title: Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study.
abstract: Dissociative adsorption of CH3NO2onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C-N bond in CH3NO2and the formation of a Si-CH3surface species are observed at elevated CH3NO2pressure (0.5 mbar) and temperature (>573 K).
authors.affiliation: Radiation Laboratory, Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN 46556, USA.
authors.forename: Xueqiang
authors.initials: X
authors.lastname: Zhang
authors.affiliation: Department of Physics, Beijing Key Laboratory of Optoelectronic Functional Materials & Micro-nano Devices, Beijing 100872, China. wji@ruc.edu.cn.
authors.forename: Chen-Guang
authors.initials: CG
authors.lastname: Wang
authors.affiliation: Department of Physics, Beijing Key Laboratory of Optoelectronic Functional Materials & Micro-nano Devices, Beijing 100872, China. wji@ruc.edu.cn.
authors.forename: Wei
authors.initials: W
authors.lastname: Ji
authors.affiliation: Radiation Laboratory, Department of Physics, University of Notre Dame, Notre Dame, IN 46556, USA. sylwia.ptasinska.1@nd.edu.
authors.forename: Sylwia
authors.initials: S
authors.lastname: Ptasinska