title: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.
abstract: A parallel nanolithographic patterning methodis presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 3 70569 Stuttgart Germany.
authors.forename: Hyeon-Ho
authors.initials: HH
authors.lastname: Jeong
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 3 70569 Stuttgart Germany.
authors.forename: Andrew G
authors.initials: AG
authors.lastname: Mark
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 370569 Stuttgart Germany; Institute for Materials Discovery University College London Kathleen Lonsdale Building Gower Place London WC1E 6BT UK.
authors.forename: Tung-Chun
authors.initials: TC
authors.lastname: Lee
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 3 70569 Stuttgart Germany.
authors.forename: Kwanghyo
authors.initials: K
authors.lastname: Son
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 370569 Stuttgart Germany; Department of Biophysical Chemistry University of Heidelberg INF 25369120 Heidelberg Germany.
authors.forename: Wenwen
authors.initials: W
authors.lastname: Chen
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 370569 Stuttgart Germany; Institute for Physical Chemistry University of Stuttgart Pfaffenwaldring 5570569 Stuttgart Germany.
authors.forename: Mariana
authors.initials: M
authors.lastname: Alarcón-Correa
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 370569 Stuttgart Germany; Institute for Physical Chemistry University of Stuttgart Pfaffenwaldring 5570569 Stuttgart Germany.
authors.forename: Insook
authors.initials: I
authors.lastname: Kim
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 3 70569 Stuttgart Germany.
authors.forename: Gisela
authors.initials: G
authors.lastname: Schütz
authors.affiliation: Max Planck Institute for Intelligent Systems Heisenbergstr. 370569 Stuttgart Germany; Institute for Physical Chemistry University of Stuttgart Pfaffenwaldring 5570569 Stuttgart Germany.
authors.forename: Peer
authors.initials: P
authors.lastname: Fischer
keywords: block copolymer micelle nanolithography; glancing angle deposition; nanoimprint lithography; nanoparticle lithography; shadow growth physical vapor deposition