title: Mirror-field confined compact plasma source using permanent magnet for plasma processings.
abstract: A mirror-field confined compact electron cyclotron resonance (ECR) plasma source using permanent magnets was developed, aiming for the realization of high-quality plasma processings where high-density reactive species are supplied to a substrate with minimizing the ion bombardment damages. The ECR position was located between a microwave transmissive window and a quartz limiter, and plasmas were transported from the ECR position to a midplane of the magnetic mirror field through the quartz limiter. Thus, a radius of core plasma could be determined by the limiter, which was 15 mm in this study. Plasma parameters were investigated by the Langmuir probe measurement. High-density plasma larger than 1011cm-3could be produced by applying 5.85-GHz microwave power of 10 W or more. For the outside region of the core plasma where a wafer for plasma processings will be set at, the ion current density was decreased dramatically with distance from the core plasma and became smaller by approximately two orders of magnitude that in the core plasma region for the radial position of 40 mm, suggesting the realization of reduction in ion bombardment damages.
authors.affiliation: New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan.
authors.forename: Tetsuya
authors.initials: T
authors.lastname: Goto
authors.affiliation: Kotec Co., Ltd., Iidabashi, Chiyoda, 102-0072 Tokyo, Japan.
authors.forename: Kei-Ichiro
authors.initials: KI
authors.lastname: Sato
authors.affiliation: Seinan Industries Co., Ltd., Kitakagaya, Suminoe, Osaka 559-0011, Japan.
authors.forename: Yuki
authors.initials: Y
authors.lastname: Yabuta
authors.affiliation: New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan.
authors.forename: Shigetoshi
authors.initials: S
authors.lastname: Sugawa