Transcriptome profiling reveals effects of nitric oxide on growth and physiological characteristics of watermelon under aluminum stress
When watermelon seedlings were three leaves, 50ml treatment solution of different concentrations was applied around the roots(CK: Normal growth; Al:1200mol/LAl2(SO)4, pH=4.5;  Al+NO: 1200mol/LAl2(SO)4+100mol/LSNP, pH=4.5). Samples were taken after three days of treatment and stored at -80oC after treatment with liquid nitrogen for later use. Each treatment was set up for 3 biological replicates.