title: 3D elemental mapping with nanometer scale depth resolution via electron optical sectioning.
abstract: Electron energy loss spectroscopy in the scanning transmission electron microscope has long been used to perform elemental mapping but has not previously exhibited depth sensitivity. The key to depth resolution with optical sectioning is the transfer of sufficiently high lateral spatial frequencies. By performing spectrum imaging with atomic resolution we achieve nanometer scale depth resolution, enabling us to optically section an oxide heterostructure spectroscopically. Such 3D elemental mapping is sensitive to atomic scale changes in structure and composition and is more interpretable than Z-contrast imaging alone.
authors.affiliation: EPSRC SuperSTEM Facility, Daresbury Laboratory, Warrington WA4 4AD, UK; Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK. Electronic address: timothy.pennycook@univie.ac.at.
authors.forename: Timothy J
authors.initials: TJ
authors.lastname: Pennycook
authors.affiliation: Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK.
authors.forename: Hao
authors.initials: H
authors.lastname: Yang
authors.affiliation: Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK.
authors.forename: Lewys
authors.initials: L
authors.lastname: Jones
authors.affiliation: Grupo de Fisica de Materiales Complejos, Universidad Complutense, 28040 Madrid, Spain.
authors.forename: Mariona
authors.initials: M
authors.lastname: Cabero
authors.affiliation: Grupo de Fisica de Materiales Complejos, Universidad Complutense, 28040 Madrid, Spain.
authors.forename: Alberto
authors.initials: A
authors.lastname: Rivera-Calzada
authors.affiliation: Grupo de Fisica de Materiales Complejos, Universidad Complutense, 28040 Madrid, Spain.
authors.forename: Carlos
authors.initials: C
authors.lastname: Leon
authors.affiliation: Grupo de Fisica de Materiales Complejos, Universidad Complutense, 28040 Madrid, Spain; Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
authors.forename: Maria
authors.initials: M
authors.lastname: Varela
authors.affiliation: Grupo de Fisica de Materiales Complejos, Universidad Complutense, 28040 Madrid, Spain.
authors.forename: Jacobo
authors.initials: J
authors.lastname: Santamaria
authors.affiliation: EPSRC SuperSTEM Facility, Daresbury Laboratory, Warrington WA4 4AD, UK; Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK.
authors.forename: Peter D
authors.initials: PD
authors.lastname: Nellist
keywords: EELS; Optical sectioning; STEM