title: Site-Specific Electron-Relaxation Caused by Si:2p Core-Level Photoionization: Comparison between F3SiCH2CH2Si(CH3)3and Cl3SiCH2CH2Si(CH3)3Vapors by Means of Photoelectron Auger Electron Coincidence Spectroscopy.
abstract: Site-specific electron relaxations caused by Si:2p core-level photoionizations in F3SiCH2CH2Si(CH3)3and Cl3SiCH2CH2Si(CH3)3vapors have been studied by means of the photoelectron Auger electron coincidence spectroscopy. F3SiCH2CH2Si(CH3)3shows almost 100% site-specificity in fragmentation caused by the Si:2p ionization. However, substitution of Cl for F of F3SiCH2CH2Si(CH3)3considerably reduces the site-specificity at the Si atom bonded to three halogen atoms, with the site-specificity at the Si site bonded to three methyl groups remaining largely unchanged. The site-specificity reduction in Cl3SiCH2CH2Si(CH3)3is considered to take place during the transient period between Si:L23VV Auger electron emission and the subsequent fragmentation. The reason for the reduction can be explained in terms of some differences between these two molecules in the L23VV Auger decay at the Si site bonded to the three halogen atoms.
authors.affiliation: Department of Chemistry, Faculty of Science and Graduate School of Science and Engineering, Ehime University , Matsuyama 790-8577, Japan.
authors.forename: Shin-Ichi
authors.identifier: http://orcid.org/0000-0003-1564-7328
authors.initials: SI
authors.lastname: Nagaoka
authors.affiliation: Department of Chemistry, Faculty of Science and Graduate School of Science and Engineering, Ehime University , Matsuyama 790-8577, Japan.
authors.forename: Takuhiro
authors.initials: T
authors.lastname: Kakiuchi
authors.forename: Joji
authors.initials: J
authors.lastname: Ohshita
authors.forename: Osamu
authors.initials: O
authors.lastname: Takahashi
authors.affiliation: Graduate School of Medicine and Pharmaceutical Sciences, University of Toyama , Toyama 930-0194, Japan.
authors.forename: Yasumasa
authors.initials: Y
authors.lastname: Hikosaka