title: Optical Calibration of a Submicrometer Magnification Standard.
abstract: The calibration of a new submicrometer magnification standard for electron microscopes is described. The new standard is based on the width of a thin thermal-oxide film sandwiched between a silicon single-crystal substrate and a polysilicon capping layer. The calibration is based on an ellipsometric measurement of the oxide thickness before the polysilicon layer is deposited on the oxide. The uncertainty in the derivation of a thickness for the layer from the ellipsometric parameters is also derived.
authors.affiliation: National Institute of Standards and Technology, Gaithersburg, MD 20899.
authors.forename: Jon
authors.initials: J
authors.lastname: Geist
authors.affiliation: National Institute of Standards and Technology, Gaithersburg, MD 20899.
authors.forename: Barbara
authors.initials: B
authors.lastname: Belzer
authors.affiliation: National Institute of Standards and Technology, Gaithersburg, MD 20899.
authors.forename: Mary Lou
authors.initials: ML
authors.lastname: Miller
authors.affiliation: National Institute of Standards and Technology, Gaithersburg, MD 20899.
authors.forename: Peter
authors.initials: P
authors.lastname: Roitman
keywords: calibration; electron microscope; magnification standard; scanning electron microscope; transmission electron microscope