title: Reaction-Diffusion-Mediated Photolithography for Designing Pseudo-3D Microstructures.
abstract: Microstructures with 3D features provide advanced functionalities in many applications. Reaction-diffusion process has been employed in photolithography to produce pseudo-3D microstructures in a reproducible manner. In this work, the influences of various parameters on growth behavior of polymeric structures are investigated and the use of the reaction-diffusion-mediated photolithography (RDP) is expanded to a wide range of structural dimensions. In addition, how a lens effect alters the growth behavior of microstructures in conjunction with reaction-diffusion process is studied. For small separation between reaction sites in the array, ultraviolet (UV) exposure time is optimized along with the separation to avoid film or plateau formation. It is further proved that the RDP process is highly reproducible and applicable to various photocurable resins. In a demonstrative purpose, the use of microdomes created by the RDP process as microlens arrays is shown. The RDP process enables the production of pseudo-3D microstructures even with collimated UV light in the absence of complex optical setups, thereby potentially serving as a useful means to create micropatterns and particles with unique structural features.
authors.affiliation: Department of Chemical and Biomolecular Engineering (BK21+ Program), KAIST, Daejeon, 305-701, Korea.
authors.forename: Ju Hyeon
authors.initials: JH
authors.lastname: Kim
authors.affiliation: Department of Chemical and Biomolecular Engineering (BK21+ Program), KAIST, Daejeon, 305-701, Korea.
authors.forename: Kwanghwi
authors.initials: K
authors.lastname: Je
authors.affiliation: Department of Chemical Engineering and Department of Energy System Research, Ajou University, Suwon, 16499, Republic of Korea.
authors.forename: Tae Soup
authors.initials: TS
authors.lastname: Shim
authors.affiliation: Department of Chemical and Biomolecular Engineering (BK21+ Program), KAIST, Daejeon, 305-701, Korea.
authors.forename: Shin-Hyun
authors.initials: SH
authors.lastname: Kim
keywords: 3D microstructures; oxygen inhibition; photolithography; radical polymerization; reaction-diffusion