title: Electroless Deposition of Nickel on Photografted Polymeric Microscale Patterns.
abstract: This report demonstrates the electroless deposition of Ni onto micropatterns of poly (acrylic acid) (PAA) photografted to phthalimide-terminated self-assembled monolayers (SAMs). PAA is spin-coated onto phthalimide SAMs and covered with a photomask. UV irradiation selectively binds PAA to exposed regions of the surface, allowing PAA on unexposed regions to be rinsed off. A Pd catalyst is then selectively adsorbed to regions of the surface where PAA is bound. The adsorbed catalyst selectively initiates Ni plating upon immersion of the substrate into a Ni(SO4) bath.
authors.affiliation: Department of Chemistry, Columbia University, New York, NY, 10027, USA.
authors.forename: Gregory T
authors.initials: GT
authors.lastname: Carroll
authors.affiliation: Department of Chemistry, Columbia University, New York, NY, 10027, USA.
authors.forename: Jeffrey R
authors.initials: JR
authors.lastname: Lancaster
authors.affiliation: Department of Chemistry, Columbia University, New York, NY, 10027, USA.|Department of Chemical Engineering, Columbia University, New York, NY, 10027, USA.
authors.forename: Nicholas J
authors.initials: NJ
authors.lastname: Turro
authors.affiliation: Department of Chemical Engineering, Columbia University, New York, NY, 10027, USA.
authors.forename: Jeffrey T
authors.initials: JT
authors.lastname: Koberstein
authors.affiliation: Department of Chemistry, University of Dayton, Dayton, OH, 45469, USA.
authors.forename: Angela
authors.initials: A
authors.lastname: Mammana
mesh_terms: D000180:Acrylic Resins / Q000737:chemistry*; D000327:Adsorption; D002384:Catalysis; D015394:Molecular Structure; D009532:Nickel / Q000737:chemistry*; D055668:Photochemical Processes
chemical_list: D000180:Acrylic Resins; C006903:carbopol 940; D009532:Nickel
keywords: catalysis; electroless deposition; photografting; polymers; thin films