title: Beneficial effect of Cu on Ti-Nb-Ta-Zr sputtered uniform/adhesive gum films accelerating bacterial inactivation under indoor visible light.
abstract: This article presents the evidence for the significant effect of copper accelerating the bacterial inactivation on Ti-Nb-Ta-Zr (TNTZ) sputtered films on glass up to a Cu content of 8.3 at.%. These films were deposited by dc magnetron co-sputtering of an alloy target Ti-23Nb-0.7Ta-2Zr (at.%) and a Cu target. The fastest bacterial inactivation of E. coli on this later TNTZ-Cu surface proceeded within ∼75min. The films deposited by magnetron sputtering are chemically homogenous. The film roughness evaluated by atomic force spectroscopy (AFM) on the TNTZ-Cu 8.3 at.% Cu sample presented an RMS-value of 20.1nm being the highest RMS of any Cu-sputtered TNTZ sample. The implication of the RMS value found for this sample leading to the fastest interfacial bacterial inactivation kinetics is also discussed. Values for the Young's modulus and hardness are reported for the TNTZ films in the presence of various Cu-contents. Evaluation of the bacterial inactivation kinetics of E. coli under low intensity actinic hospital light and in the dark was carried out. The stable repetitive bacterial inactivation was consistent with the extremely low Cu-ion release from the samples of 0.4 ppb. Evidence is presented by the bacterial inactivation dependence on the applied light intensity for the intervention of Cu as semiconductor CuO during the bacterial inactivation at the TNTZ-Cu interface. The mechanism of CuO-intervention under light is suggested based on the pH/and potential changes registered during bacterial disinfection.
authors.affiliation: ICD-LASMIS, Université de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pôle Technologique de Haute-Champagne, 52800 Nogent, France; Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent, Pôle Technologique de Haute-Champagne, 52800 Nogent, France. Electronic address: akram.alhussein@utt.fr.
authors.forename: Akram
authors.initials: A
authors.lastname: Alhussein
authors.affiliation: ICD-LASMIS, Université de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pôle Technologique de Haute-Champagne, 52800 Nogent, France; Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent, Pôle Technologique de Haute-Champagne, 52800 Nogent, France.
authors.forename: Sofiane
authors.initials: S
authors.lastname: Achache
authors.affiliation: ICD-LNIO, Université de Technologie de Troyes, UMR 6281, CNRS, 12 Rue Marie Curie, 10010 Troyes, France.
authors.forename: Regis
authors.initials: R
authors.lastname: Deturche
authors.affiliation: ICD-LASMIS, Université de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pôle Technologique de Haute-Champagne, 52800 Nogent, France; Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent, Pôle Technologique de Haute-Champagne, 52800 Nogent, France.
authors.forename: Frederic
authors.initials: F
authors.lastname: Sanchette
authors.affiliation: Ecole Polytechnique Fédérale de Lausanne, EPFL-SB-ISIC-GPAO, Station 6, 1015 Lausanne, Switzerland.
authors.forename: Cesar
authors.initials: C
authors.lastname: Pulgarin
authors.affiliation: Ecole Polytechnique Fédérale de Lausanne, EPFL-SB-ISIC-GPAO, Station 6, 1015 Lausanne, Switzerland.
authors.forename: John
authors.initials: J
authors.lastname: Kiwi
authors.affiliation: Ecole Polytechnique Fédérale de Lausanne, EPFL-SB-ISIC-GPAO, Station 6, 1015 Lausanne, Switzerland. Electronic address: sami.rtimi@epfl.ch.
authors.forename: Sami
authors.initials: S
authors.lastname: Rtimi
mesh_terms: D000900:Anti-Bacterial Agents / Q000737:chemistry* / Q000494:pharmacology; D003300:Copper / Q000737:chemistry*; D055119:Elastic Modulus; D004926:Escherichia coli / Q000187:drug effects; D008027:Light; D008567:Membranes, Artificial; D018625:Microscopy, Atomic Force; D009556:Niobium / Q000737:chemistry*; D013635:Tantalum / Q000737:chemistry*; D014025:Titanium / Q000737:chemistry*; D015040:Zirconium / Q000737:chemistry*
chemical_list: D000900:Anti-Bacterial Agents; D008567:Membranes, Artificial; D009556:Niobium; D013635:Tantalum; D003300:Copper; D015040:Zirconium; D014025:Titanium
keywords: Biointerface; Copper; E. coli inactivation; Magnetron sputtering; Metallic ions-release; Super-elastic coatings; Titanium based thin films