michael
authors.initials: M
authors.lastname: Nastasi
authors.affiliation: Istituto per la Microelettronica e Microsistemi (IMM) Consiglio Nazionale delle Ricerche (CNR), Bologna, Italy.
authors.forename: Silvia
authors.initials: S
authors.lastname: Milita
authors.affiliation: Dipartimento di Ingegneria Elettrica ed Elettronica, Università di Cagliari, piazza d'Armi, 09123 Cagliari, Italy; CNR-INFM S3, via Campi 213/a, 41100 Modena, Italy.
authors.forename: Annalisa
authors.initials: A
authors.lastname: Bonfiglio
keywords: ion implantation; organic thin film; thin film transistor