Varying stress of SiOxCythin films deposited by plasma polymerization.
SiOxCythin films were deposited by plasma polymerization. The stress of the deposited SiOxCythin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiOxCythin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]c/[FM]m, to control the stress of the deposited plasma polymer films. Multilayers of TiO2/SiO2/TiO2were coated on a SiOxCyplasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10-4at 550 nm of the SiOxCyfilms. Superior optical performances of SiOxCythin films make their use in optical thin films.
Wei-Bo
WB
Liao
Ya-Chen
YC
Chang
Cheng-Chung
CC
Jaing
Ching-Long
CL
Cheng
Cheng-Chung
CC
Lee
Hung-Sen
HS
Wei
Chien-Cheng
CC
Kuo