Highly Manufacturable Deep (Sub-Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego-Like Silicon Electronics.
A highly manufacturable deep reactive ion etching based process involving a hybrid soft/hard mask process technology shows high aspect ratio complex geometry Lego-like silicon electronics formation enabling free-form (physically flexible, stretchable, and reconfigurable) electronic systems.
Integrated Nanotechnology Lab and Integrated Disruptive Electronic Applications (IDEA) Lab, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia.
Mohamed Tarek
MT
Ghoneim
Integrated Nanotechnology Lab and Integrated Disruptive Electronic Applications (IDEA) Lab, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia.
Muhammad Mustafa
MM
Hussain
deep reactive ion etching; flexible electronics; microfabrication; silicon electronics; soft/hard mask