title: Resist-free antireflective nanostructured film fabricated by thermal-NIL.
abstract: Resist-free antireflective (AR) nanostructured films are directly fabricated on polycarbonate (PC) film using thermal-nanoimprint lithography (T-NIL) and the moth-eye shape of AR nanostructure is elaborately optimized with different oxygen reactive ion etching conditions. Anodic aluminum oxide (AAO) templates are directly used as master molds of T-NIL for preparation of AR nanostructures on PC film without an additional T-NIL resist. AR nanostructures are well arranged with a period of about 200 nm and diameter of about 150 nm, which corresponds to those of the AAO template mold. The moth-eye AR nanostructures exhibit the average reflectance of 2% in wavelength range from 400 to 800 nm. From the results, highly enhanced AR properties with simple direct imprinting on PC film demonstrate the potential for panel application in the field of flat display, touch screen, and solar cells.
authors.affiliation: Division of Advanced Materials, Korea Research Institute of Chemical Technology, Daejeon, 305-600 Korea.
authors.forename: Young Hun
authors.initials: YH
authors.lastname: Kang
authors.affiliation: Creative Research Center for Graphene Electronics, Electronics and Telecommunications Research Institute (ETRI), Daejeon, 305-700 Korea.
authors.forename: Jae Hyung
authors.initials: JH
authors.lastname: Han
authors.affiliation: Division of Advanced Materials, Korea Research Institute of Chemical Technology, Daejeon, 305-600 Korea.
authors.forename: Song Yun
authors.initials: SY
authors.lastname: Cho
authors.affiliation: Creative Research Center for Graphene Electronics, Electronics and Telecommunications Research Institute (ETRI), Daejeon, 305-700 Korea.
authors.forename: Choon-Gi
authors.initials: CG
authors.lastname: Choi
keywords: Anodic aluminum oxide template; Antireflective films; Moth-eye; Nanostructures; Oxygen reactive ion etching; Thermal nano-imprint lithography