Protecting patches in colloidal synthesis of Au semishells.
Protecting groups are commonly applied in multi-step molecular syntheses to protect one or multiple functional groups from reacting. After the reaction, they are removed from the molecule. In full analogy to this concept, we report the practical and scalable colloidal synthesis of Au semishells using polyphenylsiloxane protecting patches to prevent part of the surface of polystyrene nanoparticles from being covered with Au. After Au deposition, the patches are removed yielding Au semishells. We anticipate that this strategy can be extended to the synthesis of other types of non-centrosymmetric nanoparticles.
DWI - Leibniz Institute for Interactive Materials e.V., Forckenbeckstr. 50, 52056 Aachen, Germany and RWTH Aachen University, Institute for Technical and Macromolecular Chemistry, Worringerweg 2, 52074 Aachen, Germany.
Daniel
D
Mann
DWI - Leibniz Institute for Interactive Materials e.V., Forckenbeckstr. 50, 52056 Aachen, Germany and RWTH Aachen University, Institute for Technical and Macromolecular Chemistry, Worringerweg 2, 52074 Aachen, Germany and Zuyd University of Applied Sciences, Nieuw Eyckholt 300, Postbus 550, 6400 AN Heerlen, The Netherlands.
Stefanie
S
Voogt
The Netherlands Organisation for Applied Scientific Research (TNO), De Rondom 1, 5612 AP Eindhoven, The Netherlands. pascal.buskens@tno.nl.
Ryan
R
van Zandvoort
DWI - Leibniz Institute for Interactive Materials e.V., Forckenbeckstr. 50, 52056 Aachen, Germany and RWTH Aachen University, Institute for Technical and Macromolecular Chemistry, Worringerweg 2, 52074 Aachen, Germany.
Helmut
H
Keul
DWI - Leibniz Institute for Interactive Materials e.V., Forckenbeckstr. 50, 52056 Aachen, Germany and RWTH Aachen University, Institute for Technical and Macromolecular Chemistry, Worringerweg 2, 52074 Aachen, Germany.
Martin
M
Möller
Philips Innovation Labs, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands and Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.
Marcel
M
Verheijen
Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands.
Daniel
D
Nascimento-Duplat
The Netherlands Organisation for Applied Scientific Research (TNO), De Rondom 1, 5612 AP Eindhoven, The Netherlands. pascal.buskens@tno.nl and Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands.
Man
M
Xu
Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands.
H Paul
HP
Urbach
Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands.
Aurèle J L
AJ
Adam
DWI - Leibniz Institute for Interactive Materials e.V., Forckenbeckstr. 50, 52056 Aachen, Germany and RWTH Aachen University, Institute for Technical and Macromolecular Chemistry, Worringerweg 2, 52074 Aachen, Germany and Zuyd University of Applied Sciences, Nieuw Eyckholt 300, Postbus 550, 6400 AN Heerlen, The Netherlands and The Netherlands Organisation for Applied Scientific Research (TNO), De Rondom 1, 5612 AP Eindhoven, The Netherlands. pascal.buskens@tno.nl.
Pascal
http://orcid.org/0000-0002-2076-2585
P
Buskens