title: Nanoengineering Heterogeneous Catalysts by Atomic Layer Deposition.
abstract: A new generation of catalysts is needed to meet society's energy and resource requirements. Current catalyst synthesis does not fully achieve optimum control of composition, size, and structure. Atomic layer deposition (ALD) is an emerging technique that allows for synthesis of highly controlled catalysts in the form of films, nanoparticles, and single sites. The addition of ALD coatings can also be used to introduce promoters and improve the stability of traditional catalysts. Evolving research shows promise for applying ALD to understand catalytically active sites and create next-generation catalysts using advanced 3D nanostructures.
authors.affiliation: Department of Chemistry, Stanford University, Stanford, California 94305; email: jasingh@stanford.edu.
authors.forename: Joseph A
authors.initials: JA
authors.lastname: Singh
authors.affiliation: Department of Materials Science and Engineering, Stanford University, Stanford, California 94305; email: nyyang@stanford.edu.
authors.forename: Nuoya
authors.initials: N
authors.lastname: Yang
authors.affiliation: Department of Chemical Engineering, Stanford University, Stanford, California 94305; email: sbent@stanford.edu.
authors.forename: Stacey F
authors.initials: SF
authors.lastname: Bent
mesh_terms: D002384:Catalysis; D008670:Metals / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D009942:Organometallic Compounds / Q000737:chemistry; D010087:Oxides / Q000737:chemistry; D013499:Surface Properties
chemical_list: D008670:Metals; D009942:Organometallic Compounds; D010087:Oxides
keywords: energy; heterogeneous catalysis; nanomaterials