title: Spontaneous decoration of silicon surfaces with MoOxnanoparticles for the sunlight-assisted hydrogen evolution reaction.
abstract: The immersion of oxide-free Si surfaces in MoS42-aqueous solutions induces their spontaneous decoration with isolated MoOxnanoparticles (NPs). The process is versatile and was used on planar Si (100) as well as on antireflective Si (111) micro-pyramid (SimPy) arrays. The NP decoration does not affect the optical properties of the surface in the visible range and improves the performance of the hydrogen evolution reaction (HER) under simulated sunlight. The simplicity and the scalability of the technique make it highly promising for the fabrication of catalytically active photoelectrodes. More specifically, the MoOx-decorated SimPy produced H2at a rate of 11 μmol cm-2min-1with a faradaic efficiency higher than 90% at -0.35 V vs. RHE. Furthermore, this process can be of great interest for other applications in high-performance electronic devices.
authors.affiliation: Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Matière Condensée et Systèmes Electroactifs (MaCSE), Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France. gabriel.loget@univ-rennes1.fr bruno.fabre@univ-rennes1.fr.
authors.forename: T-G
authors.initials: TG
authors.lastname: Truong
authors.affiliation: Institut de Physique de Rennes, UMR 6251 CNRS, Département Matériaux Nanosciences, Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France.
authors.forename: C
authors.initials: C
authors.lastname: Mériadec
authors.affiliation: Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Matière Condensée et Systèmes Electroactifs (MaCSE), Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France. gabriel.loget@univ-rennes1.fr bruno.fabre@univ-rennes1.fr.
authors.forename: B
authors.initials: B
authors.lastname: Fabre
authors.affiliation: Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Matière Condensée et Systèmes Electroactifs (MaCSE), Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France. gabriel.loget@univ-rennes1.fr bruno.fabre@univ-rennes1.fr.
authors.forename: J-F
authors.initials: JF
authors.lastname: Bergamini
authors.affiliation: IETR, Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France.
authors.forename: O
authors.initials: O
authors.lastname: de Sagazan
authors.affiliation: Institut de Physique de Rennes, UMR 6251 CNRS, Département Matériaux Nanosciences, Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France.
authors.forename: S
authors.initials: S
authors.lastname: Ababou-Girard
authors.affiliation: Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Matière Condensée et Systèmes Electroactifs (MaCSE), Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France. gabriel.loget@univ-rennes1.fr bruno.fabre@univ-rennes1.fr.
authors.forename: G
authors.identifier: http://orcid.org/0000-0003-4809-5013
authors.initials: G
authors.lastname: Loget