title: Tuning the Ignition Performance of a Microchip Initiator by Integrating Various Al/MoO3Reactive Multilayer Films on a Semiconductor Bridge.
abstract: Reactive multilayer films (RMFs) can be integrated into semiconducting electronic structures with the use of microelectromechanical systems (MEMS) technology and represent potential applications in the advancement of microscale energy-demanding systems. In this study, aluminum/molybdenum trioxide (Al/MoO3)-based RMFs with different modulation periods were integrated on a semiconductor bridge (SCB) using a combination of an image reversal lift-off process and magnetron sputtering technology. This produced an energetic semiconductor bridge (ESCB)-chip initiator with controlled ignition performance. The effects of the Al/MoO3RMFs with different modulation periods on ignition properties of the ESCB initiator were then systematically investigated in terms of flame duration, maximum flame area, and the reaction ratio of the RMFs. These microchip initiators achieved flame durations of 60-600 μs, maximum flame areas of 2.85-17.61 mm2, and reaction ratios of ∼14-100% (discharged with 47 μF/30 V) by simply changing the modulation periods of the Al/MoO3RMFs. This behavior was also consistent with a one-dimensional diffusion reaction model. The microchip initiator exhibited a high level of integration and proved to have tuned ignition performance, which can potentially be used in civilian and military applications.
authors.affiliation: Department of Applied Chemistry, School of Chemical Engineering, Nanjing University of Science and Technology , Nanjing 210094, China.
authors.forename: Jianbing
authors.identifier: http://orcid.org/0000-0001-6394-2589
authors.initials: J
authors.lastname: Xu
authors.affiliation: Department of Applied Chemistry, School of Chemical Engineering, Nanjing University of Science and Technology , Nanjing 210094, China.
authors.forename: Yu
authors.initials: Y
authors.lastname: Tai
authors.affiliation: Department of Applied Chemistry, School of Chemical Engineering, Nanjing University of Science and Technology , Nanjing 210094, China.
authors.forename: Chengbo
authors.initials: C
authors.lastname: Ru
authors.affiliation: Department of Applied Chemistry, School of Chemical Engineering, Nanjing University of Science and Technology , Nanjing 210094, China.
authors.forename: Ji
authors.initials: J
authors.lastname: Dai
authors.affiliation: Department of Applied Chemistry, School of Chemical Engineering, Nanjing University of Science and Technology , Nanjing 210094, China.
authors.forename: Yinghua
authors.initials: Y
authors.lastname: Ye
authors.affiliation: Department of Applied Chemistry, School of Chemical Engineering, Nanjing University of Science and Technology , Nanjing 210094, China.
authors.forename: Ruiqi
authors.initials: R
authors.lastname: Shen
authors.affiliation: Department of Applied Chemistry, School of Chemical Engineering, Nanjing University of Science and Technology , Nanjing 210094, China.
authors.forename: Peng
authors.initials: P
authors.lastname: Zhu
keywords: aluminum/molybdenum trioxide; energetic semiconductor bridge; magnetron sputtering; microelectromechanical systems; reactive multilayer films