title: High photon-to-heat conversion efficiency in the wavelength region of 250-1200 nm based on a thermoelectric Bi2Te3film structure.
abstract: In this work, 4-layered SiO2/Bi2Te3/SiO2/Cu film structures were designed and fabricated and the optical properties investigated in the wavelength region of 250-1200 nm for their promising applications for direct solar-thermal-electric conversion. A typical 4-layered film sample with the structure SiO2(66.6 nm)/Bi2Te3(7.0 nm)/SiO2(67.0 nm)/Cu (>100.0 nm) was deposited on a Si or K9-glass substrate by magnetron sputtering. The experimental results agree well with the simulated ones showing an average optical absorption of 96.5%, except in the shorter wavelength region, 250-500 nm, which demonstrates the superior absorption property of the 4-layered film due to the randomly rough surface of the Cu layer resulting from the higher deposition power. The high reflectance of the film structure in the long wavelength region of 2-20 μm will result in a low thermal emittance, 0.064 at 600 K. The simpler 4-layered structure with the thermoelectric Bi2Te3used as the absorption layer may provide a straightforward way to obtain solar-thermal-electric conversion more efficiently through future study.
authors.affiliation: School of Optoelectronic Engineering, Nanjing University of Posts and Telecommunications, Nanjing, China.|Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Er-Tao
authors.initials: ET
authors.lastname: Hu
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Yuan
authors.initials: Y
authors.lastname: Yao
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Kai-Yan
authors.initials: KY
authors.lastname: Zang
authors.affiliation: School of Optoelectronic Engineering, Nanjing University of Posts and Telecommunications, Nanjing, China.
authors.forename: Xin-Xing
authors.initials: XX
authors.lastname: Liu
authors.affiliation: Graduate School of IPS, Waseda University, Fukuoka, Japan.
authors.forename: An-Qing
authors.initials: AQ
authors.lastname: Jiang
authors.affiliation: School of Optoelectronic Engineering, Nanjing University of Posts and Telecommunications, Nanjing, China.
authors.forename: Jia-Jin
authors.initials: JJ
authors.lastname: Zheng
authors.affiliation: School of Optoelectronic Engineering, Nanjing University of Posts and Telecommunications, Nanjing, China.
authors.forename: Ke-Han
authors.initials: KH
authors.lastname: Yu
authors.affiliation: School of Optoelectronic Engineering, Nanjing University of Posts and Telecommunications, Nanjing, China.
authors.forename: Wei
authors.initials: W
authors.lastname: Wei
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Yu-Xiang
authors.initials: YX
authors.lastname: Zheng
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Rong-Jun
authors.initials: RJ
authors.lastname: Zhang
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Song-You
authors.initials: SY
authors.lastname: Wang
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Hai-Bin
authors.initials: HB
authors.lastname: Zhao
authors.affiliation: Graduate School of IPS, Waseda University, Fukuoka, Japan.
authors.forename: Osamu
authors.initials: O
authors.lastname: Yoshie
authors.affiliation: Department of Physics, Hanyang University, Seoul, Korea.
authors.forename: Young-Pak
authors.initials: YP
authors.lastname: Lee
authors.affiliation: Department of Physics, Iowa State University, Ames, Iowa, USA.
authors.forename: Cai-Zhuang
authors.initials: CZ
authors.lastname: Wang
authors.affiliation: Department of Physics, Iowa State University, Ames, Iowa, USA.
authors.forename: David W
authors.initials: DW
authors.lastname: Lynch
authors.affiliation: Department of Electrical &Computer Engineering, University of Alabama in Huntsville, Alabama, USA.
authors.forename: Jun-Peng
authors.initials: JP
authors.lastname: Guo
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai, China.
authors.forename: Liang-Yao
authors.initials: LY
authors.lastname: Chen