title: Erratum to: The Influence of Hafnium Doping on Density-of-States in Zinc Oxide Thin-Film Fransistors Deposited Via Atomic Layer Deposition.
authors.affiliation: Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Shanghai, Jingan District, 200070, People's Republic of China.|School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China.
authors.forename: Xingwei
authors.initials: X
authors.lastname: Ding
authors.affiliation: School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China.
authors.forename: Cunping
authors.initials: C
authors.lastname: Qin
authors.affiliation: Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Shanghai, Jingan District, 200070, People's Republic of China.
authors.forename: Jiantao
authors.initials: J
authors.lastname: Song
authors.affiliation: Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Shanghai, Jingan District, 200070, People's Republic of China. dxwshu@126.com.|School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China. dxwshu@126.com.
authors.forename: Jianhua
authors.initials: J
authors.lastname: Zhang
authors.affiliation: Department of Materials Science, Shanghai University, Shanghai, 200072, China.
authors.forename: Xueyin
authors.initials: X
authors.lastname: Jiang
authors.affiliation: Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Shanghai, Jingan District, 200070, People's Republic of China.|Department of Materials Science, Shanghai University, Shanghai, 200072, China.
authors.forename: Zhilin
authors.initials: Z
authors.lastname: Zhang