title: Biomineralisation with Saos-2 bone cells on TiSiN sputtered Ti alloys.
abstract: Surface modifications of metallic implants are important in order to protect the underlying metals from the harsh corrosive environment inside the human body and to minimize the losses caused by wear. Recently, researches are carried out in developing bioactive surfaces on metallic implants, which supports the growth and proliferation of cells on to these surfaces. Titanium silicon nitride (TiSiN) hard nanocomposites thin films were fabricated on Ti alloys (Ti-6Al-4V) by pulsed direct current (DC) reactive magnetron sputtering. The films were characterized for its microstructural and electrochemical behavior. The higher charge transfer resistance (Rct) and positive shift in Ecorr value of TiSiN/Ti alloys than the bare Ti-alloys indicates a better corrosion resistance offered by the TiSiN thin films to the underlying substrates. The biological response to TiSiN/Ti alloys and control bare Ti-alloys was measured in vitro using cell-based assays with two main outcomes. Firstly, neither the Ti alloy nor the TiSiN thin film was cytotoxic to cells. Secondly, the TiSiN thin film promoted differentiation of human bone cells above the bare control Ti alloy as measured by alkaline phosphatase and calcium production. TiSiN thin films provide better corrosion resistance and protect the underlying metal from the corrosive environment. The thin film surface is both biocompatible and bioactive as indicated from the cytotoxicity and biomineralization studies.
authors.affiliation: Academy of Scientific and Innovative Research (AcSIR), India; ECMS Division, CSIR-Central Electrochemical Research Institute, Karaikudi, 630003, India.
authors.forename: Anusha Thampi
authors.initials: AT
authors.lastname: V V
authors.affiliation: Plasma Processing and Deposition Team, CSIRO Manufacturing Business Unit, Lindfield, 2070 Sydney, Australia.
authors.forename: Avi
authors.initials: A
authors.lastname: Bendavid
authors.affiliation: Plasma Processing and Deposition Team, CSIRO Manufacturing Business Unit, Lindfield, 2070 Sydney, Australia.
authors.forename: P J
authors.initials: PJ
authors.lastname: Martin
authors.affiliation: Biomedical Materials Program, CSIRO Manufacturing Flagship, Building 53, North Ryde, NSW 2113, Australia.
authors.forename: Vijay
authors.initials: V
authors.lastname: Vaithilingam
authors.affiliation: Biomedical Materials Program, CSIRO Manufacturing Flagship, Building 53, North Ryde, NSW 2113, Australia.
authors.forename: Penelope A
authors.initials: PA
authors.lastname: Bean
authors.affiliation: Biomedical Materials Program, CSIRO Manufacturing Flagship, Building 53, North Ryde, NSW 2113, Australia.
authors.forename: Margaret D M
authors.initials: MDM
authors.lastname: Evans
authors.affiliation: Academy of Scientific and Innovative Research (AcSIR), India; ECMS Division, CSIR-Central Electrochemical Research Institute, Karaikudi, 630003, India. Electronic address: subramanianb3@gmail.com.
authors.forename: B
authors.initials: B
authors.lastname: Subramanian
mesh_terms: D000469:Alkaline Phosphatase / Q000378:metabolism; D000497:Alloys / Q000737:chemistry / Q000494:pharmacology*; D000818:Animals; D001672:Biocompatible Materials; D002113:Calcification, Physiologic / Q000187:drug effects*; D002118:Calcium / Q000378:metabolism; D002454:Cell Differentiation / Q000187:drug effects; D002460:Cell Line; D045744:Cell Line, Tumor; D002470:Cell Survival / Q000187:drug effects; D005347:Fibroblasts / Q000166:cytology / Q000187:drug effects; D006801:Humans; D051379:Mice; D010006:Osteoblasts / Q000166:cytology / Q000187:drug effects* / Q000378:metabolism; D017655:Silicon Compounds / Q000737:chemistry / Q000494:pharmacology*; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry / Q000494:pharmacology*
chemical_list: D000497:Alloys; D001672:Biocompatible Materials; D017655:Silicon Compounds; C041500:titanium nitride; D014025:Titanium; D000469:Alkaline Phosphatase; C032734:silicon nitride; D002118:Calcium
keywords: Biocompatibility; Biomineralisation; Nanocomposite thin films; Pulsed magnetron sputtering; Surface modification