True Atomic-Scale Imaging in Three Dimensions: A Review of the Rebirth of Field-Ion Microscopy.
This article reviews recent advances utilizing field-ion microscopy (FIM) to extract atomic-scale three-dimensional images of materials. This capability is not new, as the first atomic-scale reconstructions of features utilizing FIM were demonstrated decades ago. The rise of atom probe tomography, and the application of this latter technique in place of FIM has unfortunately severely limited further FIM development. Currently, the ubiquitous availability of extensive computing power makes it possible to treat and reconstruct FIM data digitally and this development allows the image sequences obtained utilizing FIM to be extremely valuable for many material science and engineering applications. This article demonstrates different applications of these capabilities, focusing on its use in physical metallurgy and semiconductor science and technology.
1Normandie Univ,UNIROUEN,INSA Rouen, CNRS,Groupe de Physique des Matériaux,F-76000 Rouen,France.
Francois
F
Vurpillot
1Normandie Univ,UNIROUEN,INSA Rouen, CNRS,Groupe de Physique des Matériaux,F-76000 Rouen,France.
Frédéric
F
Danoix
1Normandie Univ,UNIROUEN,INSA Rouen, CNRS,Groupe de Physique des Matériaux,F-76000 Rouen,France.
Matthieu
M
Gilbert
2Applied Physics,Photonics and Semiconductor Nanophysics,Eindhoven University of Technology,5600MB Eindhoven,The Netherlands.
Sebastian
S
Koelling
3Department of Materials,University of Oxford,Parks Road,Oxford OX13PH,UK.
Michal
M
Dagan
4Department of Materials Science and Engineering,Northwestern University,2220 Campus Drive,Evanston,IL 60208-3108,USA.
David N
DN
Seidman
Field-ion microscopy; point defects; tomography