title: Low-Temperature Atomic Layer Deposition of MoS2Films.
abstract: Wet chemical screening reveals the very high reactivity of Mo(NMe2)4with H2S for the low-temperature synthesis of MoS2. This observation motivated an investigation of Mo(NMe2)4as a volatile precursor for the atomic layer deposition (ALD) of MoS2thin films. Herein we report that Mo(NMe2)4enables MoS2film growth at record low temperatures-as low as 60 °C. The as-deposited films are amorphous but can be readily crystallized by annealing. Importantly, the low ALD growth temperature is compatible with photolithographic and lift-off patterning for the straightforward fabrication of diverse device structures.
authors.affiliation: Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
authors.forename: Titel
authors.initials: T
authors.lastname: Jurca
authors.affiliation: Department of Materials Science and Engineering, and the Materials Research Center, Northwestern University, 2220 Campus Dr., Evanston, IL, 60208, USA.
authors.forename: Michael J
authors.initials: MJ
authors.lastname: Moody
authors.affiliation: Department of Materials Science and Engineering, and the Materials Research Center, Northwestern University, 2220 Campus Dr., Evanston, IL, 60208, USA.
authors.forename: Alex
authors.initials: A
authors.lastname: Henning
authors.affiliation: Department of Materials Science and Engineering, and the Materials Research Center, Northwestern University, 2220 Campus Dr., Evanston, IL, 60208, USA.
authors.forename: Jonathan D
authors.initials: JD
authors.lastname: Emery
authors.affiliation: Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
authors.forename: Binghao
authors.initials: B
authors.lastname: Wang
authors.affiliation: Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
authors.forename: Jeffrey M
authors.initials: JM
authors.lastname: Tan
authors.affiliation: Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
authors.forename: Tracy L
authors.initials: TL
authors.lastname: Lohr
authors.affiliation: Department of Materials Science and Engineering, and the Materials Research Center, Northwestern University, 2220 Campus Dr., Evanston, IL, 60208, USA.
authors.forename: Lincoln J
authors.initials: LJ
authors.lastname: Lauhon
authors.affiliation: Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
authors.forename: Tobin J
authors.identifier: 0000-0001-8771-0141
authors.initials: TJ
authors.lastname: Marks
keywords: atomic layer deposition; low-temperature film growth; metal-organic precursors; molybdenum disulfide