On the determination of χ(2)in thin films: a comparison of one-beam second-harmonic generation measurement methodologies.
The determination of the second-order susceptibility (χ(2)) of thin film samples can be a delicate matter since well-established χ(2)measurement methodologies such as the Maker fringe technique are best suited for nonlinear materials with large thicknesses typically ranging from tens of microns to several millimeters. Here we compare two different second-harmonic generation setups and the corresponding measurement methodologies that are especially advantageous for thin film χ(2)characterization. This exercise allows for cross-checking the χ(2)obtained for identical samples and identifying the main sources of error for the respective techniques. The development of photonic integrated circuits makes nonlinear thin films of particular interest, since they can be processed into long waveguides to create efficient nonlinear devices. The investigated samples are ABC-type nanolaminates, which were reported recently by two different research groups. However, the subsequent analysis can be useful for all researchers active in the field of thin film χ(2)characterization.
Photonics Research Group, Department of Information Technology (INTEC), Ghent University (UGent) - imec, Technologiepark-Zwijnaarde 15, 9052 Ghent, Belgium.|Center for Nano- and Biophotonics (NB-Photonics), Ghent University, Technologiepark-Zwijnaarde 15, 9052 Ghent, Belgium.
Artur
A
Hermans
Institute for Microstructure Technology (IMT), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany.|Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT), Engesserstraße 5, 76131 Karlsruhe, Germany.
Clemens
C
Kieninger
Optics Laboratory, Tampere University of Technology, P.O. Box 692, 33101 Tampere, Finland.
Kalle
K
Koskinen
Institute of Applied Physics, Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, 76128 Karlsruhe, Germany.
Andreas
A
Wickberg
Department of Solid State Sciences, Faculty of Sciences, Ghent University, Krijgslaan 281/S1, 9000 Ghent, Belgium.
Eduardo
E
Solano
Department of Solid State Sciences, Faculty of Sciences, Ghent University, Krijgslaan 281/S1, 9000 Ghent, Belgium.
Jolien
J
Dendooven
Optics Laboratory, Tampere University of Technology, P.O. Box 692, 33101 Tampere, Finland.
Martti
M
Kauranen
Photonics Research Group, Department of Information Technology (INTEC), Ghent University (UGent) - imec, Technologiepark-Zwijnaarde 15, 9052 Ghent, Belgium.|Center for Nano- and Biophotonics (NB-Photonics), Ghent University, Technologiepark-Zwijnaarde 15, 9052 Ghent, Belgium.
Stéphane
S
Clemmen
Institute of Applied Physics, Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, 76128 Karlsruhe, Germany.|Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76021 Karlsruhe, Germany.
Martin
M
Wegener
Institute for Microstructure Technology (IMT), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany.|Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT), Engesserstraße 5, 76131 Karlsruhe, Germany.
Christian
C
Koos
Photonics Research Group, Department of Information Technology (INTEC), Ghent University (UGent) - imec, Technologiepark-Zwijnaarde 15, 9052 Ghent, Belgium.|Center for Nano- and Biophotonics (NB-Photonics), Ghent University, Technologiepark-Zwijnaarde 15, 9052 Ghent, Belgium.
Roel
R
Baets