title: Modulation of nonlinear resistive switching behavior of a TaOx-based resistive device through interface engineering.
abstract: A resistive switching device with inherent nonlinear characteristics through a delicately engineered interfacial layer is an ideal component to be integrated into passive crossbar arrays for the suppression of sneaking current, especially in ultra-dense 3D integration. In this paper, we demonstrated a TaOx-based bipolar resistive switching device with a nearly symmetrical bi-directional nonlinear feature through interface engineering. This was accomplished by introducing an ultra-thin interfacial layer (SiO2-x) with unique features, including a large band gap and a certain level of negative heat of oxide formation between the top electrode (TiN) and resistive layer (TaOx). The devices exhibit excellent nonlinear property under both positive and negative bias. Modulation of the inherent nonlinearity as well as the resistive switching mechanism are comprehensively studied by scrutinizing the results of the experimental control groups and the extensive characterizations including detailed compositional analysis, which suggests that the underlying mechanism of the nonlinear behavior is associatively governed by the serially connected metallic conductive filament and Flower-Nordheim tunneling barrier formed by the SiO2-xinterface layer. The proposed device in this work has great potential to be implemented in future massive storage memory applications of high-density selector-free crossbar structure.
authors.affiliation: Institute of Microelectronics, Peking University, Beijing 100871, People's Republic of China.
authors.forename: Zongwei
authors.initials: Z
authors.lastname: Wang
authors.forename: Jian
authors.initials: J
authors.lastname: Kang
authors.forename: Zhizhen
authors.initials: Z
authors.lastname: Yu
authors.forename: Yichen
authors.initials: Y
authors.lastname: Fang
authors.forename: Yaotian
authors.initials: Y
authors.lastname: Ling
authors.forename: Yimao
authors.initials: Y
authors.lastname: Cai
authors.forename: Ru
authors.initials: R
authors.lastname: Huang
authors.forename: Yangyuan
authors.initials: Y
authors.lastname: Wang