title: Solution-Based Photo-Patterned Gold Film Formation on Silicon Nitride.
abstract: Silicon nitride fabricated by low-pressure chemical vapor deposition (LPCVD) to be silicon-rich (SiNx), is a ubiquitous insulating thin film in the microelectronics industry, and an exceptional structural material for nanofabrication. Free-standing <100 nm thick SiNxmembranes are especially compelling, particularly when used to deliver forefront molecular sensing capabilities in nanofluidic devices. We developed an accessible, gentle, and solution-based photodirected surface metallization approach well-suited to forming patterned metal films as integral structural and functional features in thin-membrane-based SiNxdevices-for use as electrodes or surface chemical functionalization platforms, for example-augmenting existing device capabilities and properties for a wide range of applications.
authors.affiliation: Department of Chemistry, University of Rhode Island , 140 Flagg Road, Kingston, Rhode Island 02881, United States.
authors.forename: Y M Nuwan D Y
authors.initials: YM
authors.lastname: Bandara
authors.affiliation: Department of Chemistry, University of Rhode Island , 140 Flagg Road, Kingston, Rhode Island 02881, United States.
authors.forename: Buddini Iroshika
authors.initials: BI
authors.lastname: Karawdeniya
authors.affiliation: Department of Chemistry, University of Rhode Island , 140 Flagg Road, Kingston, Rhode Island 02881, United States.
authors.forename: Julie C
authors.initials: JC
authors.lastname: Whelan
authors.affiliation: Department of Chemistry, University of Rhode Island , 140 Flagg Road, Kingston, Rhode Island 02881, United States.
authors.forename: Lucas D S
authors.initials: LD
authors.lastname: Ginsberg
authors.affiliation: Department of Chemistry, University of Rhode Island , 140 Flagg Road, Kingston, Rhode Island 02881, United States.
authors.forename: Jason R
authors.identifier: http://orcid.org/0000-0002-2938-2888
authors.initials: JR
authors.lastname: Dwyer
keywords: electroless plating; hydrosilylation; patterned metallization; photocontrolled metallization; silicon nitride covalent photomasking; silicon nitride membrane; silicon nitride surface functionalization; thin gold films