title: Lateral Magnetically Modulated Multilayers by Combining Ion Implantation and Lithography.
abstract: The combination of lithography and ion implantation is demonstrated to be a suitable method to prepare lateral multilayers. A laterally, compositionally, and magnetically modulated microscale pattern consisting of alternating Co (1.6 µm wide) and Co-CoO (2.4 µm wide) lines has been obtained by oxygen ion implantation into a lithographically masked Au-sandwiched Co thin film. Magnetoresistance along the lines (i.e., current and applied magnetic field are parallel to the lines) reveals an effective positive giant magnetoresistance (GMR) behavior at room temperature. Conversely, anisotropic magnetoresistance and GMR contributions are distinguished at low temperature (i.e., 10 K) since the O-implanted areas become exchange coupled. This planar GMR is principally ascribed to the spatial modulation of coercivity in a spring-magnet-type configuration, which results in 180° Néel extrinsic domain walls at the Co/Co-CoO interfaces. The versatility, in terms of pattern size, morphology, and composition adjustment, of this method offers a unique route to fabricate planar systems for, among others, spintronic research and applications.
authors.affiliation: KU Leuven, Instituut voor Kern- en Stralingsfysica, Celestijnenlaan 200 D, 3001, Leuven, Belgium.
authors.forename: Enric
authors.initials: E
authors.lastname: Menéndez
authors.affiliation: KU Leuven, Instituut voor Kern- en Stralingsfysica, Celestijnenlaan 200 D, 3001, Leuven, Belgium.
authors.forename: Hiwa
authors.initials: H
authors.lastname: Modarresi
authors.affiliation: KU Leuven, Instituut voor Kern- en Stralingsfysica, Celestijnenlaan 200 D, 3001, Leuven, Belgium.
authors.forename: Claire
authors.initials: C
authors.lastname: Petermann
authors.affiliation: Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193, Barcelona, Spain.|ICREA, Pg. Lluís Companys 23, 08010, Barcelona, Spain.
authors.forename: Josep
authors.initials: J
authors.lastname: Nogués
authors.affiliation: Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193, Barcelona, Spain.
authors.forename: Neus
authors.initials: N
authors.lastname: Domingo
authors.affiliation: KU Leuven, Laboratorium voor Vaste-Stoffysica en Magnetisme, Celestijnenlaan 200 D, 3001, Leuven, Belgium.
authors.forename: Haoliang
authors.initials: H
authors.lastname: Liu
authors.affiliation: NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
authors.forename: Brian J
authors.initials: BJ
authors.lastname: Kirby
authors.affiliation: Jülich Centre for Neutron Science (JCNS) at Heinz Maier-Leibnitz Zentrum (MLZ), Forschungszentrum Jülich GmbH, 85747, Garching, Germany.
authors.forename: Amir Syed
authors.initials: AS
authors.lastname: Mohd
authors.affiliation: Jülich Centre for Neutron Science (JCNS) at Heinz Maier-Leibnitz Zentrum (MLZ), Forschungszentrum Jülich GmbH, 85747, Garching, Germany.
authors.forename: Zahir
authors.initials: Z
authors.lastname: Salhi
authors.affiliation: Jülich Centre for Neutron Science (JCNS) at Heinz Maier-Leibnitz Zentrum (MLZ), Forschungszentrum Jülich GmbH, 85747, Garching, Germany.
authors.forename: Earl
authors.initials: E
authors.lastname: Babcock
authors.affiliation: Jülich Centre for Neutron Science (JCNS) at Heinz Maier-Leibnitz Zentrum (MLZ), Forschungszentrum Jülich GmbH, 85747, Garching, Germany.
authors.forename: Stefan
authors.initials: S
authors.lastname: Mattauch
authors.affiliation: KU Leuven, Laboratorium voor Vaste-Stoffysica en Magnetisme, Celestijnenlaan 200 D, 3001, Leuven, Belgium.
authors.forename: Chris
authors.initials: C
authors.lastname: Van Haesendonck
authors.affiliation: KU Leuven, Instituut voor Kern- en Stralingsfysica, Celestijnenlaan 200 D, 3001, Leuven, Belgium.
authors.forename: André
authors.initials: A
authors.lastname: Vantomme
authors.affiliation: KU Leuven, Instituut voor Kern- en Stralingsfysica, Celestijnenlaan 200 D, 3001, Leuven, Belgium.
authors.forename: Kristiaan
authors.initials: K
authors.lastname: Temst
keywords: ion implantation; lateral multilayers; lithography; magnetoresistance; planar technology