title: Dual-channel extraordinary ultraviolet transmission through an aluminum nanohole array.
abstract: Ultraviolet (UV) surface plasmon (SP) has distinct applications in UV filters, high-density optical storage, spectral enhancement, optical detectors, and nanolithography, which are closely related to plasmon-induced extraordinary optical transmission (EOT). However, such EOT in the UV region has not been the subject of detailed research. We report UV transmission based on theoretical research using the finite-difference time-domain method, by modulating the Al thickness, hole size, array periodicity, and SiO2overlayer thickness. It is notable that we can obtain dual-channel UV transmission peaks with excellent qualities such as high transmissivity, zero cross-talk, narrow bandwidth, and perfect symmetry, by optimizing the parameters. The UV transmission peaks have been discovered to non-monotonously shift with increasing hole size. Although array periodicity has great influence on the transmission peak position, the peak energy in the UV region is much less than the value predicted by the well-known periodicity-related surface plasmon polariton (SPP) wavelength equation; the energy discrepancy in the UV region can reach above 20%, which is much larger than the value (typically 4%) in the visible-infrared region. Furthermore, the SiO2overlayer may significantly modify the transmission properties. The Al nanohole arrays have also been found to exhibit distinct multi-band UV electric field enhancement properties with special interface effect and size effect. Such extraordinary dual-channel UV transmission with zero cross-talk, based on a very simple Al nanohole array, has promising application in dual-channel UV filters, high-density optical storage, and plasmon-enhanced fluorescence/Raman spectroscopy, which generally involves two wavebands (writing/reading storage or exciting/emission wavelengths). This study is expected to broaden our fundamental understanding of the UV EOT phenomenon, and provide references for experimental research and application of deep-UV and near-UV-related dual-band plasmonic devices.
authors.affiliation: School of Materials Science and Engineering, and Anhui Key Laboratory of Metal Materials and Processing, Anhui University of Technology, Ma-An-Shan, Anhui 243002, People's Republic of China.
authors.forename: Jinlian
authors.initials: J
authors.lastname: Hu
authors.forename: Maozhen
authors.initials: M
authors.lastname: Shen
authors.forename: Zhigang
authors.initials: Z
authors.lastname: Li
authors.forename: Xinhua
authors.initials: X
authors.lastname: Li
authors.forename: Guangqiang
authors.initials: G
authors.lastname: Liu
authors.forename: Xiangdong
authors.initials: X
authors.lastname: Wang
authors.forename: Caixia
authors.initials: C
authors.lastname: Kan
authors.forename: Yue
authors.initials: Y
authors.lastname: Li