title: Nanoscale self-templating for oxide epitaxy with large symmetry mismatch.
abstract: Direct observations using scanning transmission electron microscopy unveil an intriguing interfacial bi-layer that enables epitaxial growth of a strain-free, monoclinic, bronze-phase VO2(B) thin film on a perovskite SrTiO3(STO) substrate. We observe an ultrathin (2-3 unit cells) interlayer best described as highly strained VO2(B) nanodomains combined with an extra (Ti,V)O2layer on the TiO2terminated STO (001) surface. By forming a fully coherent interface with the STO substrate and a semi-coherent interface with the strain-free epitaxial VO2(B) film above, the interfacial bi-layer enables the epitaxial connection of the two materials despite their large symmetry and lattice mismatch.
authors.affiliation: Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: Xiang
authors.initials: X
authors.lastname: Gao
authors.affiliation: Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: Shinbuhm
authors.initials: S
authors.lastname: Lee
authors.affiliation: Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: John
authors.initials: J
authors.lastname: Nichols
authors.affiliation: Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: Tricia L
authors.initials: TL
authors.lastname: Meyer
authors.affiliation: Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: Thomas Z
authors.initials: TZ
authors.lastname: Ward
authors.affiliation: Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: Matthew F
authors.initials: MF
authors.lastname: Chisholm
authors.affiliation: Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: Ho Nyung
authors.initials: HN
authors.lastname: Lee