title: Fabrication of sharp atomic force microscope probes using in situ local electric field induced deposition under ambient conditions.
abstract: We demonstrate a simple method to significantly improve the sharpness of standard silicon probes for an atomic force microscope or to repair a damaged probe. The method is based on creating and maintaining a strong, spatially localized electric field in the air gap between the probe tip and the surface of conductive sample. Under these conditions, nanostructure growth takes place on both the sample and the tip. The most likely mechanism is the decomposition of atmospheric adsorbate with subsequent deposition of carbon structures. This makes it possible to grow a spike of a few hundred nanometers in length on the tip. We further demonstrate that probes obtained by this method can be used for high-resolution scanning. It is important to note that all process operations are carried out in situ, in air and do not require the use of closed chambers or any additional equipment beyond the atomic force microscope itself.
authors.affiliation: Kotel'nikov Institute of Radioengineering and Electronics of RAS, Fryazino Branch, 141190 Fryazino, Russia.
authors.forename: Alexei
authors.initials: A
authors.lastname: Temiryazev
authors.affiliation: Institute of Solid State Physics, RAS, 142432 Chernogolovka, Russia.
authors.forename: Sergey I
authors.initials: SI
authors.lastname: Bozhko
authors.affiliation: AIST-NT Inc., 359 Bel Marin Keys Blvd., Suite 20, Novato, California 94949, USA.
authors.forename: A Edward
authors.initials: AE
authors.lastname: Robinson
authors.affiliation: Kotel'nikov Institute of Radioengineering and Electronics of RAS, Fryazino Branch, 141190 Fryazino, Russia.
authors.forename: Marina
authors.initials: M
authors.lastname: Temiryazeva