title: Laboratory based X-ray photoemission core-level spectromicroscopy of resistive oxide memories.
abstract: HfO2-based resistive oxide memories are studied by core-level spectromicroscopy using a laboratory-based X-ray photoelectron emission microscope (XPEEM). After forming, the top electrode is thinned to about 1 nm for the XPEEM analysis, making the buried electrode/HfO2interface accessible whilst preserving it from contamination. The results are obtained in the true photoemission channel mode from individual memory cells (5 × 5 µm) excited by low-flux laboratory X-rays, in contrast to most studies employing the X-ray absorption channel using potentially harmful bright synchrotron X-rays. Analysis of the local Hf 4f, O 1s and Ti 2p core level spectra yields valuable information on the chemistry of the forming process in a single device, and in particular the central role of oxygen vacancies thanks to the spectromicroscopic approach.
authors.affiliation: SPEC, CEA, CNRS, Université Paris Saclay, Gif-sur-Yvette F-91191, France. Electronic address: daniel.gottlob@cea.fr.
authors.forename: Daniel M
authors.initials: DM
authors.lastname: Gottlob
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble France - CEA, LETI, MINATEC Campus, Grenoble F-38054, France.
authors.forename: Eugénie
authors.initials: E
authors.lastname: Martinez
authors.affiliation: SPEC, CEA, CNRS, Université Paris Saclay, Gif-sur-Yvette F-91191, France.
authors.forename: Claire
authors.initials: C
authors.lastname: Mathieu
authors.affiliation: SPEC, CEA, CNRS, Université Paris Saclay, Gif-sur-Yvette F-91191, France.
authors.forename: Christophe
authors.initials: C
authors.lastname: Lubin
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble France - CEA, LETI, MINATEC Campus, Grenoble F-38054, France.
authors.forename: Nicolas
authors.initials: N
authors.lastname: Chevalier
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble France - CEA, LETI, MINATEC Campus, Grenoble F-38054, France.
authors.forename: Munique Kazar
authors.initials: MK
authors.lastname: Mendes
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble France - CEA, LETI, MINATEC Campus, Grenoble F-38054, France.
authors.forename: Christelle
authors.initials: C
authors.lastname: Charpin
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble France - CEA, LETI, MINATEC Campus, Grenoble F-38054, France.
authors.forename: Eric
authors.initials: E
authors.lastname: Jalaguier
authors.affiliation: Université Grenoble Alpes, F-38000 Grenoble France - CEA, LETI, MINATEC Campus, Grenoble F-38054, France.
authors.forename: Olivier
authors.initials: O
authors.lastname: Renault
authors.affiliation: SPEC, CEA, CNRS, Université Paris Saclay, Gif-sur-Yvette F-91191, France.
authors.forename: Nicholas
authors.initials: N
authors.lastname: Barrett
keywords: HfO(2); PEEM; Resistive switching