title: Conformal Coating of a Phase Change Material on Ordered Plasmonic Nanorod Arrays for Broadband All-Optical Switching.
abstract: Actively tunable optical transmission through artificial metamaterials holds great promise for next-generation nanophotonic devices and metasurfaces. Plasmonic nanostructures and phase change materials have been extensively studied to this end due to their respective strong interactions with light and tunable dielectric constants under external stimuli. Seamlessly integrating plasmonic components with phase change materials, as demonstrated in the present work, can facilitate phase change by plasmonically enabled light confinement and meanwhile make use of the high sensitivity of plasmon resonances to the variation of dielectric constant associated with the phase change. The hybrid platform here is composed of plasmonic indium-tin-oxide nanorod arrays (ITO-NRAs) conformally coated with an ultrathin layer of a prototypical phase change material, vanadium dioxide (VO2), which enables all-optical modulation of the infrared as well as the visible spectral ranges. The interplay between the intrinsic plasmonic nonlinearity of ITO-NRAs and the phase transition induced permittivity change of VO2gives rise to spectral and temporal responses that cannot be achieved with individual material components alone.
authors.forename: Peijun
authors.identifier: 0000-0001-5732-7061
authors.initials: P
authors.lastname: Guo
authors.affiliation: Department of Chemistry, Illinois Institute of Technology , 3101 South Dearborn Street, Chicago, Illinois 60616, United States.
authors.forename: Matthew S
authors.identifier: 0000-0002-5969-6415
authors.initials: MS
authors.lastname: Weimer
authors.forename: Jonathan D
authors.identifier: 0000-0003-4443-441X
authors.initials: JD
authors.lastname: Emery
authors.forename: Benjamin T
authors.initials: BT
authors.lastname: Diroll
authors.forename: Xinqi
authors.initials: X
authors.lastname: Chen
authors.affiliation: Department of Chemistry, Illinois Institute of Technology , 3101 South Dearborn Street, Chicago, Illinois 60616, United States.
authors.forename: Adam S
authors.identifier: 0000-0003-1440-1473
authors.initials: AS
authors.lastname: Hock
authors.forename: Robert P H
authors.initials: RP
authors.lastname: Chang
authors.forename: Alex B F
authors.initials: AB
authors.lastname: Martinson
authors.forename: Richard D
authors.initials: RD
authors.lastname: Schaller
keywords: atomic layer deposition; indium−tin oxide (ITO); phase change; plasmonics; ultrafast spectroscopy; vanadium dioxide (VO2)