title: Phase shifting mask modulated laser patterning on graphene.
abstract: A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.
authors.affiliation: Department of Applied Physics, College of Science, Zhejiang University of Technology, Hangzhou 310023, People's Republic of China. Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China.
authors.forename: Fan
authors.initials: F
authors.lastname: Gao
authors.forename: Fengyuan
authors.initials: F
authors.lastname: Liu
authors.forename: Ziran
authors.initials: Z
authors.lastname: Ye
authors.forename: Chenghua
authors.initials: C
authors.lastname: Sui
authors.forename: Bo
authors.initials: B
authors.lastname: Yan
authors.forename: Pinggen
authors.initials: P
authors.lastname: Cai
authors.forename: Bin
authors.initials: B
authors.lastname: Lv
authors.forename: Yun
authors.initials: Y
authors.lastname: Li
authors.forename: Naibo
authors.initials: N
authors.lastname: Chen
authors.forename: Youdou
authors.initials: Y
authors.lastname: Zheng
authors.forename: Yi
authors.initials: Y
authors.lastname: Shi