title: Fast low-temperature plasma reduction of monolayer graphene oxide at atmospheric pressure.
abstract: We report on an ultrafast plasma-based graphene oxide reduction method superior to conventional vacuum thermal annealing and/or chemical reduction. The method is based on the effect of non-equilibrium atmospheric-pressure plasma generated by the diffuse coplanar surface barrier discharge in proximity of the graphene oxide layer. As the reduction time is in the order of seconds, the presented method is applicable to the large-scale production of reduced graphene oxide layers. The short reduction times are achieved by the high-volume power density of plasma, which is of the order of 100 W cm-3. Monolayers of graphene oxide on silicon substrate were prepared by a modified Langmuir-Schaefer method and the efficient and rapid reduction by methane and/or hydrogen plasma was demonstrated. The best results were obtained for the graphene oxide reduction in hydrogen plasma, as verified by x-ray photoelectron spectroscopy and Raman spectroscopy.
authors.affiliation: Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava, Mlynska dolina F2, 842 48 Bratislava, Slovakia. Institute of Physics, Slovak Academy of Sciences, Dubravska cesta 9, 845 11 Bratislava, Slovakia.
authors.forename: Michal
authors.initials: M
authors.lastname: Bodik
authors.forename: Anna
authors.initials: A
authors.lastname: Zahoranova
authors.forename: Matej
authors.initials: M
authors.lastname: Micusik
authors.forename: Nikola
authors.initials: N
authors.lastname: Bugarova
authors.forename: Zdenko
authors.initials: Z
authors.lastname: Spitalsky
authors.forename: Maria
authors.initials: M
authors.lastname: Omastova
authors.forename: Eva
authors.initials: E
authors.lastname: Majkova
authors.forename: Matej
authors.initials: M
authors.lastname: Jergel
authors.forename: Peter
authors.initials: P
authors.lastname: Siffalovic