title: Byproduct-Free Route to Aminosiloxane Monolayers on Silicon/Silicon Dioxide.
abstract: The chemisorption of N-methyl-aza-2,2,4-trimethylsilacyclopentane from either the solution or the vapor phase produces monolayer films on silicon (oxide) substrates. The formation of a covalent siloxane linkage to the surface by this adsorbate is accompanied by ring opening, which produces no byproduct. The resulting secondary amine reacts with maleic anhydride to produce a carboxylic acid-terminated surface, accompanied by the formation of a stable amide bond. These reactions and their products were characterized by a combination of optical ellipsometry, contact-angle goniometry, and X-ray photoelectron spectroscopy.
authors.affiliation: Department of Chemistry and ‡Department of Materials Science & Engineering, Lehigh University , Bethlehem, Pennsylvania 18015, United States.
authors.forename: Kiran
authors.initials: K
authors.lastname: Khadka
authors.affiliation: Department of Chemistry and ‡Department of Materials Science & Engineering, Lehigh University , Bethlehem, Pennsylvania 18015, United States.
authors.forename: Nicholas C
authors.initials: NC
authors.lastname: Strandwitz
authors.affiliation: Department of Chemistry and ‡Department of Materials Science & Engineering, Lehigh University , Bethlehem, Pennsylvania 18015, United States.
authors.forename: Gregory S
authors.identifier: 0000-0002-7510-3464
authors.initials: GS
authors.lastname: Ferguson