title: Gas Diffusion Barriers Prepared by Spatial Atmospheric Pressure Plasma Enhanced ALD.
abstract: In this work, we report on aluminum oxide (Al2O3) gas permeation barriers prepared by spatial ALD (SALD) at atmospheric pressure. We compare the growth characteristics and layer properties using trimethylaluminum (TMA) in combination with an Ar/O2remote atmospheric pressure plasma for different substrate velocities and different temperatures. The resulting Al2O3films show ultralow water vapor transmission rates (WVTR) on the order of 10-6gm-2d-1. In notable contrast, plasma based layers already show good barrier properties at low deposition temperatures (75 °C), while water based processes require a growth temperature above 100 °C to achieve equally low WVTRs. The activation energy for the water permeation mechanism was determined to be 62 kJ/mol.
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Lukas
authors.identifier: http://orcid.org/0000-0003-3150-0879
authors.initials: L
authors.lastname: Hoffmann
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Detlef
authors.initials: D
authors.lastname: Theirich
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Sven
authors.initials: S
authors.lastname: Pack
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Firat
authors.initials: F
authors.lastname: Kocak
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Daniel
authors.initials: D
authors.lastname: Schlamm
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Tim
authors.initials: T
authors.lastname: Hasselmann
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Henry
authors.initials: H
authors.lastname: Fahl
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: André
authors.initials: A
authors.lastname: Räupke
authors.affiliation: SENTECH Instruments GmbH , Schwarzschildstrasse 2, 12489 Berlin, Germany.
authors.forename: Hassan
authors.initials: H
authors.lastname: Gargouri
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , Rainer-Gruenter-Strasse 21, 42119 Wuppertal, Germany.
authors.forename: Thomas
authors.initials: T
authors.lastname: Riedl
keywords: aluminum oxide; atmospheric pressure; atomic layer deposition; gas diffusion barriers; plasma enhanced ALD; roll-to-roll; spatial ALD