title: Investigation of Ag-TiO2Interfacial Reaction of Highly Stable Ag Nanowire Transparent Conductive Film with Conformal TiO2Coating by Atomic Layer Deposition.
abstract: The atomic layer deposition (ALD) technique is applied to coat Ag nanowires (NWs) with a highly uniform and conformal TiO2layer to improve the stability and sustainability of Ag NW transparent conductive films (TCFs) at high temperatures. The TiO2layer can be directly deposited on Ag NWs with a surface polyvinylpyrrolidone (PVP) coat that acts a bed for TiO2seeding in the ALD process. The ALD TiO2layer significantly enhances the thermal stability at least 100 fold when aged between 200-400 °C and also provides an extra function of violet-blue light filtration for Ag NW TCFs. Investigation into the interaction between TiO2and Ag reveals that the conformal TiO2shell could effectively prevent Ag from 1D-to-3D ripening. However, Ag could penetrate the conformal TiO2shell and form nanocrystals on the TiO2shell surface when it is aged at 400 °C. According to experimental data and thermodynamic evaluation, the Ag penetration leads to an interlayer composed of mixed Ag-Ag2O-amorphous carbon phases and TiO2-xat the Ag-TiO2interface, which is thought to be caused by extremely high vapor pressure of Ag at the Ag-TiO2interface at a higher temperature (e.g., 400 °C).
authors.affiliation: Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan.
authors.forename: Ming-Hua
authors.initials: MH
authors.lastname: Yeh
authors.affiliation: Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan.
authors.forename: Po-Hsun
authors.initials: PH
authors.lastname: Chen
authors.affiliation: Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan.
authors.forename: Yi-Ching
authors.initials: YC
authors.lastname: Yang
authors.affiliation: Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan.
authors.forename: Guan-Hong
authors.initials: GH
authors.lastname: Chen
authors.affiliation: Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan.
authors.forename: Hsueh-Shih
authors.identifier: http://orcid.org/0000-0002-5715-0750
authors.initials: HS
authors.lastname: Chen
keywords: ALD; Ag NW; Kirkendall; TCF; TiO2