title: Development of a highly transparent, low-resistance lithium-doped nickel oxide triple-layer film deposited by magnetron sputtering.
abstract: This research presents a triple-layer transparent conductive oxide thin film, with a lithium-doped nickel oxide/silver/lithium-doped nickel oxide (L-NiO/Ag/L-NiO) structure using radio-frequency (RF) magnetron sputtering on glass substrates. The high transmittance L-NiO thin films were deposited using the sputtering method with Ar/H2as the reaction gases. The triple-layer structure, L-NiO/Ag/L-NiO, showed impressive electrical conductivity. The figure of merit (FOM) results indicated that the L-NiO/Ag/L-NiO triple-layer thin films with Ag deposition times of 2 min possessed satisfactory optical and electrical properties for potential applications.
authors.affiliation: Department of Electronic Engineering, Kao Yuan University, Kaohsiung, Taiwan, Republic of China. 9113718@gmail.com.
authors.forename: Chia-Ching
authors.identifier: http://orcid.org/0000-0001-8462-5830
authors.initials: CC
authors.lastname: Wu
authors.affiliation: Department of Electronic Engineering, Kao Yuan University, Kaohsiung, Taiwan, Republic of China. 9113718@gmail.com.
authors.forename: Wei-Chen
authors.initials: WC
authors.lastname: Shih