title: 50-nm-resolution full-field X-ray microscope without chromatic aberration using total-reflection imaging mirrors.
abstract: X-ray spectromicroscopy with a full-field imaging technique is a powerful method for chemical analysis of heterogeneous complex materials with a nano-scale spatial resolution. For imaging optics, an X-ray reflective optical system has excellent capabilities with highly efficient, achromatic, and long-working-distance properties. An advanced Kirkpatrick-Baez geometry that combines four independent mirrors with elliptic and hyperbolic shapes in both horizontal and vertical directions was developed for this purpose, although the complexity of the system has a limited applicable range. Here, we present an optical system consisting of two monolithic imaging mirrors. Elliptic and hyperbolic shapes were formed on a single substrate to achieve both high resolution and sufficient stability. The mirrors were finished with a ~1-nm shape accuracy using elastic emission machining. The performance was tested at SPring-8 with a photon energy of approximately 10 keV. We could clearly resolve 50-nm features in a Siemens star without chromatic aberration and with high stability over 20 h. We applied this system to X-ray absorption fine structure spectromicroscopy and identified elements and chemical states in specimens of zinc and tungsten micron-size particles.
authors.affiliation: Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
authors.forename: Satoshi
authors.initials: S
authors.lastname: Matsuyama
authors.affiliation: Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
authors.forename: Shuhei
authors.initials: S
authors.lastname: Yasuda
authors.affiliation: Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
authors.forename: Jumpei
authors.initials: J
authors.lastname: Yamada
authors.affiliation: JTEC Corporation, 2-4-35, Saito-Yamabuki, Ibaraki, Osaka 567-0086, Japan.
authors.forename: Hiromi
authors.initials: H
authors.lastname: Okada
authors.affiliation: RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan.
authors.forename: Yoshiki
authors.initials: Y
authors.lastname: Kohmura
authors.affiliation: RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan.
authors.forename: Makina
authors.initials: M
authors.lastname: Yabashi
authors.affiliation: RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan.
authors.forename: Tetsuya
authors.initials: T
authors.lastname: Ishikawa
authors.affiliation: Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.|Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
authors.forename: Kazuto
authors.initials: K
authors.lastname: Yamauchi
mesh_terms: D004577:Electron Probe Microanalysis / Q000295:instrumentation*; D004867:Equipment Design / Q000379:methods*; D055096:Optical Devices; D055095:Optics and Photonics