title: Tuning the Reactivity of Graphene by Surface Phase Orientation.
abstract: Tuning the local reactivity of graphene is a subject of paramount importance. Among the available strategies, the activation/passivation of graphene by copper substrate is very promising because it enables the properties of graphene to be influenced without any transfer procedure, since graphene can be grown directly on copper. Herein, it is demonstrated that the reactivity of graphene towards fluorination is strongly influenced by the face of the surface of the copper substrate. Graphene on the copper foil was probed and grain orientations were identified. The results of the reactivity were evaluated by means of X-ray photo electron and Raman spectroscopy. Graphene on the grains with a surface orientation close to the (111) face is the most reactive, whereas graphene on the grains close to the (110) surface is least reactive. The long-term stability test showed that the decomposition of fluorinated graphene was slowest on the grains with a surface orientation close to the (111) face. The results are consistent with the variation of the mechanical strain of graphene on different faces of copper. In contrast, no clear correlation of the graphene reactivity with doping induced by different facets was found.
authors.affiliation: Department of Low-Dimensional Systems, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 3, 18223, Prague 8, Czech Republic.
authors.forename: Jan
authors.initials: J
authors.lastname: Plšek
authors.affiliation: Department of Low-Dimensional Systems, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 3, 18223, Prague 8, Czech Republic.
authors.forename: Petr
authors.initials: P
authors.lastname: Kovaříček
authors.affiliation: Department of Low-Dimensional Systems, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 3, 18223, Prague 8, Czech Republic.
authors.forename: Václav
authors.initials: V
authors.lastname: Valeš
authors.affiliation: Department of Low-Dimensional Systems, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 3, 18223, Prague 8, Czech Republic.
authors.forename: Martin
authors.initials: M
authors.lastname: Kalbáč
keywords: copper; crystal growth; fluorine; graphene; surface analysis