title: Area-Selective Lift-Off Mechanism Based on Dual-Triggered Interfacial Adhesion Switching: Highly Facile Fabrication of Flexible Nanomesh Electrode.
abstract: With the recent emergence of flexible and wearable optoelectronic devices, the achievement of sufficient bendability and stretchability of transparent and conducting electrodes (TCEs) has become an important requirement. Although metal-mesh-based structures have been investigated for TCEs because of their excellent performances, the fabrication of mesh or grid structures with a submicron line width is still complex due to the requirements of laborious lithography and pattern transfer steps. Here, we introduce an extremely facile fabrication technique for metal patterns embedded in a flexible substrate based on submicron replication and an area-selective delamination (ASD) pattern. The high-yield, area-specific lift-off process is based on the principle of solvent-assisted delamination of deposited metal thin films and a mechanical triggering effect by soft wiping or ultrasonication. Our fabrication process is very simple, convenient, and cost-effective in that it does not require any lithography/etching steps or sophisticated facilities. Moreover, their outstanding optical and electrical properties (e.g., sheet resistances of 0.43 Ω sq-1at 94% transmittance), which are markedly superior to those of other flexible TCEs, are demonstrated. Furthermore, there is no significant change of resistance over 1000 repeated bending cycles, with a bending radius of 5 mm, and immersion in various solvents such as salt water and organic solvents. Finally, we demonstrate high-performance transparent heaters and flexible touch panels fabricated using the nanomesh electrode, confirming the long-range electrical conduction and reliability of the electrode.
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
authors.forename: Seunghee
authors.initials: S
authors.lastname: Yu
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
authors.forename: Hyeuk Jin
authors.initials: HJ
authors.lastname: Han
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
authors.forename: Jong Min
authors.initials: JM
authors.lastname: Kim
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
authors.forename: Soonmin
authors.initials: S
authors.lastname: Yim
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
authors.forename: Dong Min
authors.initials: DM
authors.lastname: Sim
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
authors.forename: Hunhee
authors.initials: H
authors.lastname: Lim
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
authors.forename: Jung Hye
authors.initials: JH
authors.lastname: Lee
authors.affiliation: Global Frontier R&D Center for Hybrid Interface Materials (HIM) , Pusandaehak-ro 63beon-gil, Geumjeong-gu, Busan 46241, Republic of Korea.
authors.forename: Woon Ik
authors.initials: WI
authors.lastname: Park
authors.affiliation: Division of Nano-Convergence Technology, Korea National NanoFab Center , 291 Daehak-ro, Daejeon 34141, Republic of Korea.
authors.forename: Jae Hong
authors.initials: JH
authors.lastname: Park
authors.affiliation: Global Frontier R&D Center for Hybrid Interface Materials (HIM) , Pusandaehak-ro 63beon-gil, Geumjeong-gu, Busan 46241, Republic of Korea.
authors.forename: Kwang Ho
authors.initials: KH
authors.lastname: Kim
authors.affiliation: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.|Division of Nano-Convergence Technology, Korea National NanoFab Center , 291 Daehak-ro, Daejeon 34141, Republic of Korea.
authors.forename: Yeon Sik
authors.identifier: 0000-0002-7709-8347
authors.initials: YS
authors.lastname: Jung
keywords: area-selective lift-off; embedded structure; interfacial adhesion switching; mechanical stimulus; metal mesh; solvent; transparent conductor