GSE97308
Aluminum Oxide Nanoparticles and Aluminum Ion Leading to Distinct Physiological and Molecular Responses in Arabidopsis thaliana
Nano-aluminium oxide (nAl2O3) is one of the most widely used nanomaterials, but the molecular toxic mechanism of nAl2O3 on plants is still not clarified completely. In this study, we compared the toxic effects of nAl2O3 and Al3+ ion at the physiological and molecular levels. The shoot weight and root weight of Arabidopsis thaliana were decrease to 57.01% and 45.15% after the Al3+ ion exposure , while nAl2O3 increased the root weight by 48.07% and length by 38.53% at the selected concentration (98 mmol/L) for 10 d exposure. Physiological research showed that the photosystem (chlorophyll fluorescence parameters down-regulated) and antioxidant system (MDA and H2O2 content up-regulated) in A. thaliana were severely injured by the Al3+ ion. Data from transcriptome analysis clarified how nAl2O3 and Al3+ ion selectively affected root development and growth. nAl2O3 stimulated root growth directly (e.g., up-regulation of the root hair-specific gene family and root development genes, POLARIS protein), or indirectly (e.g., up-regulation of N and P absorption-related genes). Conversely, Al3+ ion disturbed ion homeostasis (up-regulated Al and Cu content) and caused severe oxidative stress, thus activating the salicylic acid (SA) signaling pathway and up-regulating nitric oxide (NO)-related genes, inducing the plant defense response. However, the overproduced SA and NO (up-regulated 2.60-fold) led to the inhibition of CAT activity (down-regulation of CAT1 and CAT2 genes) and increased the H2O2 level (up-regulated 2.84-fold). Subsequently, root development-related genes (e.g., auxin induced in root cultures 1) were down-regulated. This work gives us new insight into understanding the different molecular mechanisms of the plant response to nAl2O3 and Al3+ stresses. Overall design: Compare the molecular responses of Arabidopsis thaliana after nAl2O3 and ion Al exposure