title: Relationship between lymphocyte DNA fragmentation and dose of iron oxide (Fe2O3) and silicon oxide (SiO2) nanoparticles.
abstract: At present, the use of nanoparticles is a controversial topic, especially when analyzing their effects in human tissues. Nanoparticles (NPs) can cause oxidative stress by increasing membrane lipids peroxidation and reactive oxygen species, and decreasing intracellular glutathione. Oxidative stress plays an important role in cell signaling and inflammatory responses. It can result in genotoxicity, affect cell proliferation, and induce DNA damage. The objective of this study is to evaluate the genotoxic potential of NPs in lymphocyte DNA. Wistar female rats (N = 45) were sorted in three randomized groups as follows: Group 1 (N = 20); Group 2 (N = 20) and a control group (N = 5). A single dose of iron oxide (Fe2O3) and silicon oxide (SiO2) NPs dissolved in saline solution were administered orally to the rats. Cardiac puncture was performed to extract peripheral blood for genotoxic analysis. DNA fragmentation for lymphocytes was performed. Control rats showed a fragmentation percentage of 11.20 ± 2.16%. Rats exposed to SiO2and Fe2O3NPs for 24 h showed statistically significant differences in DNA fragmentation percentages as compared with that of the control group. A lineal dose-response correlation between genotoxic damage and exposure to SiO2and Fe2O3NPs was found (r2= 0.99 and 0.98 for SiO2and Fe2O3, respectively). In conclusion, we found that exposure to Fe2O3and SiO2NPs can cause DNA fragmentation in lymphocytes in a dose-dependent manner.
authors.affiliation: Departamento de Biología Celular y Ultraestructura, Centro de Investigación Biomédica, Facultad de Medicina de Torreón, Universidad Autónoma de Coahuila, Torreón, Coah. México.
authors.forename: J
authors.initials: J
authors.lastname: Jiménez-Villarreal
authors.affiliation: Departamento de Biología Celular y Ultraestructura, Centro de Investigación Biomédica, Facultad de Medicina de Torreón, Universidad Autónoma de Coahuila, Torreón, Coah. México.
authors.forename: D I
authors.initials: DI
authors.lastname: Rivas-Armendáriz
authors.affiliation: Facultad de Medicina, Universidad Autónoma de Coahuila, Unidad Torreón, Torreón, Coahuila, México.
authors.forename: R D
authors.initials: RD
authors.lastname: Arellano Pérez-Vertti
authors.affiliation: Facultad de Ciencias Químicas, Universidad Juárez del Estado de Durango, Gómez Palacio, Durango, México.
authors.forename: E
authors.initials: E
authors.lastname: Olivas Calderón
authors.affiliation: Departamento de Histología, Facultad de Medicina, Universidad Autónoma de Coahuila, Unidad Torreón, Torreón, Coahuila, México.
authors.forename: R
authors.initials: R
authors.lastname: García-Garza
authors.affiliation: Departamento de Biología Celular y Ultraestructura, Centro de Investigación Biomédica, Facultad de Medicina de Torreón, Universidad Autónoma de Coahuila, Torreón, Coah. México.
authors.forename: N D
authors.initials: ND
authors.lastname: Betancourt-Martínez
authors.affiliation: Departamento de Bioquímica y Farmacología, Centro de Investigación Biomédica, Universidad Autónoma de Coahuila, Unidad Torreón, Torreón, Coah, México.
authors.forename: L B
authors.initials: LB
authors.lastname: Serrano-Gallardo
authors.affiliation: Departamento de Biología Celular y Ultraestructura, Centro de Investigación Biomédica, Facultad de Medicina de Torreón, Universidad Autónoma de Coahuila, Torreón, Coah. México javmoran@yahoo.com.
authors.forename: J
authors.initials: J
authors.lastname: Morán-Martínez
mesh_terms: D000818:Animals; D004249:DNA Damage; D053938:DNA Fragmentation; D005260:Female; D005290:Ferric Compounds / Q000737:chemistry; D006801:Humans; D015227:Lipid Peroxidation; D008214:Lymphocytes / Q000378:metabolism*; D053768:Metal Nanoparticles / Q000737:chemistry / Q000633:toxicity*; D018384:Oxidative Stress; D051381:Rats; D017382:Reactive Oxygen Species; D012822:Silicon Dioxide / Q000737:chemistry
chemical_list: D005290:Ferric Compounds; D017382:Reactive Oxygen Species; C000499:ferric oxide; D012822:Silicon Dioxide