title: Conductivity and Local Structure of LaNiO3Thin Films.
abstract: A marked conductivity enhancement is reported in 6-11 unit cell LaNiO3thin films. A maximal conductivity is also observed in ab initio calculations for films of the same thickness. In agreement with results from state of the art scanning transmission electron microscopy, the calculations also reveal a differentiated film structure comprising characteristic surface, interior, and heterointerface structures. Based on this observation, a three-element parallel conductor model is considered and leads to the conclusion that the conductivity enhancement for films of 6-11 unit cells, stems from the onset of intercompetition between the three local structures in the film depth.
authors.affiliation: DQMP, Université de Genève, 24 Quai E.-Ansermet, 1211, Geneva, Switzerland.
authors.forename: Jennifer
authors.initials: J
authors.lastname: Fowlie
authors.affiliation: DQMP, Université de Genève, 24 Quai E.-Ansermet, 1211, Geneva, Switzerland.
authors.forename: Marta
authors.initials: M
authors.lastname: Gibert
authors.affiliation: DQMP, Université de Genève, 24 Quai E.-Ansermet, 1211, Geneva, Switzerland.|Laboratoire de Physique des Solides, CNRS UMR8502, Université Paris-Sud, 91405, Orsay, France.
authors.forename: Giulio
authors.initials: G
authors.lastname: Tieri
authors.affiliation: Laboratoire de Physique des Solides, CNRS UMR8502, Université Paris-Sud, 91405, Orsay, France.
authors.forename: Alexandre
authors.initials: A
authors.lastname: Gloter
authors.affiliation: Materials Research and Technology Department, Luxembourg Institute of Science and Technology, 41 Rue du Brill, 4422, Belvaux, Luxembourg.
authors.forename: Jorge
authors.initials: J
authors.lastname: Íñiguez
authors.affiliation: Istituto dei Materiali, CNR-IOM and Dipartimento di Fisica, Università di Cagliari, Monserrato, 09042-I, Cagliari, Italy.
authors.forename: Alessio
authors.initials: A
authors.lastname: Filippetti
authors.affiliation: DQMP, Université de Genève, 24 Quai E.-Ansermet, 1211, Geneva, Switzerland.
authors.forename: Sara
authors.initials: S
authors.lastname: Catalano
authors.affiliation: DQMP, Université de Genève, 24 Quai E.-Ansermet, 1211, Geneva, Switzerland.
authors.forename: Stefano
authors.initials: S
authors.lastname: Gariglio
authors.affiliation: Materials Research and Technology Department, Luxembourg Institute of Science and Technology, 41 Rue du Brill, 4422, Belvaux, Luxembourg.
authors.forename: Alexander
authors.initials: A
authors.lastname: Schober
authors.affiliation: Materials Research and Technology Department, Luxembourg Institute of Science and Technology, 41 Rue du Brill, 4422, Belvaux, Luxembourg.
authors.forename: Mael
authors.initials: M
authors.lastname: Guennou
authors.affiliation: Materials Research and Technology Department, Luxembourg Institute of Science and Technology, 41 Rue du Brill, 4422, Belvaux, Luxembourg.|Physics and Materials Science Research Unit, University of Luxembourg, 41 Rue du Brill, 4422, Belvaux, Luxembourg.
authors.forename: Jens
authors.initials: J
authors.lastname: Kreisel
authors.affiliation: Laboratoire de Physique des Solides, CNRS UMR8502, Université Paris-Sud, 91405, Orsay, France.
authors.forename: Odile
authors.initials: O
authors.lastname: Stéphan
authors.affiliation: DQMP, Université de Genève, 24 Quai E.-Ansermet, 1211, Geneva, Switzerland.
authors.forename: Jean-Marc
authors.initials: JM
authors.lastname: Triscone
keywords: nickelates; oxides; thin films