title: Coherent X-ray beam metrology using 2D high-resolution Fresnel-diffraction analysis.
abstract: Direct metrology of coherent short-wavelength beamlines is important for obtaining operational beam characteristics at the experimental site. However, since beam-time limitation imposes fast metrology procedures, a multi-parametric metrology from as low as a single shot is desirable. Here a two-dimensional (2D) procedure based on high-resolution Fresnel diffraction analysis is discussed and applied, which allowed an efficient and detailed beamline characterization at the SACLA XFEL. So far, the potential of Fresnel diffraction for beamline metrology has not been fully exploited because its high-frequency fringes could be only partly resolved with ordinary pixel-limited detectors. Using the high-spatial-frequency imaging capability of an irradiated LiF crystal, 2D information of the coherence degree, beam divergence and beam quality factor M2were retrieved from simple diffraction patterns. The developed beam metrology was validated with a laboratory reference laser, and then successfully applied at a beamline facility, in agreement with the source specifications.
authors.affiliation: Empa, Materials Science and Technology, Dübendorf, Switzerland.
authors.forename: M
authors.initials: M
authors.lastname: Ruiz-Lopez
authors.affiliation: Institute for Academic Initiatives, Osaka University, Suita, Osaka, Japan.
authors.forename: A
authors.initials: A
authors.lastname: Faenov
authors.affiliation: Joint Institute for High Temperatures, Russian Academy of Sciences, Moscow, Russia.
authors.forename: T
authors.initials: T
authors.lastname: Pikuz
authors.affiliation: Graduate School of Engineering, Osaka University, Suita, Osaka, Japan.
authors.forename: N
authors.initials: N
authors.lastname: Ozaki
authors.affiliation: Joint Institute for High Temperatures, Russian Academy of Sciences, Moscow, Russia.
authors.forename: A
authors.initials: A
authors.lastname: Mitrofanov
authors.affiliation: Graduate School of Engineering, Osaka University, Suita, Osaka, Japan.
authors.forename: B
authors.initials: B
authors.lastname: Albertazzi
authors.affiliation: Graduate School of Engineering, Osaka University, Suita, Osaka, Japan.
authors.forename: N
authors.initials: N
authors.lastname: Hartley
authors.affiliation: Institute for Academic Initiatives, Osaka University, Suita, Osaka, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Matsuoka
authors.affiliation: Graduate School of Engineering, Osaka University, Suita, Osaka, Japan.
authors.forename: Y
authors.initials: Y
authors.lastname: Ochante
authors.affiliation: JASRI/SPring-8, Sayo, Hyogo, Japan.
authors.forename: Y
authors.initials: Y
authors.lastname: Tange
authors.affiliation: RIKEN Harima Institute, Sayo, Hyogo, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Yabuuchi
authors.affiliation: Graduate School of Engineering, Osaka University, Suita, Osaka, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Habara
authors.affiliation: Graduate School of Engineering, Osaka University, Suita, Osaka, Japan.
authors.forename: K A
authors.initials: KA
authors.lastname: Tanaka
authors.affiliation: JASRI/SPring-8, Sayo, Hyogo, Japan.
authors.forename: Y
authors.initials: Y
authors.lastname: Inubushi
authors.affiliation: JASRI/SPring-8, Sayo, Hyogo, Japan.
authors.forename: M
authors.initials: M
authors.lastname: Yabashi
authors.affiliation: Kansai Photon Research Institute, National Institutes for Quantum and Radiological Science and Technology, Kizugawa, Kyoto, Japan.
authors.forename: M
authors.initials: M
authors.lastname: Nishikino
authors.affiliation: Kansai Photon Research Institute, National Institutes for Quantum and Radiological Science and Technology, Kizugawa, Kyoto, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Kawachi
authors.affiliation: Joint Institute for High Temperatures, Russian Academy of Sciences, Moscow, Russia.
authors.forename: S
authors.initials: S
authors.lastname: Pikuz
authors.affiliation: JASRI/SPring-8, Sayo, Hyogo, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Ishikawa
authors.affiliation: Institute for Academic Initiatives, Osaka University, Suita, Osaka, Japan.
authors.forename: R
authors.initials: R
authors.lastname: Kodama
authors.affiliation: Empa, Materials Science and Technology, Dübendorf, Switzerland.
authors.forename: D
authors.initials: D
authors.lastname: Bleiner
keywords: Fresnel diffraction; LiF; SACLA; X-ray; X-ray imaging detector; beam metrology; color centers; fourth-generation source