title: General planar transverse domain walls realized by optimized transverse magnetic field pulses in magnetic biaxial nanowires.
abstract: The statics and field-driven dynamics of transverse domain walls (TDWs) in magnetic nanowires (NWs) have attracted continuous interests because of their theoretical significance and application potential in future magnetic logic and memory devices. Recent results demonstrate that uniform transverse magnetic fields (TMFs) can greatly enhance the wall velocity, meantime leave a twisting in the TDW azimuthal distribution. For application in high-density NW devices, it is preferable to erase the twisting so as to minimize magnetization frustrations. Here we report the realization of a completely planar TDW with arbitrary tilting attitude in a magnetic biaxial NW under a TMF pulse with fixed strength and well-designed orientation profile. We smooth any twisting in the TDW azimuthal plane thus completely decouple the polar and azimuthal degrees of freedom. The analytical differential equation describing the polar angle distribution is derived and the resulting solution is not the Walker-ansatz form. With this TMF pulse comoving, the field-driven dynamics of the planar TDW is investigated with the help of the asymptotic expansion method. It turns out the comoving TMF pulse increases the wall velocity under the same axial driving field. These results will help to design a series of modern magnetic devices based on planar TDWs.
authors.affiliation: School of Physics and Technology, Center for Electron Microscopy and MOE Key Laboratory of Artificial Micro- and Nano-structures, Wuhan University, Wuhan 430072, China.
authors.forename: Mei
authors.initials: M
authors.lastname: Li
authors.affiliation: School of Physics and Technology, Center for Electron Microscopy and MOE Key Laboratory of Artificial Micro- and Nano-structures, Wuhan University, Wuhan 430072, China.
authors.forename: Jianbo
authors.initials: J
authors.lastname: Wang
authors.affiliation: College of Physics and Information Engineering, Hebei Advanced Thin Films Laboratory, Hebei Normal University, Shijiazhuang 050024, China.
authors.forename: Jie
authors.initials: J
authors.lastname: Lu