title: Dihydrogen Splitting Using Dialkylsilylene-Based Frustrated Lewis Pairs.
abstract: Isolable dialkylsilylene 5 reacts with dihydrogen in the presence of a small amount of a conventional Lewis acid (BPh3, BEt3) or a base (PPh3, PEt3, NPh3, NEt3) at low temperatures in a hydrocarbon solvent, giving the corresponding dihydrosilane 10 in high yields. Both 5/Lewis acid and Lewis base/5 pairs work as a frustrated Lewis pair (FLP) to split dihydrogen, being in accord with the amphoteric nature of silylene 5.
authors.affiliation: Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education, Hangzhou Normal University, No. 2318 Yuhangtang Rd. Hangzhou, 311121, Zhejiang, China.|Institute of Chemistry, Carl von Ossietzky Universität Oldenburg, Carl-von-Ossietzky-Str. 9-11, 26129, Oldenburg, Germany.
authors.forename: Zhaowen
authors.initials: Z
authors.lastname: Dong
authors.affiliation: Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education, Hangzhou Normal University, No. 2318 Yuhangtang Rd. Hangzhou, 311121, Zhejiang, China.
authors.forename: Zhifang
authors.initials: Z
authors.lastname: Li
authors.affiliation: Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education, Hangzhou Normal University, No. 2318 Yuhangtang Rd. Hangzhou, 311121, Zhejiang, China.
authors.forename: Xupeng
authors.initials: X
authors.lastname: Liu
authors.affiliation: Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education, Hangzhou Normal University, No. 2318 Yuhangtang Rd. Hangzhou, 311121, Zhejiang, China.
authors.forename: Chenting
authors.initials: C
authors.lastname: Yan
authors.affiliation: Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education, Hangzhou Normal University, No. 2318 Yuhangtang Rd. Hangzhou, 311121, Zhejiang, China.
authors.forename: Ningka
authors.initials: N
authors.lastname: Wei
authors.affiliation: Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education, Hangzhou Normal University, No. 2318 Yuhangtang Rd. Hangzhou, 311121, Zhejiang, China.
authors.forename: Mitsuo
authors.initials: M
authors.lastname: Kira
authors.affiliation: Institute of Chemistry, Carl von Ossietzky Universität Oldenburg, Carl-von-Ossietzky-Str. 9-11, 26129, Oldenburg, Germany.
authors.forename: Thomas
authors.initials: T
authors.lastname: Müller
keywords: Lewis acid and base; dialkylsilylene; dihydrogen splitting; dihydrosilanes; frustrated Lewis pairs