The Growth Mechanism of Transition Metal Dichalcogenides by using Sulfurization of Pre-deposited Transition Metals and the 2D Crystal Hetero-structure Establishment.
A growth model is proposed for the large-area and uniform MoS2film grown by using sulfurization of pre-deposited Mo films on sapphire substrates. During the sulfurization procedure, the competition between the two mechanisms of the Mo oxide segregation to form small clusters and the sulfurization reaction to form planar MoS2film is determined by the amount of background sulfur. Small Mo oxide clusters are observed under the sulfur deficient condition, while large-area and complete MoS2films are obtained under the sulfur sufficient condition. Precise layer number controllability is also achieved by controlling the pre-deposited Mo film thicknesses. The drain currents in positive dependence on the layer numbers of the MoS2transistors with 1-, 3- and 5- layer MoS2have demonstrated small variation in material characteristics between each MoS2layer prepared by using this growth technique. By sequential transition metal deposition and sulfurization procedures, a WS2/MoS2/WS2double hetero-structure is demonstrated. Large-area growth, layer number controllability and the possibility of hetero-structure establishment by using sequential metal deposition and following sulfurization procedures have revealed the potential of this growth technique for practical applications.
Graduate Institute of Electronics Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Rd., Taipei 10617, Taiwan.|Research Center for Applied Sciences, Academia Sinica, No. 128, Sec. 2, Academia Rd., Taipei 11529, Taiwan.
Chong-Rong
CR
Wu
Research Center for Applied Sciences, Academia Sinica, No. 128, Sec. 2, Academia Rd., Taipei 11529, Taiwan.
Xiang-Rui
XR
Chang
Graduate Institute of Electronics Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Rd., Taipei 10617, Taiwan.
Chao-Hsin
CH
Wu
Graduate Institute of Electronics Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Rd., Taipei 10617, Taiwan.|Research Center for Applied Sciences, Academia Sinica, No. 128, Sec. 2, Academia Rd., Taipei 11529, Taiwan.
Shih-Yen
SY
Lin