title: Single-Molecule Electrochemistry on a Porous Silica-Coated Electrode.
abstract: Here we report the direct observation and quantitative analysis of single redox events on a modified indium-tin oxide (ITO) electrode. The key in the observation of single redox events are the use of a fluorogenic redox species and the nanoconfinement and hindered redox diffusion inside 3-nm-diameter silica nanochannels. A simple electrochemical process was used to grow an ultrathin silica film (∼100 nm) consisting of highly ordered parallel nanochannels exposing the electrode surface from the bottom. The electrode-supported 3-nm-diameter nanochannels temporally trap fluorescent resorufin molecules resulting in hindered molecular diffusion in the vicinity of the electrode surface. Adsorption, desorption, and heterogeneous redox events of individual resorufin molecules can be studied using total-internal reflection fluorescence (TIRF). The rate constants of adsorption and desorption processes of resorufin were characterized from single-molecule analysis to be (1.73 ± 0.08) × 10-4cm·s-1and 15.71 ± 0.76 s-1, respectively. The redox events of resorufin to the non-fluorescent dihydroresorufin were investigated by analyzing the change in surface population of single resorufin molecules with applied potential. The scan-rate-dependent molecular counting results (single-molecule fluorescence voltammetry) indicated a surface-controlled electrochemical kinetics of the resorufin reduction on the modified ITO electrode. This study demonstrates the great potential of mesoporous silica as a useful modification scheme for studying single redox events on a variety of transparent substrates such as ITO electrodes and gold or carbon film coated glass electrodes. The ability to electrochemically grow and transfer mesoporous silica films onto other substrates makes them an attractive material for future studies in spatial heterogeneity of electrocatalytic surfaces.
authors.affiliation: Department of Chemistry, University of Washington , Seattle, Washington 98195-1700, United States.
authors.forename: Jin
authors.identifier: 0000-0003-0905-0736
authors.initials: J
authors.lastname: Lu
authors.affiliation: Department of Chemistry, University of Washington , Seattle, Washington 98195-1700, United States.
authors.forename: Yunshan
authors.initials: Y
authors.lastname: Fan
authors.affiliation: Department of Chemistry, University of Washington , Seattle, Washington 98195-1700, United States.
authors.forename: Marco D
authors.initials: MD
authors.lastname: Howard
authors.affiliation: Department of Chemistry, University of Washington , Seattle, Washington 98195-1700, United States.
authors.forename: Joshua C
authors.initials: JC
authors.lastname: Vaughan
authors.affiliation: Department of Chemistry, University of Washington , Seattle, Washington 98195-1700, United States.
authors.forename: Bo
authors.identifier: 0000-0002-1737-1241
authors.initials: B
authors.lastname: Zhang
mesh_terms: D055664:Electrochemical Techniques; D004566:Electrodes; D007204:Indium / Q000737:chemistry*; D010084:Oxidation-Reduction; D010316:Particle Size; D016062:Porosity; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties; D017971:Tin Compounds / Q000737:chemistry*
chemical_list: D017971:Tin Compounds; D007204:Indium; D012822:Silicon Dioxide; C045358:stannic oxide