Atomic Layer Deposition of Iron Sulfide and Its Application as a Catalyst in the Hydrogenation of Azobenzenes.
The atomic layer deposition (ALD) of iron sulfide (FeSx) is reported for the first time. The deposition process employs bis(N,N'-di-tert-butylacetamidinato)iron(II) and H2S as the reactants and produces fairly pure, smooth, and well-crystallized FeSxthin films following an ideal self-limiting ALD growth behavior. The FeSxfilms can be uniformly and conformally deposited into deep narrow trenches with aspect ratios as high as 10:1, which highlights the broad applicability of this ALD process for engineering the surface of complex 3D nanostructures in general. Highly uniform nanoscale FeSxcoatings on porous γ-Al2O3powder were also prepared. This compound shows excellent catalytic activity and selectivity in the hydrogenation of azo compounds under mild reaction conditions, demonstrating the promise of ALD FeSxas a catalyst for organic reactions.
School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, 518055, China.
Youdong
Y
Shao
School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, 518055, China.
Zheng
Z
Guo
School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, 518055, China.
Hao
H
Li
School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, 518055, China.
Yantao
Y
Su
School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, 518055, China.
Xinwei
X
Wang
atomic layer deposition; hydrogenation; iron; supported catalysts; thin films