title: A heterodyne straightness and displacement measuring interferometer with laser beam drift compensation for long-travel linear stage metrology.
abstract: The laser beam drift seriously influences the accuracy of straightness or displacement measurement in laser interferometers, especially for the long travel measurement. To solve this problem, a heterodyne straightness and displacement measuring interferometer with laser beam drift compensation is proposed. In this interferometer, the simultaneous measurement of straightness error and displacement is realized by using heterodyne interferometry, and the laser beam drift is determined to compensate the measurement results of straightness error and displacement in real time. The optical configuration of the interferometer is designed. The principle of the simultaneous measurement of straightness, displacement, and laser beam drift is depicted and analyzed in detail. And the compensation of the laser beam drift for the straightness error and displacement is presented. Several experiments were performed to verify the feasibility of the interferometer and the effectiveness of the laser beam drift compensation. The experiments of laser beam stability show that the position stability of the laser beam spot can be improved by more than 50% after compensation. The measurement and compensation experiments of straightness error and displacement by testing a linear stage at different distances show that the straightness and displacement obtained from the interferometer are in agreement with those obtained from a compared interferometer and the measured stage. These demonstrate that the merits of this interferometer are not only eliminating the influence of laser beam drift on the measurement accuracy but also having the abilities of simultaneous measurement of straightness error and displacement as well as being suitable for long-travel linear stage metrology.
authors.affiliation: Nanometer Measurement Laboratory, Zhejiang Sci-Tech University, Hangzhou 310018, China.
authors.forename: Benyong
authors.identifier: 000000020375740X
authors.initials: B
authors.lastname: Chen
authors.affiliation: Nanometer Measurement Laboratory, Zhejiang Sci-Tech University, Hangzhou 310018, China.
authors.forename: Liang
authors.initials: L
authors.lastname: Cheng
authors.affiliation: Nanometer Measurement Laboratory, Zhejiang Sci-Tech University, Hangzhou 310018, China.
authors.forename: Liping
authors.initials: L
authors.lastname: Yan
authors.affiliation: Nanometer Measurement Laboratory, Zhejiang Sci-Tech University, Hangzhou 310018, China.
authors.forename: Enzheng
authors.initials: E
authors.lastname: Zhang
authors.affiliation: Nanometer Measurement Laboratory, Zhejiang Sci-Tech University, Hangzhou 310018, China.
authors.forename: Yingtian
authors.initials: Y
authors.lastname: Lou