title: Flexible camphor diamond-like carbon coating on polyurethane to prevent Candida albicans biofilm growth.
abstract: Camphor was incorporated in diamond-like carbon (DLC) films to prevent the Candida albicans yeasts fouling on polyurethane substrates, which is a material commonly used for catheter manufacturing. The camphor:DLC and DLC film for this investigation was produced by plasma enhanced chemical vapor deposition (PECVD), using an apparatus based on the flash evaporation of organic liquid (hexane) containing diluted camphor for camphor:DLC and hexane/methane, mixture for DLC films. The film was deposited at a low temperature of less than 25°C. We obtained very adherent camphor:DLC and DLC films that accompanied the substrate flexibility without delamination. The adherence of camphor:DLC and DLC films on polyurethane segments were evaluated by scratching test and bending polyurethane segments at 180°. The polyurethane samples, with and without camphor:DLC and DLC films were characterized by Raman spectroscopy, scanning electron microscopy, atomic force microscopy, and optical profilometry. Candida albicans biofilm formation on polyurethane, with and without camphor:DLC and DLC, was assessed. The camphor:DLC and DLC films reduced the biofilm growth by 99.0% and 91.0% of Candida albicans, respectively, compared to bare polyurethane. These results open the doors to studies of functionalized DLC coatings with biofilm inhibition properties used in the production of catheters or other biomedical applications.
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil.
authors.forename: Thaisa B
authors.initials: TB
authors.lastname: Santos
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil.
authors.forename: Angela A
authors.initials: AA
authors.lastname: Vieira
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil.
authors.forename: Luciana O
authors.initials: LO
authors.lastname: Paula
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil.
authors.forename: Everton D
authors.initials: ED
authors.lastname: Santos
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil; Instituto Tecnológico de Aeronáutica - ITA, Laboratório de Processamento a Plasma, Praça Marechal Eduardo Gomes, 50 - Vila das Acácias, São José dos Campos, SP 12228-900, Brazil.
authors.forename: Polyana A
authors.initials: PA
authors.lastname: Radi
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil.
authors.forename: Sônia
authors.initials: S
authors.lastname: Khouri
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil; Instituto Tecnológico de Aeronáutica - ITA, Laboratório de Processamento a Plasma, Praça Marechal Eduardo Gomes, 50 - Vila das Acácias, São José dos Campos, SP 12228-900, Brazil.
authors.forename: Homero S
authors.initials: HS
authors.lastname: Maciel
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil; Instituto Tecnológico de Aeronáutica - ITA, Laboratório de Processamento a Plasma, Praça Marechal Eduardo Gomes, 50 - Vila das Acácias, São José dos Campos, SP 12228-900, Brazil.
authors.forename: Rodrigo S
authors.initials: RS
authors.lastname: Pessoa
authors.affiliation: Universidade do Vale do Paraíba - UNIVAP, Grupo Nanotecplasma, Av. Shishima Hifumi, 2911 - Urbanova, CEP 12.244-000 São José dos Campos, SP, Brazil; Instituto Tecnológico de Aeronáutica - ITA, Laboratório de Processamento a Plasma, Praça Marechal Eduardo Gomes, 50 - Vila das Acácias, São José dos Campos, SP 12228-900, Brazil. Electronic address: vieiral@ita.br.
authors.forename: Lucia
authors.initials: L
authors.lastname: Vieira
mesh_terms: D018441:Biofilms / Q000187:drug effects*; D002164:Camphor / Q000737:chemistry*; D002176:Candida albicans / Q000187:drug effects*; D002244:Carbon / Q000737:chemistry*; D020099:Coated Materials, Biocompatible / Q000737:chemistry*; D018130:Diamond; D008422:Materials Testing; D011140:Polyurethanes / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D020099:Coated Materials, Biocompatible; D011140:Polyurethanes; D002244:Carbon; D002164:Camphor; D018130:Diamond
keywords: Biofilm growth inhibition; Camphor; Candida albicans; Diamond-like carbon (DLC); Raman