title: Corrosion Protection of Copper Using Al2O3, TiO2, ZnO, HfO2, and ZrO2Atomic Layer Deposition.
abstract: Atomic layer deposition (ALD) is a viable means to add corrosion protection to copper metal. Ultrathin films of Al2O3, TiO2, ZnO, HfO2, and ZrO2were deposited on copper metal using ALD, and their corrosion protection properties were measured using electrochemical impedance spectroscopy (EIS) and linear sweep voltammetry (LSV). Analysis of ∼50 nm thick films of each metal oxide demonstrated low electrochemical porosity and provided enhanced corrosion protection from aqueous NaCl solution. The surface pretreatment and roughness was found to affect the extent of the corrosion protection. Films of Al2O3or HfO2provided the highest level of initial corrosion protection, but films of HfO2exhibited the best coating quality after extended exposure. This is the first reported instance of using ultrathin films of HfO2or ZrO2produced with ALD for corrosion protection, and both are promising materials for corrosion protection.
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: James S
authors.identifier: http://orcid.org/0000-0002-8151-9191
authors.initials: JS
authors.lastname: Daubert
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: Grant T
authors.initials: GT
authors.lastname: Hill
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: Hannah N
authors.initials: HN
authors.lastname: Gotsch
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: Antoine P
authors.initials: AP
authors.lastname: Gremaud
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: Jennifer S
authors.initials: JS
authors.lastname: Ovental
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: Philip S
authors.initials: PS
authors.lastname: Williams
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: Christopher J
authors.initials: CJ
authors.lastname: Oldham
authors.affiliation: Department of Chemical and Biomolecular Engineering, North Carolina State University , Raleigh, North Carolina 27695, United States.
authors.forename: Gregory N
authors.initials: GN
authors.lastname: Parsons
keywords: ALD; EIS; LSV; copper; corrosion protection