title: A Supercritical Lens Optical Label-Free Microscopy: Sub-Diffraction Resolution and Ultra-Long Working Distance.
abstract: A planar metalens for achieving super-resolution imaging in far-field is proposed. This metalens, which has a non-sub-wavelength feature size, can be fabricated by conventional laser pattern generator. The imaging process is purely physical and captured in real time, without any pre- and post-processing.
authors.affiliation: Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore, 117583, Singapore.
authors.forename: Fei
authors.initials: F
authors.lastname: Qin
authors.affiliation: Institute of Materials Research and Engineering, Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore, 138634, Singapore.
authors.forename: Kun
authors.initials: K
authors.lastname: Huang
authors.affiliation: Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore, 117583, Singapore.|Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore, 117542, Singapore.
authors.forename: Jianfeng
authors.initials: J
authors.lastname: Wu
authors.affiliation: Institute of Materials Research and Engineering, Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore, 138634, Singapore.
authors.forename: Jinghua
authors.initials: J
authors.lastname: Teng
authors.affiliation: Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore, 117583, Singapore.
authors.forename: Cheng-Wei
authors.initials: CW
authors.lastname: Qiu
authors.affiliation: Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore, 117583, Singapore.
authors.forename: Minghui
authors.initials: M
authors.lastname: Hong
keywords: far-field; label-free; optical imaging; planar lens; super-resolution