title: Three-dimensional conformal graphene microstructure for flexible and highly sensitive electronic skin.
abstract: We demonstrate a highly stretchable electronic skin (E-skin) based on the facile combination of microstructured graphene nanowalls (GNWs) and a polydimethylsiloxane (PDMS) substrate. The microstructure of the GNWs was endowed by conformally growing them on the unpolished silicon wafer without the aid of nanofabrication technology. Then a stamping transfer method was used to replicate the micropattern of the unpolished silicon wafer. Due to the large contact interface between the 3D graphene network and the PDMS, this type of E-skin worked under a stretching ratio of nearly 100%, and showed excellent mechanical strength and high sensitivity, with a change in relative resistance of up to 6500% and a gauge factor of 65.9 at 99.64% strain. Furthermore, the E-skin exhibited an obvious highly sensitive response to joint movement, eye movement and sound vibration, demonstrating broad potential applications in healthcare, body monitoring and wearable devices.
authors.affiliation: Chongqing Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, People's Republic of China. University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China.
authors.forename: Jun
authors.initials: J
authors.lastname: Yang
authors.forename: Qincui
authors.initials: Q
authors.lastname: Ran
authors.forename: Dapeng
authors.initials: D
authors.lastname: Wei
authors.forename: Tai
authors.initials: T
authors.lastname: Sun
authors.forename: Leyong
authors.initials: L
authors.lastname: Yu
authors.forename: Xuefen
authors.initials: X
authors.lastname: Song
authors.forename: Lichun
authors.initials: L
authors.lastname: Pu
authors.forename: Haofei
authors.initials: H
authors.lastname: Shi
authors.forename: Chunlei
authors.initials: C
authors.lastname: Du