Large-Area Highly Conductive Transparent Two-Dimensional Ti2CTxFilm.
We report a simple and scalable method to fabricate homogeneous transparent conductive thin films (Ti2CTx, one of the MXene) by dip coating of an Al2O3substrate in a colloidal solution of large-area Ti2CTxthin flakes. Scanning electron microscopy and atomic force microscopy images exhibit the wafer-scale homogeneous Ti2CTxthin film (∼5 nm) covering the whole substrate. The sheet resistance is as low as 70 Ω/sq at 86% transmittance, which corresponds to the high figure of merit (FOM) of 40.7. Furthermore, the thickness of the film is tuned by a SF6+Ar plasma treatment, which etches Ti2CTxfilm layer by layer and removes the top oxidized layer without affecting the bottom layer of the Ti2CTxflake. The resistivity of plasma-treated Ti2CTxfilm is further decreased to 63 Ω/sq with an improved transmittance of 89% and FOM of 51.3, demonstrating the promise of Ti2CTxfor future transparent conductive electrode application.
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU) , Suwon 440-746, Korea.
Yajie
Y
Yang
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU) , Suwon 440-746, Korea.
Sima
S
Umrao
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU) , Suwon 440-746, Korea.
Shen
S
Lai
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU) , Suwon 440-746, Korea.|School of Electronics and Electric Engineering, Sungkyunkwan University (SKKU) , Suwon 440-746, Korea.
Sungjoo
http://orcid.org/0000-0003-1284-3593
S
Lee