title: Novel 3D micro- and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers.
abstract: Micro- and nanostructures with three-dimensional (3D) shapes are needed for a variety of applications in optics and fluidics where structures with both smooth and sharp features enhance the performance and functionality. We present a novel method for the generation of true 3D surfaces based on thermally activated selective topography equilibration (TASTE). This technique allows generating almost arbitrary sloped, convex and concave profiles in the same polymer film with dimensions in micro- and nanometer scale. We describe its principal mechanism exemplified by pre-patterned poly (methyl methacrylate) resist which is exposed to high energy electrons prior to a thermal annealing step enabling the selective transformation of stepped contours into smooth surfaces. From this we conclude, that TASTE not only offers an enormous degree of freedom for future process variations, but also will advance the patterning capabilities of current standard 3D micro- and nanofabrication methods.
authors.affiliation: Micro Resist Technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany.
authors.forename: Arne
authors.initials: A
authors.lastname: Schleunitz
authors.affiliation: Paul Scherrer Institut, Laboratory for Micro- and Nanotechnology, 5232 Villigen, PSI Switzerland.
authors.forename: Vitaliy A
authors.initials: VA
authors.lastname: Guzenko
authors.affiliation: Micro Resist Technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany.
authors.forename: Martin
authors.initials: M
authors.lastname: Messerschmidt
authors.affiliation: Micro Resist Technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany.
authors.forename: Hakan
authors.initials: H
authors.lastname: Atasoy
authors.affiliation: Paul Scherrer Institut, Laboratory for Micro- and Nanotechnology, 5232 Villigen, PSI Switzerland.
authors.forename: Robert
authors.initials: R
authors.lastname: Kirchner
authors.affiliation: Paul Scherrer Institut, Laboratory for Micro- and Nanotechnology, 5232 Villigen, PSI Switzerland.
authors.forename: Helmut
authors.initials: H
authors.lastname: Schift
keywords: Electron beam lithography; Nanofabrication; Nanoimprint lithography; Surface topography; Thermal reflow; Thermoplastic polymer; Three-dimensional